公开(公告)号：US20130209934A1

公开(公告)日：2013-08-15

申请号：US13752523

申请日：2013-01-29

申请人： Owendi Ongayi ,  James W. Thackeray

发明人： Owendi Ongayi ,  James W. Thackeray

IPC分类号： G03F7/004

CPC分类号： G03F7/004 ,  C08F220/22 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.

摘要翻译： 一种共聚物，其包含电子敏化酸可脱保护单体的聚合产物，例如具有式（XX）的单体和共聚单体：其中R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基 ; Rx和Ry各自独立地为取代或未取代的C 1-10烷基或C 3-10环烷基; Rz是取代或未取代的含C6-20芳族基团或含C6-20脂环族基团; 其中Rx和Ry一起可选地形成环; 并且其中Rx，Ry和Rz中的至少一个被卤化。 还公开了包含共聚物的光致抗蚀剂和涂覆的基材，以及制造使用光致抗蚀剂的电子器件的方法。