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    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING HAVING A TAPERED MAIN POLE
    21.
    发明申请
    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING HAVING A TAPERED MAIN POLE 有权
    用于具有切割主要特征的磁记录磁头

    公开(公告)号：US20120147500A1

    公开(公告)日：2012-06-14

    申请号：US12964202

    申请日：2010-12-09

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Atsushi IIJIMA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Atsushi IIJIMA

    IPC分类号： G11B5/17

    CPC分类号： G11B5/3116 ,  G11B5/1278

    摘要： A bottom end of a main pole includes first, second, and third portions that are contiguously arranged in order of increasing distance from the medium facing surface. A top surface of the main pole includes fourth, fifth, and sixth portions that are contiguously arranged in order of increasing distance from the medium facing surface. A distance from the top surface of the substrate to any given point on each of the first and second portions decreases with increasing distance from the given point to the medium facing surface. The second portion has an angle of inclination greater than that of the first portion with respect to a direction perpendicular to the medium facing surface. A distance from the top surface of the substrate to any given point on each of the fourth and fifth portions increases with increasing distance from the given point to the medium facing surface. The fifth portion has an angle of inclination greater than that of the fourth portion with respect to the direction perpendicular to the medium facing surface.

    摘要翻译： 主极的底端包括第一，第二和第三部分，其按照从与介质面向表面的距离增加的顺序连续排列。 主极的顶表面包括第四，第五和第六部分，其顺序地依次布置成与介质面向表面的距离。 从基板的顶表面到每个第一和第二部分上的任何给定点的距离随着从给定点到介质面向表面的距离的增加而减小。 第二部分相对于与面向介质的表面垂直的方向具有大于第一部分的倾斜角。 随着从给定点到面向介质的表面的距离的增加，从衬底的顶表面到每个第四和第五部分上的任何给定点的距离增加。 第五部分相对于与面向介质的表面垂直的方向具有大于第四部分的倾斜角。

    METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD INCLUDING A COIL AND A MAGNETIC PATH FORMING SECTION
    22.
    发明申请
    METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD INCLUDING A COIL AND A MAGNETIC PATH FORMING SECTION 有权
    制造包括线圈和磁路形成部分的薄膜磁头的方法

    公开(公告)号：US20160115612A1

    公开(公告)日：2016-04-28

    申请号：US14523415

    申请日：2014-10-24

    申请人： Yukinori IKEGAWA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    发明人： Yukinori IKEGAWA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    IPC分类号： C25D7/00 ,  C23F4/00 ,  G11B5/39 ,  C25D5/02

    CPC分类号： C25D7/001 ,  C25D5/022 ,  G11B5/3123

    摘要： A thin-film magnetic head includes a coil, a magnetic path forming section, and an insulating film. The magnetic path forming section includes first and second magnetic material portions. The coil includes first and second coil elements located between the first and second magnetic material portions. The insulating film includes an underlying portion located under the first and second coil elements. In a method of manufacturing the thin-film magnetic head, the insulating film is formed to cover the first and second magnetic material portions, and then a seed layer is formed selectively on the underlying portion of the insulating film. The coil is formed by plating using the seed layer.

    摘要翻译： 薄膜磁头包括线圈，磁路形成部分和绝缘膜。 磁路形成部分包括第一和第二磁性材料部分。 线圈包括位于第一和第二磁性材料部分之间的第一和第二线圈元件。 绝缘膜包括位于第一和第二线圈元件下方的下部。 在制造薄膜磁头的方法中，形成绝缘膜以覆盖第一和第二磁性材料部分，然后选择性地在绝缘膜的下面部分上形成晶种层。 线圈通过使用籽晶层进行电镀而形成。

    THERMALLY-ASSISTED MAGNETIC RECORDING HEAD INCLUDING A MAIN POLE AND A PLASMON GENERATOR
    23.
    发明申请
    THERMALLY-ASSISTED MAGNETIC RECORDING HEAD INCLUDING A MAIN POLE AND A PLASMON GENERATOR 有权
    热辅助磁记录头，包括一个主点和一个等离子发生器

    公开(公告)号：US20170047087A1

    公开(公告)日：2017-02-16

    申请号：US14825020

    申请日：2015-08-12

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    IPC分类号： G11B5/48 ,  G11B5/31

    CPC分类号： G11B5/4866 ,  G11B5/012 ,  G11B5/11 ,  G11B5/127 ,  G11B5/1278 ,  G11B5/187 ,  G11B5/313 ,  G11B5/3133 ,  G11B5/314 ,  G11B5/3163 ,  G11B5/60 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A main pole has a front end face including a first end face portion and a second end face portion. A plasmon generator has a near-field light generating surface. A surrounding layer has a first surrounding layer end face and a second surrounding layer end face located on opposite sides of the first end face portion in the track width direction. A gap film has a first gap film end face and a second gap film end face located on opposite sides of the near-field light generating surface in the track width direction. Each of the first and second gap film end faces includes a portion located between the first and second surrounding layer end faces, but does not include any portion interposed between the first surrounding layer end face and the first end face portion or between the second surrounding layer end face and the first end face portion.

    摘要翻译： 主极具有包括第一端面部和第二端面部的前端面。 等离子体发生器具有近场光产生表面。 周围层具有在轨道宽度方向上位于第一端面部的相对侧的第一环绕层端面和第二环绕层端面。 间隙膜具有在轨道宽度方向上位于近场光产生表面的相对侧上的第一间隙膜端面和第二间隙膜端面。 第一和第二间隙膜端面中的每一个包括位于第一和第二包围层端面之间的部分，但不包括介于第一环绕层端面与第一端面部之间或第二环绕层之间的部分 端面和第一端面部。

    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS
    24.
    发明申请
    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS 有权
    等离子发生器，包括不同金属的两个部分

    公开(公告)号：US20140247706A1

    公开(公告)日：2014-09-04

    申请号：US13783933

    申请日：2013-03-04

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    IPC分类号： G11B13/08

    CPC分类号： G11B13/08 ,  G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A plasmon generator has a front end face located in a medium facing surface of a magnetic head. The plasmon generator includes a first portion formed of a first metal material and a second portion formed of a second metal material. The first portion has an inclined surface facing toward the front end face. The second portion is located between the inclined surface and the front end face, and includes a first end face located in the front end face and a second end face in contact with the inclined surface. The second metal material is higher in Vickers hardness than the first metal material. The first portion has a plasmon exciting part. The front end face generates near-field light.

    摘要翻译： 等离子体发生器具有位于磁头的介质面向表面中的前端面。 等离子体发生器包括由第一金属材料形成的第一部分和由第二金属材料形成的第二部分。 第一部分具有面向前端面的倾斜表面。 第二部分位于倾斜表面和前端面之间，并且包括位于前端面中的第一端面和与倾斜表面接触的第二端面。 第二种金属材料的维氏硬度高于第一种金属材料。 第一部分具有等离子体激元部分。 前端面产生近场光。

    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    27.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号：US20140175053A1

    公开(公告)日：2014-06-26

    申请号：US14189574

    申请日：2014-02-25

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA

    IPC分类号： G11B5/31

    CPC分类号： G11B5/31 ,  B44C1/22 ,  G02B6/1226 ,  G11B5/3163 ,  G11B7/22 ,  G11B2005/0021

    摘要： A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases.

    摘要翻译： 对由电介质材料制成并具有顶表面的被蚀刻层进行锥形蚀刻的方法。 该方法包括以下步骤：在待蚀刻层的顶表面上形成具有开口的蚀刻掩模; 并且通过反应离子蚀刻使待蚀刻的层的一部分从开口暴露出来，使得在待蚀刻的层中形成具有与预定角度相交的两个壁面的凹槽。 锥蚀刻的步骤使用包含有助于蚀刻被蚀刻层的第一气体的蚀刻气体和有助于沉积侧壁保护膜的第二气体，并且在该步骤期间改变流动比 第二气体与第一气体的流量的比率使得该比率增加。

    METHOD OF MANUFACTURING A NEAR-FIELD LIGHT GENERATOR INCLUDING A WAVEGUIDE AND A PLASMON GENERATOR
    29.
    发明申请
    METHOD OF MANUFACTURING A NEAR-FIELD LIGHT GENERATOR INCLUDING A WAVEGUIDE AND A PLASMON GENERATOR 有权
    一种包括波导和等离子发生器在内的近场光发生器的制造方法

    公开(公告)号：US20140291284A1

    公开(公告)日：2014-10-02

    申请号：US13851603

    申请日：2013-03-27

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Seiichiro TOMITA ,  Shigeki TANEMURA ,  Kazumasa YASUDA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Seiichiro TOMITA ,  Shigeki TANEMURA ,  Kazumasa YASUDA

    IPC分类号： G02B6/122

    CPC分类号： G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： In a method of manufacturing a near-field light generator, a structure including a core and a polishing stopper layer disposed on the top surface of the core is formed on a first cladding layer. Next, a cladding material layer is formed to cover the first cladding layer and the structure. The cladding material layer is then polished until the polishing stopper layer is exposed. Next, the polishing stopper layer is removed so that the cladding material layer has a protruding portion protruding upward to a higher level than the top surface of the core. The cladding material layer is then polished so as to remove the protruding portion and thereby make the cladding material layer into a second cladding layer. Then, a third cladding layer and a plasmon generator are formed.

    摘要翻译： 在制造近场光发生器的方法中，在第一包层上形成包括设置在芯的顶表面上的芯和抛光阻挡层的结构。 接下来，形成包层材料层以覆盖第一包层和结构。 然后抛光包层材料层直到抛光停止层露出。 接下来，去除抛光停止层，使得包层材料层具有向上突出到比芯的顶表面更高的水平的突出部分。 然后对覆层材料层进行研磨以除去突出部分，从而使包层材料层成为第二覆层。 然后，形成第三包覆层和等离子体发生器。

    MULTILAYER PLASMON GENERATOR
    30.
    发明申请
    MULTILAYER PLASMON GENERATOR 有权
    多层等离子发生器

    公开(公告)号：US20140269237A1

    公开(公告)日：2014-09-18

    申请号：US13846278

    申请日：2013-03-18

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    IPC分类号： G11B13/04 ,  B23K10/00

    CPC分类号： B23K10/00 ,  G02B6/1226 ,  G11B5/3133 ,  G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A plasmon generator has a front end face, a first metal layer, a second metal layer, and an intermediate layer. The front end face generates near-field light based on a surface plasmon. The intermediate layer is interposed between the first metal layer and the second metal layer. Each of the first metal layer, the second metal layer and the intermediate layer has an end located in the front end face. Each of the first and second metal layers is formed of a metal material. The intermediate layer is formed of a material higher in Vickers hardness than the metal material used to form the first metal layer and the metal material used to form the second metal layer.

    摘要翻译： 等离子体发生器具有前端面，第一金属层，第二金属层和中间层。 前端面基于表面等离子体激发产生近场光。 中间层介于第一金属层和第二金属层之间。 第一金属层，第二金属层和中间层中的每一个具有位于前端面中的端部。 第一和第二金属层中的每一个由金属材料形成。 中间层由维氏硬度比用于形成第一金属层的金属材料和用于形成第二金属层的金属材料的材料形成。