PRODUCTION PROCESS OF QUANTUM DOT LIGHT DIFFUSION PLATE CAPABLE OF BLOCKING HARMFUL BLUE LIGHT

    公开(公告)号:US20240353598A1

    公开(公告)日:2024-10-24

    申请号:US18759806

    申请日:2024-06-29

    CPC classification number: G02B5/0242 G02B5/0268 G02B5/0294

    Abstract: A production process of a quantum dot light diffusion plate capable of blocking harmful blue light, including the following steps: preparing a quantum dot coating solution (S1); coating the quantum dot coating solution on a surface of a light diffusion plate by an automatic coating machine, and allowing spontaneous crystallization of the quantum dot coating solution to form a light diffusion layer (S2); sintering the light diffusion layer to obtain a quantum dot light diffusion plate (S3); jet-printing an anti-blue light layer on a surface of the quantum dot light diffusion plate by an air jet printing machine (S4); and conducting cooling and cutting to obtain the quantum dot light diffusion plate capable of blocking the harmful blue light (S5). A device for producing the quantum dot light diffusion plate includes a crystalline production structure (1), a sintering structure (2), and a jet-printing structure (3).

    Radiation system
    3.
    发明授权

    公开(公告)号:US11984236B2

    公开(公告)日:2024-05-14

    申请号:US16743025

    申请日:2020-01-15

    Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    MANUFACTURING AN OPTICAL ELEMENT
    9.
    发明公开

    公开(公告)号:US20230314660A1

    公开(公告)日:2023-10-05

    申请号:US18041977

    申请日:2021-08-25

    CPC classification number: G02B1/041 G02B3/0031 G02B5/0268

    Abstract: A method of manufacturing an optical element, the method comprising: providing a substrate; providing a tool comprising, on a first side, a section defining a surface structure of the optical element; aligning the tool and the substrate with respect to each other and bringing the tool and a first side of the substrate together, with material between the tool and the substrate; positioning a transparent masking structure adjacent to the substrate onto which the material has adhered, the masking structure comprising a masking layer; emitting light through the masking structure to be incident on a portion of the material to cure said potion of the material, wherein the masking layer prevents light from being incident on a remaining portion of the material such that the remaining portion of the material is uncured; and removing the uncured remaining portion of the material.

    MULTILAYER OPTICAL FILM STRUCTURE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230305198A1

    公开(公告)日:2023-09-28

    申请号:US18113693

    申请日:2023-02-24

    Inventor: YING-TUNG CHEN

    CPC classification number: G02B5/0268 B32B3/30 B32B7/023 B32B7/12

    Abstract: A multilayer optical film structure and a method of manufacturing the same are provided. The multilayer optical film structure includes a base layer, a first optical structure and a second optical structure. The base layer has a first surface and a second surface. The first optical structure is disposed on the first surface of the base layer. The second optical structure is disposed on the second surface of the base layer, and includes a first structural layer, a second structural layer and a third structural layer. The first structural layer is located between the base layer and the second structural layer, and the second structural layer is located between the first structural layer and the third structural layer. The difference between the refractive index of the first structural layer and the refractive index of the second structural layer is greater than or equal to 0.1.

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