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公开(公告)号:US20210199869A1
公开(公告)日:2021-07-01
申请号:US17058396
申请日:2019-05-20
Applicant: Dexerials Corporation
Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
IPC: G02B5/30
Abstract: Provided are: a polarizing plate having high transmittance characteristics and suppressed reflected light, and a manufacturing method thereof; and an optical device provided with said polarizing plate. A polarizing plate (100) having a wire grid structure comprises: a transparent substrate (1); and grid-like projection portions (20) arranged on the transparent substrate at a pitch shorter than the wavelength of light in a used bandwidth and extending in a predetermined direction. The grid-like projection portions (20) each have a reflective layer (3) and a dielectric layer (4) in order from the transparent substrate (1) side, wherein when viewed from the predetermined direction, the reflective layer (3) has at least one step on the side thereof and has the largest bottom width on the transparent substrate (1) side.
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公开(公告)号:US11009789B2
公开(公告)日:2021-05-18
申请号:US16961563
申请日:2019-01-11
Applicant: Dexerials Corporation
Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
IPC: G03F7/00 , G03F1/38 , G02B5/30 , H01L21/027 , H01L21/033 , H01L21/308 , H01L21/311
Abstract: Provided are a pattern formation method and a method for manufacturing a polarizing plate using the pattern formation method, the pattern formation method having: a step for forming, on a substrate, a linear guide pattern which is arranged at a predetermined pitch and is compatible with a portion of block chains of a block copolymer, and a neutral pattern embedded in the pattern of the guide pattern; a step for forming a layer including a block copolymer on the guide pattern and the neutral pattern; a step for heat-treating the layer including the block copolymer and forming a lamellar structure in which lamellar boundaries are arranged perpendicular to the substrate by microphase separation of the block copolymer; and a step for selectively removing a portion of the block chains of the block copolymer and thereby forming a line-and-space-shaped fine pattern having a smaller pitch than the guide pattern.
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公开(公告)号:US20210072446A1
公开(公告)日:2021-03-11
申请号:US17054404
申请日:2019-05-07
Applicant: Dexerials Corporation
Inventor: Akio Takada , Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno
Abstract: Provided is a structural birefringence-type inorganic wave plate having excellent heat resistance and durability, and a fine pattern. Also provided is a manufacturing method for an inorganic wave plate by which, even in the case of a fine pattern, productivity is high, and a desired phase difference is easily achieved and stably obtained. This inorganic wave plate is obtained by utilizing a selective interaction between a polymer having a repeating unit containing a carbonyl group, and a metallic oxide precursor, the inorganic wave plate having a wire grid structure provided with a transparent substrate, and grid-shaped protruding portions arranged at a pitch shorter than the wavelength of light in a used band on at least one surface of the transparent substrate and extending in a predetermined direction, the main component of the grid-shaped protruding portion being a metallic oxide.
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公开(公告)号:US10928574B2
公开(公告)日:2021-02-23
申请号:US16963442
申请日:2019-05-29
Applicant: Dexerials Corporation
Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
Abstract: Provided is a polarizing plate having an appropriate reflectance characteristic formed from an inexpensive material by an inexpensive production device. In a polarizing plate having a wire grid structure including: a transparent substrate; and a grid-like projection that is arranged on the transparent substrate at a pitch smaller than a wavelength of light in a used band and extends in a predetermined direction, an absorption layer constituting the grid-like projection contains an impurity semiconductor obtained by adding a minute amount of a specific element to an intrinsic semiconductor.
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公开(公告)号:US20210011374A1
公开(公告)日:2021-01-14
申请号:US16961563
申请日:2019-01-11
Applicant: Dexerials Corporation
Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
Abstract: Provided are a pattern formation method and a method for manufacturing a polarizing plate using the pattern formation method, the pattern formation method having: a step for forming, on a substrate, a linear guide pattern which is arranged at a predetermined pitch and is compatible with a portion of block chains of a block copolymer, and a neutral pattern embedded in the pattern of the guide pattern; a step for forming a layer including a block copolymer on the guide pattern and the neutral pattern; a step for heat-treating the layer including the block copolymer and forming a lamellar structure in which lamellar boundaries are arranged perpendicular to the substrate by microphase separation of the block copolymer; and a step for selectively removing a portion of the block chains of the block copolymer and thereby forming a line-and-space-shaped fine pattern having a smaller pitch than the guide pattern.
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公开(公告)号:US20200209451A1
公开(公告)日:2020-07-02
申请号:US16640609
申请日:2019-07-30
Applicant: DEXERIALS CORPORATION
Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
IPC: G02B5/30 , G02F1/1335
Abstract: Provided is a polarizing plate that is a polarizing plate having a wire grid structure, and includes a transparent substrate and a plurality of protrusions that extend in a first direction on the transparent substrate and are periodically arranged at a pitch shorter than a wavelength of light in a use band. Each of the protrusions includes a reflective layer, a multilayer film, and an optical property improving layer located between the reflective layer and the multilayer film. The optical property improving layer contains an oxide that contains a constituent element of which the reflective layer is composed. An etching rate of the optical property improving layer with respect to a chlorine-based gas is no less than 6.7 times and no more than 15 times an etching rate of the multilayer film.
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