公开(公告)号：US07476884B2

公开(公告)日：2009-01-13

申请号：US11354324

申请日：2006-02-14

申请人： Kai Gaebel ,  Juergen Kleinschmidt

发明人： Kai Gaebel ,  Juergen Kleinschmidt

IPC分类号： H05H1/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a source materials for the electric discharge serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

摘要翻译： 产生极紫外（EUV）辐射的装置和方法的目的是克服先前使用有效的金属发射体造成的障碍，从而可以优化转换效率，结果可以增加辐射输出 而不会缩短集光器和电极系统的使用寿命。 注射装置的注射喷嘴被引导到位于排放室中的排放区域。 注射喷嘴提供一系列单独体积的用于放电的源材料，用于以对应于气体放电频率的重复率产生辐射。 此外，提供了在排出区域中连续蒸发各个体积。

公开(公告)号：US07329014B2

公开(公告)日：2008-02-12

申请号：US11402391

申请日：2006-04-11

申请人： Istvan Balogh ,  Kai Gaebel

发明人： Istvan Balogh ,  Kai Gaebel

IPC分类号： G02B5/08

CPC分类号： G03F7/70175 ,  B82Y10/00 ,  G03F7/70166 ,  G21K1/062 ,  G21K2201/065

摘要： The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface. Heat of transient temperature spikes which occur in pulsed operation for plasma generation at the mirror surface and which temporarily exceed the temperature average by a multiple is quickly dissipated.

摘要翻译： 本发明涉及一种基于等离子体的短波长辐射的集光镜。 本发明的目的是找到一种用于管理用于聚焦由等离子体产生的短波长辐射的聚光镜的温度的新型可能性，其允许在光学活性反射镜表面和恒温器系统之间产生有效的热连接而无需 与空间要求有关的缺点或收集镜的高精度制造。 根据本发明，满足本发明的目的在于，收集器反射镜具有固体，旋转对称的基板，其包括具有大于50W / mK的高热导率的材料，并且其中用于冷却和温度管理的通道被并入 衬底，使得传热介质可以直接流过并快速稳定光学镜面的温度。 在脉冲操作中发生的瞬态温度峰值的热量，其在镜面处等离子体产生并且临时超过温度平均值的倍数被快速消散。

公开(公告)号：US20080067456A1

公开(公告)日：2008-03-20

申请号：US11733845

申请日：2007-04-11

申请人： DIETHARD KLOEPFEL ,  Kai Gaebel

发明人： DIETHARD KLOEPFEL ,  Kai Gaebel

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device. According to the invention, this object is met by using a mixture of particles with a carrier gas and the target feed device has a gas liquefaction chamber, wherein the target material is supplied to the injection unit as a mixture of solid particles in liquefied carrier gas, and a droplet generator is provided for generating a defined droplet size and series of droplets, wherein means which are controllable in a frequency-dependent manner and which are triggered by the pulse frequency of the energy beam are connected to the injection unit for the series of droplets.

摘要翻译： 本发明涉及一种用于从具有高转换效率的能量束产生的等离子体产生极紫外辐射的装置，特别是用于EUV光刻的辐射源中。 本发明的目的是找到一种通过能量束产生的等离子体产生EUV辐射的新型可能性，该等离子体能够将能量辐射更有效地转换成13.5nm波长区域中的EUV辐射，并确保长时间 光学部件和注射装置的使用寿命。 根据本发明，通过使用颗粒与载体气体的混合物来满足该目的，并且目标进料装置具有气体液化室，其中将目标材料作为液化载气中的固体颗粒的混合物供给到注射单元 ，并且提供液滴发生器，用于产生限定的液滴尺寸和一系列液滴，其中以频率相关方式可控制并且由能量束的脉冲频率触发的装置连接到用于串联的注射单元 的液滴。

公开(公告)号：US20060192157A1

公开(公告)日：2006-08-31

申请号：US11354324

申请日：2006-02-14

申请人： Kai Gaebel ,  Juergen Kleinschmidt

发明人： Kai Gaebel ,  Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005

摘要： It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a starting material serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

摘要翻译： 产生极紫外（EUV）辐射的装置和方法的目的是克服先前使用有效的金属发射体造成的障碍，从而可以优化转换效率，结果可以增加辐射输出 而不会缩短集光器和电极系统的使用寿命。 注射装置的注射喷嘴被引导到位于排放室中的排放区域。 注射喷嘴提供一系列单独的体积的起始材料，其用于以对应于气体放电的频率的重复率产生辐射。 此外，提供了在排出区域中连续蒸发各个体积。