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1.
公开(公告)号:US20240353598A1
公开(公告)日:2024-10-24
申请号:US18759806
申请日:2024-06-29
Inventor: Jinquan CHEN , Daoqing ZHOU
IPC: G02B5/02
CPC classification number: G02B5/0242 , G02B5/0268 , G02B5/0294
Abstract: A production process of a quantum dot light diffusion plate capable of blocking harmful blue light, including the following steps: preparing a quantum dot coating solution (S1); coating the quantum dot coating solution on a surface of a light diffusion plate by an automatic coating machine, and allowing spontaneous crystallization of the quantum dot coating solution to form a light diffusion layer (S2); sintering the light diffusion layer to obtain a quantum dot light diffusion plate (S3); jet-printing an anti-blue light layer on a surface of the quantum dot light diffusion plate by an air jet printing machine (S4); and conducting cooling and cutting to obtain the quantum dot light diffusion plate capable of blocking the harmful blue light (S5). A device for producing the quantum dot light diffusion plate includes a crystalline production structure (1), a sintering structure (2), and a jet-printing structure (3).
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公开(公告)号:US12037513B2
公开(公告)日:2024-07-16
申请号:US17575861
申请日:2022-01-14
Applicant: DAICEL CORPORATION
Inventor: Masaki Hayashi , Yoshitaka Sugawara
IPC: C09D5/00 , C08J7/043 , C08J7/046 , C09D133/08 , G02B5/02
CPC classification number: C09D5/006 , C08J7/043 , C08J7/046 , C09D133/08 , G02B5/021 , G02B5/0268
Abstract: The antiglare film of the present invention is provided with an antiglare layer having a haze value in a range from 50% to 99%, and in a state where the antiglare film is mounted on a surface of a display, a standard deviation of luminance distribution of the display is a value in a range from 0 to 6, and transmission image clarity at an optical comb width of 0.5 mm is a value in a range from 0% to 60%.
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公开(公告)号:US11984236B2
公开(公告)日:2024-05-14
申请号:US16743025
申请日:2020-01-15
Applicant: ASML NETHERLANDS B.V.
Inventor: Han-Kwang Nienhuys , Rilpho Ludovicus Donker , Gosse Charles De Vries
CPC classification number: G21K1/067 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/7005 , G03F7/70075 , G03F7/70991 , G03F7/70191 , G21K2201/064 , H01S3/2308 , H05G2/008
Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
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4.
公开(公告)号:US11977206B2
公开(公告)日:2024-05-07
申请号:US17370311
申请日:2021-07-08
Applicant: Corning Incorporated
Inventor: Shandon Dee Hart , Karl William Koch, III , Carlo Anthony Kosik Williams , Lin Lin , Wageesha Senaratne , William Allen Wood
IPC: G02B1/11 , C03C15/00 , C23C14/02 , C23C14/04 , C23C16/02 , C23C16/04 , G02B1/118 , G02B1/14 , G02B5/02 , G02B27/42
CPC classification number: G02B1/11 , C03C15/00 , C23C14/021 , C23C14/042 , C23C16/0227 , C23C16/042 , G02B1/118 , G02B1/14 , G02B5/0221 , G02B5/0268 , G02B27/4205 , G02B27/4272 , G02B2207/101
Abstract: A display article is described herein that includes: a substrate comprising a thickness and primary surface; a diffractive surface region defined by the primary surface; and an antireflective coating disposed on the diffractive surface region. The diffractive surface region comprises structural features that comprise different heights in a multimodal distribution. The substrate exhibits a sparkle of 1.8. The article exhibits a first-surface average visible specular reflectance of less than 0.2% at an incident angle of 20°, and a maximum hardness of ≥8 GPa in a Berkovich Indenter Hardness Test.
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公开(公告)号:US20240134094A1
公开(公告)日:2024-04-25
申请号:US17972453
申请日:2022-10-23
Applicant: VIAVI SOLUTIONS INC.
Inventor: Joerg BUTH , Jaroslaw ZIEBA , Bradley John WARD , Tasso R.M. SALES
CPC classification number: G02B5/0268 , G02B7/008
Abstract: A die including a substrate having a surface defined by paired oppositely-oriented edges; and an optical material, in a non-rectangular shape, and on the surface of the substrate; wherein the optical material does not extend an entire length of any one of the paired oppositely-oriented edges is disclosed, A wafer can including a plurality of the dies. Methods of making the wafer and the die are also disclosed.
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公开(公告)号:US11960103B2
公开(公告)日:2024-04-16
申请号:US16949523
申请日:2020-11-02
Applicant: DEXERIALS CORPORATION
Inventor: Kazuyuki Shibuya , Shunsuke Kanasugi , Mitsuo Arima , Naoki Hanashima
CPC classification number: G02B3/0037 , G02B1/11 , G02B5/0268 , G02B5/0278 , G02B27/0012 , G03F7/0005
Abstract: The micro-lens array is a micro-lens array in which a plurality of micro-lenses are arranged in a matrix in a plan view, wherein each of the plurality of micro-lenses has four main sides in a plan view, and each of the four main sides is inclined with respect to a row virtual line parallel to a row direction or a column virtual line parallel to a column direction.
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公开(公告)号:US20230408738A1
公开(公告)日:2023-12-21
申请号:US18361634
申请日:2023-07-28
Applicant: STMicroelectronics (Crolles 2) SAS
Inventor: Vincent FARYS , Alain INARD , Olivier NOBLANC
CPC classification number: G02B5/0263 , C23C16/345 , G02B5/0268 , C23C18/1208 , G02B5/0236 , C23C16/56
Abstract: Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.
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8.
公开(公告)号:US11803001B1
公开(公告)日:2023-10-31
申请号:US16874126
申请日:2020-05-14
Inventor: Thomas M. Essinger-Hileman , Mary Ann Meador , Haiquan Guo , Tobias Marriage , Charles L. Bennett
CPC classification number: G02B5/208 , G02B5/0242 , G02B5/0268 , G02B5/0294 , G02B5/0247 , G02B5/206 , G02B5/207 , G02B2207/107 , G02B2207/109
Abstract: The present invention relates to broadband and tunable infrared (IR)-blocking optical filters for millimeter and sub-millimeter astronomy composed of small diffusely scattered particles embedded in an aerogel substrate. The size of the scattering particles included in the aerogel filters can be tuned to give variable cutoff frequencies. In one embodiment, the aerogel scattering optical filters of the present invention have ultra-low density and index of refraction (typically n
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公开(公告)号:US20230314660A1
公开(公告)日:2023-10-05
申请号:US18041977
申请日:2021-08-25
Applicant: ams Sensors Singapore Pte. Ltd.
Inventor: Barbara Horvath , Simon Gubser
CPC classification number: G02B1/041 , G02B3/0031 , G02B5/0268
Abstract: A method of manufacturing an optical element, the method comprising: providing a substrate; providing a tool comprising, on a first side, a section defining a surface structure of the optical element; aligning the tool and the substrate with respect to each other and bringing the tool and a first side of the substrate together, with material between the tool and the substrate; positioning a transparent masking structure adjacent to the substrate onto which the material has adhered, the masking structure comprising a masking layer; emitting light through the masking structure to be incident on a portion of the material to cure said potion of the material, wherein the masking layer prevents light from being incident on a remaining portion of the material such that the remaining portion of the material is uncured; and removing the uncured remaining portion of the material.
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公开(公告)号:US20230305198A1
公开(公告)日:2023-09-28
申请号:US18113693
申请日:2023-02-24
Applicant: YTDIAMOND CO., LTD.
Inventor: YING-TUNG CHEN
CPC classification number: G02B5/0268 , B32B3/30 , B32B7/023 , B32B7/12
Abstract: A multilayer optical film structure and a method of manufacturing the same are provided. The multilayer optical film structure includes a base layer, a first optical structure and a second optical structure. The base layer has a first surface and a second surface. The first optical structure is disposed on the first surface of the base layer. The second optical structure is disposed on the second surface of the base layer, and includes a first structural layer, a second structural layer and a third structural layer. The first structural layer is located between the base layer and the second structural layer, and the second structural layer is located between the first structural layer and the third structural layer. The difference between the refractive index of the first structural layer and the refractive index of the second structural layer is greater than or equal to 0.1.
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