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    Method of manufacturing ultra-black film
    3.
    发明授权
    Method of manufacturing ultra-black film 失效
    制造超薄膜的方法

    公开(公告)号：US5074957A

    公开(公告)日：1991-12-24

    申请号：US595608

    申请日：1990-10-11

    申请人： Masao Horiuti ,  Shunichi Kodama ,  Kenji Kuroda

    发明人： Masao Horiuti ,  Shunichi Kodama ,  Kenji Kuroda

    IPC分类号： C23C18/36

    CPC分类号： C23C18/36 ,  Y10S362/80

    摘要： An ultra-black film is disclosed, which essentially consists of a base, a Ni-P alloy layer formed on said base and a phosphate layer formed on said Ni-P layer, the spectral reflectance of said ultra-black film being 0.04 to 0.4%. The ultra-black film is obtainable by one of four methods, i.e., a first method, which comprises sequential steps of effecting primary etching of a Ni-P alloy film surface with an aqueous nitric acid solution and effecting secondary etching of the surface with an aqueous sulfuric-acid-containing nitrate solution, a second method, which comprises of effecting said secondary etching of a Ni-P alloy film surface a third method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphite, D, L-malic acid and malonic acid and effecting said secondary etching to the alloy film surface and a fourth method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphite, D, L-malic acid and succinic acid or basically composed of nickel salt, sodium hypophosphite, D, L-malic acid lactic acid and malonic acid and effecting said primary etching to the surface.

    Ultra-black film and method of manufacturing the same
    6.
    发明授权
    Ultra-black film and method of manufacturing the same 失效
    超黑膜及其制造方法

    公开(公告)号：US4984855A

    公开(公告)日：1991-01-15

    申请号：US268509

    申请日：1988-11-08

    申请人： Masao Horiuti ,  Shunichi Kodama ,  Kenji Kuroda

    发明人： Masao Horiuti ,  Shunichi Kodama ,  Kenji Kuroda

    IPC分类号： C23C18/36

    CPC分类号： C23C18/36 ,  Y10S362/80

    摘要： An ultra-black film is disclosed, which essentially consists of a base, a Ni-P alloy layer formed on said base and a phosphate layer formed on said Ni-P layer, the spectral reflectance of said ultra-black film being 0.04 to 0.4%. The ultra-black film is obtainable by one of four methods, i.e., a first method, which comprises sequential steps of effecting primary etching of a Ni-P alloy film surface with an aqueous nitric acid solution and effecting secondary etching of the surface with an aqueous sulfuric-acid-containing nitrate solution, a second method, which comprises of effecting said secondary etching of a Ni-P alloy film surface a third method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphate, D, L-malic acid and malonic acid and effecting said secondary etching to the alloy film surface and a fourth method, which comprises sequential steps of forming a Ni-P alloy film on a base by using a plating solution basically composed of nickel salt, sodium hypophosphite, D, L-malic acid and succinic acid or basically composed of nickel salt, sodium hypophosphite, D, L-malic acid lactic acid and malonic acid and effecting said primary etching to the surface.