Ultra-black film and method of manufacturing the same
    21.
    发明授权
    Ultra-black film and method of manufacturing the same 失效
    超黑膜及其制造方法

    公开(公告)号:US4984855A

    公开(公告)日:1991-01-15

    申请号:US268509

    申请日:1988-11-08

    IPC分类号: C23C18/36

    CPC分类号: C23C18/36 Y10S362/80

    摘要: An ultra-black film is disclosed, which essentially consists of a base, a Ni-P alloy layer formed on said base and a phosphate layer formed on said Ni-P layer, the spectral reflectance of said ultra-black film being 0.04 to 0.4%. The ultra-black film is obtainable by one of four methods, i.e., a first method, which comprises sequential steps of effecting primary etching of a Ni-P alloy film surface with an aqueous nitric acid solution and effecting secondary etching of the surface with an aqueous sulfuric-acid-containing nitrate solution, a second method, which comprises of effecting said secondary etching of a Ni-P alloy film surface a third method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphate, D, L-malic acid and malonic acid and effecting said secondary etching to the alloy film surface and a fourth method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphite, D, L-malic acid and succinic acid or basically composed of nickel salt, sodium hypophosphite, D, L-malic acid lactic acid and malonic acid and effecting said primary etching to the surface.