公开(公告)号：US20160259251A1

公开(公告)日：2016-09-08

申请号：US14637459

申请日：2015-03-04

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Erik Robert HOSLER

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70008 ,  G03F7/70208 ,  G03F7/70991 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/008

Abstract: Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.

Abstract translation: 公开了用于接收高能EUV光束并将EUV子光束分布到光刻扫描仪和所得到的装置的方法。 实施例包括在主分裂光学组件处接收高能量的初级EUV光束; 将主EUV波束分为主EUV子波束; 将主要EUV子光束反射到分束光学阵列; 将主EUV子光束分成次级EUV子光束; 将次级EUV子光束反射到EUV分配光学阵列; 并且将次级EUV子光束同时分配到扫描仪。

公开(公告)号：US20130335816A1

公开(公告)日：2013-12-19

申请号：US13971031

申请日：2013-08-20

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss Laser Optics GmbH

Inventor： Holger Kierey ,  Heiko Siekmann ,  Andre Bresan

IPC: G02B5/20

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Abstract translation: 一种用于制造用于EUV投影曝光装置的反射型光学部件的方法，具有基体的部件和设置在基板上的反射层的部件，其中基板具有光学上的微结构化，包括以下步骤： 微结构化到衬底中，在微结构化已经加工到衬底中之后对衬底进行抛光，将反射层施加到衬底上。 用于EUV投影曝光装置的反射型光学部件对应地具有在微结构化和反射层之间的抛光表面。

公开(公告)号：US08153994B2

公开(公告)日：2012-04-10

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Riccardo Ghislanzoni

Inventor： Marco Pedrali ,  Riccardo Ghislanzoni

IPC: G21K5/00

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20120050704A1

公开(公告)日：2012-03-01

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/42 ,  H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

公开(公告)号：US20110128513A1

公开(公告)日：2011-06-02

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Ricardo Ghislanzoni

Inventor： Marco Pedrali ,  Ricardo Ghislanzoni

IPC: G03B27/52 ,  F28D15/00 ,  F28F9/02 ,  B21D53/02

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface.Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US07483223B2

公开(公告)日：2009-01-27

申请号：US11245288

申请日：2005-10-06

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: G02B7/02

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

Abstract translation: 光学部件包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个 光学元件以热传导方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。 附加地或替代地，提供了一种控制光学元件的至少一部分的温度的温度控制装置。

公开(公告)号：US20090021950A1

公开(公告)日：2009-01-22

申请号：US12241640

申请日：2008-09-30

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: B60Q1/06

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

Abstract translation: 光学部件包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个 光学元件以热传导方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。 附加地或替代地，提供了一种控制光学元件的至少一部分的温度的温度控制装置。

公开(公告)号：US20060227826A1

公开(公告)日：2006-10-12

申请号：US11402391

申请日：2006-04-11

Applicant: Istvan Balogh ,  Kai Gaebel

Inventor： Istvan Balogh ,  Kai Gaebel

IPC: H01S3/04

CPC classification number: G03F7/70175 ,  B82Y10/00 ,  G03F7/70166 ,  G21K1/062 ,  G21K2201/065

Abstract: The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface. Heat of transient temperature spikes which occur in pulsed operation for plasma generation at the mirror surface and which temporarily exceed the temperature average by a multiple is quickly dissipated.

Abstract translation: 本发明涉及一种基于等离子体的短波长辐射的集光镜。 本发明的目的是找到一种用于管理用于聚焦由等离子体产生的短波长辐射的聚光镜的温度的新型可能性，其允许在光学活性反射镜表面和恒温器系统之间产生有效的热连接而无需 与空间要求有关的缺点或收集镜的高精度制造。 根据本发明，满足本发明的目的在于，收集器反射镜具有固体，旋转对称的基板，其包括具有大于50W / mK的高热导率的材料，并且其中用于冷却和温度管理的通道被并入 衬底，使得传热介质可以直接流过并快速稳定光学镜面的温度。 在脉冲操作中发生的瞬态温度峰值的热量，其在镜面处等离子体产生并且临时超过温度平均值的倍数被快速消散。

公开(公告)号：US20050185307A1

公开(公告)日：2005-08-25

申请号：US11016059

申请日：2004-12-17

Applicant: Timo Laufer ,  Johannes Zellner

Inventor： Timo Laufer ,  Johannes Zellner

IPC: G02B1/00 ,  G03F1/24 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  A61N5/00 ,  G02B7/192 ,  G21G5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G02B1/00 ,  G03F1/24 ,  G03F7/70858 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/065

Abstract: The invention relates to an optical component comprising a material which has a coefficient of thermal expansion α. The invention is characterized in that the coefficient of thermal expansion is dependent on location and the following applies to the location-dependent coefficient of thermal expansion: α={overscore (α)}+Δα, with Δα being the maximum deviation of the coefficient of thermal expansion from the mean value of the coefficient of thermal expansion {overscore (α)} of the substrate material, represented by alternatingly arranged inhomogeneity zones with a maximum coefficient of thermal expansion {overscore (α)}+Δα and minimum coefficient of thermal expansion {overscore (α)}−Δα of width w or the period 2w=x, and the deviation Δα of the coefficient of thermal expansion meets the following homogeneity condition depending on the thermal output {dot over (Q)} as absorbed by the optical component, the resulting emissivity {overscore (ε)} and the permitted aberrations of the optical surface:  Δ ⁢   ⁢ α  ≤ ( 0 ⁢ . ⁢ 14 + 0.1 · x mm + 390 ⁢   ⁢ mm x ) ⁢ ppb · W K · ɛ _ Q .

公开(公告)号：US20030043455A1

公开(公告)日：2003-03-06

申请号：US10055608

申请日：2002-01-23

Inventor： Wolfgang Singer ,  Johannes Wangler

IPC: G02B005/08

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector for guiding light with a wavelength of null193 nm onto a plane. The collector includes a first mirror shell for receiving a first ring aperture section of the light and irradiating a first planar ring section of the plane with a first irradiance, and a second mirror shell for receiving a second ring aperture section of the light and irradiating a second planar ring section of the plane with a second irradiance. The first and second mirror shells are rotationally symmetrical and concentrically arranged around a common axis of rotation, the first and second ring aperture sections do not overlap with one another, the first planar ring section substantially abuts the second planar ring section, and the first irradiance is approximately equal to the second irradiance.

Abstract translation: 提供了用于将波长<= 193nm的光引导到平面上的收集器。 收集器包括第一反射镜壳体，用于接收光的第一环孔部分并以第一辐照度照射平面的第一平面环部分，以及用于接收光的第二环孔部分并照射光 具有第二辐照度的平面的第二平面环部分。 第一和第二镜壳围绕公共旋转轴线旋转对称并且同心地布置，第一和第二环孔部分彼此不重叠，第一平面环部分基本上邻接第二平面环部分，并且第一辐照度 大约等于第二辐照度。