METHOD FOR PRODUCING GLASS FOR DISPLAY SUBSTRATE
    21.
    发明申请
    METHOD FOR PRODUCING GLASS FOR DISPLAY SUBSTRATE 有权
    用于制造用于显示基板的玻璃的方法

    公开(公告)号:US20120178612A1

    公开(公告)日:2012-07-12

    申请号:US13423907

    申请日:2012-03-19

    CPC分类号: C03C3/093 C03C3/097

    摘要: A glass for a display substrate composed of 50 to 70% SiO2, 10 to 25% Al2O3, 8.4 to 20% B2O3, 0 to 10% MgO, 6 to 15% CaO, 0 to 10% BaO, 0 to 10% SrO, 0 to 10% ZnO, 0 to 5% TiO2, 0 to 5% P2O5, 0.01 to 0.2% alkali metal, and from 0.01% to less than 0.4% ZrO2, as expressed in % by mass. The glass can have a β-OH value of 0.20/mm or more and an area of 0.1 m2 or more. The glass is produced by mixing raw materials to provide the SiO2, Al2O3, B2O3, MgO, CaO, BaO, SrO, ZnO, TiO2, P2O5 and alkali metal contents, electrically melting the raw materials in a melting furnace constructed of a high zirconia refractory; and refining, homogenizing and forming the glass melt.

    摘要翻译: 一种用于显示基板的玻璃,由50-70%SiO 2,10-25%Al 2 O 3,8.4至20%B 2 O 3,0至10%MgO,6至15%CaO,0至10%BaO,0至10%SrO, 0〜10%的ZnO,0〜5%的TiO 2,0〜5%的P 2 O 5,0.01〜0.2%的碱金属和0.01〜0.4%的ZrO 2。 玻璃可以具有0.20 / mm以上的-OH值,0.1m 2以上的面积。 通过混合原料制备玻璃,以提供SiO 2,Al 2 O 3,B 2 O 3,MgO,CaO,BaO,SrO,ZnO,TiO 2,P 2 O 5和碱金属含量,在由高耐氧化锆耐火材料构成的熔炉中将原料电熔融 ; 并精炼,均化和形成玻璃熔体。

    Method for producing glass for display substrate
    22.
    发明申请
    Method for producing glass for display substrate 审中-公开
    显示基板用玻璃的制造方法

    公开(公告)号:US20110217534A1

    公开(公告)日:2011-09-08

    申请号:US13067185

    申请日:2011-05-13

    CPC分类号: C03C3/093 C03C3/097

    摘要: A glass for a display substrate composed of 50 to 70% SiO2, 10 to 25% Al2O3, 8.4 to 20% B2O3, 0 to 10% MgO, 6 to 15% CaO, 0 to 10% BaO, 0 to 10% SrO, 0 to 10% ZnO, 0 to 5% TiO2, 0 to 5% P2O5, 0.01 to 0.2% alkali metal, and from 0.01% to less than 0.4% ZrO2, as expressed in % by mass. The glass can have a β-OH value of 0.20/mm or more and an area of 0.1 m2 or more. The glass is produced by mixing raw materials to provide the SiO2, Al2O3, B2O3, MgO, CaO, BaO, SrO, ZnO, TiO2, P2O5 and alkali metal contents, electrically melting the raw materials in a melting furnace constructed of a high zirconia refractory; and refining, homogenizing and forming the glass melt.

    摘要翻译: 一种用于显示基板的玻璃,由50-70%SiO 2,10-25%Al 2 O 3,8.4至20%B 2 O 3,0至10%MgO,6至15%CaO,0至10%BaO,0至10%SrO, 0〜10%的ZnO,0〜5%的TiO 2,0〜5%的P 2 O 5,0.01〜0.2%的碱金属和0.01〜0.4%的ZrO 2。 玻璃可以具有0.20 / mm以上的-OH值,0.1m 2以上的面积。 通过混合原料制备玻璃,以提供SiO 2,Al 2 O 3,B 2 O 3,MgO,CaO,BaO,SrO,ZnO,TiO 2,P 2 O 5和碱金属含量,在由高耐氧化锆耐火材料构成的熔炉中将原料电熔融 ; 并精炼,均化和形成玻璃熔体。

    VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION SYSTEM
    25.
    发明申请
    VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION SYSTEM 审中-公开
    蒸气沉积法和蒸发沉积系统

    公开(公告)号:US20110311717A1

    公开(公告)日:2011-12-22

    申请号:US13151435

    申请日:2011-06-02

    IPC分类号: C23C16/44 B05D5/06 B05D5/12

    摘要: Provided is a vapor deposition method of forming one or a plurality of layers on a one surface (7a) side of a glass substrate (7), the one or the plurality of layers including an organic layer (4), the vapor deposition method including: forming at least one layer of the one or the plurality of layers by vapor deposition treatment; and in the vapor deposition treatment, bringing one surface (15a) of a cooling plate (15) for cooling the glass substrate (7) into direct surface contact with another surface (7b) of the glass substrate (7), and bringing the contact surfaces (7b and 15a) of the cooling plate and the glass substrate into an intimate contact with each other to an extent of being peelable by the direct surface contact.

    摘要翻译: 提供一种在玻璃基板(7)的一个表面(7a)侧形成一个或多个层的气相沉积方法,所述一个或多个层包括有机层(4),该蒸镀方法包括 :通过气相沉积处理形成所述一层或多层的至少一层; 在气相沉积处理中,将用于冷却玻璃基板(7)的冷却板(15)的一个表面(15a)与玻璃基板(7)的另一表面(7b)直接表面接触,并使接点 冷却板和玻璃基板的表面(7b和15a)彼此紧密接触到通过直接表面接触可剥离的程度。

    Alkali-Free Glass Substrate And Process For Producing The Same
    26.
    发明申请
    Alkali-Free Glass Substrate And Process For Producing The Same 有权
    无碱玻璃基板及其生产工艺

    公开(公告)号:US20090170684A1

    公开(公告)日:2009-07-02

    申请号:US12097410

    申请日:2006-12-15

    IPC分类号: C03C3/064 C03B17/06

    摘要: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.

    摘要翻译: 本发明提供了热收缩率变化较小的无碱玻璃基板及其制造方法。 当将无碱玻璃基板以10℃/分钟的速度从室温加热保持在保持状态时,本发明的无碱玻璃基板的热收缩绝对值为50ppm以上 温度为450℃10小时,然后以10℃/ min的速率冷却。

    Manufacturing method of glass substrate for display
    27.
    发明申请
    Manufacturing method of glass substrate for display 审中-公开
    显示用玻璃基板的制造方法

    公开(公告)号:US20090071194A1

    公开(公告)日:2009-03-19

    申请号:US12289795

    申请日:2008-11-04

    IPC分类号: C03B19/00 C03B17/00

    摘要: A method of manufacturing a glass substrate for a display including the steps of: preparing a glass raw material blended so as to adjust as, on the basis of mass percentage, SiO2 40-70%, Al2O3 2-25%, B2O3 0-20%, MgO 0-3.5%, CaO 0-15%, SrO 0-10%, BaO 0-2%, ZnO 0-10%, R2O 0-25% (where R denotes at least one of Li, Na and K), As2O3 0-0.4%, Sb2O3 0-0.9%, and 0.1%

    摘要翻译: 一种制造用于显示器的玻璃基板的方法,包括以下步骤:制备混合的玻璃原料,以基于质量百分比调节SiO 2 40-70%,Al 2 O 3 2-25%,B 2 O 3 0-20 %,MgO 0-3.5%,CaO 0-15%,SrO 0-10%,BaO 0-2%,ZnO 0-10%,R 2 O 0-25%(其中R表示Li,Na和K中的至少一种 ),As2O3 0-0.4%,Sb2O3 0-0.9%和0.1%

    Alkali-free glass substrate and process for producing the same
    29.
    发明授权
    Alkali-free glass substrate and process for producing the same 有权
    无碱玻璃基板及其制造方法

    公开(公告)号:US08281618B2

    公开(公告)日:2012-10-09

    申请号:US12097410

    申请日:2006-12-15

    IPC分类号: C03B17/00 C03B17/06

    摘要: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.

    摘要翻译: 本发明提供了热收缩率变化较小的无碱玻璃基板及其制造方法。 当将无碱玻璃基板以10℃/分钟的速度从室温加热保持在保持状态时,本发明的无碱玻璃基板的热收缩绝对值为50ppm以上 温度为450℃10小时,然后以10℃/ min的速率冷却。

    ALKALI-FREE GLASS SUBSTRATE AND PROCESS FOR PRODUCING THE SAME
    30.
    发明申请
    ALKALI-FREE GLASS SUBSTRATE AND PROCESS FOR PRODUCING THE SAME 审中-公开
    无碱玻璃基材及其制造方法

    公开(公告)号:US20120178613A1

    公开(公告)日:2012-07-12

    申请号:US13402316

    申请日:2012-02-22

    摘要: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.

    摘要翻译: 本发明提供了热收缩率变化较小的无碱玻璃基板及其制造方法。 当将无碱玻璃基板以10℃/分钟的速度从室温加热保持在保持状态时,本发明的无碱玻璃基板的热收缩绝对值为50ppm以上 温度为450℃10小时,然后以10℃/ min的速率冷却。