METHOD FOR FORMING A PATTERNED PHOTORESIST LAYER
    21.
    发明申请
    METHOD FOR FORMING A PATTERNED PHOTORESIST LAYER 审中-公开
    形成图案光栅层的方法

    公开(公告)号:US20090246717A1

    公开(公告)日:2009-10-01

    申请号:US12187334

    申请日:2008-08-06

    CPC classification number: G03F7/7035

    Abstract: A photoresist layer is disclosed. Utilizing light diffraction properties, a transparent layer is disposed between a light-shielding layer and a photoresist layer during an exposure step, such that the patterned photoresist layer has non-vertical sidewalls. The method of the invention can be applied during front side exposure or back side exposure, and is also practical for positive type photoresists or negative photoresists.

    Abstract translation: 公开了一种光致抗蚀剂层。 利用光衍射特性,在曝光步骤期间,在遮光层和光致抗蚀剂层之间设置透明层,使得图案化的光致抗蚀剂层具有非垂直侧壁。 本发明的方法可以在正面曝光或背面曝光中应用,并且对于正型光致抗蚀剂或负型光致抗蚀剂也是实用的。

    OPTICAL DIFFUSION MODULE
    22.
    发明申请
    OPTICAL DIFFUSION MODULE 有权
    光学扩散模块

    公开(公告)号:US20080055932A1

    公开(公告)日:2008-03-06

    申请号:US11672869

    申请日:2007-02-08

    Abstract: An optical diffusion structure includes an optical diffusion structure comprising a plurality of convex portions and a plurality of concave portions. Each convex portion is adjacent to a plurality of concave portions and each concave portion is adjacent to a plurality of convex portions. The convex portions, the concave portions and each junction of the convex and concave portions have a curvature different from 0. The optical diffusion structure further includes a diffusion plate having a first surface, wherein the optical diffusion structure is formed on the first surface, and the convex portions are arranged in a two dimensional array along a first direction and a second direction, and the concave portions are arranged in a two dimensional array along a third direction and a fourth direction.

    Abstract translation: 光学漫射结构包括具有多个凸部和多个凹部的光漫射结构。 每个凸部与多个凹部相邻,并且每个凹部与多个凸部相邻。 所述凸部,凹部和所述凸部与所述凹部的各接合部的曲率不同于0。所述光漫射结构还包括具有第一面的扩散板,所述光扩散结构形成在所述第一面上, 凸部沿着第一方向和第二方向排列成二维阵列,并且凹部沿着第三方向和第四方向排列成二维阵列。

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