公开(公告)号：US06980897B2

公开(公告)日：2005-12-27

申请号：US10664814

申请日：2003-09-17

申请人： Takanori Aoki ,  Makoto Sawada ,  Masahiro Yamamoto ,  Midori Yamaguchi ,  Toshiji Iida

发明人： Takanori Aoki ,  Makoto Sawada ,  Masahiro Yamamoto ,  Midori Yamaguchi ,  Toshiji Iida

IPC分类号： F16H9/00 ,  F16H59/68 ,  F16H61/02 ,  F16H61/66 ,  F16H61/662 ,  G06F7/00

CPC分类号： F16H61/66254 ,  F16H61/66272 ,  Y10T477/6197

摘要： There is provided an oil pressure reduction rate restricting apparatus for a V-belt type continuously variable transmission, which is comprised of a reduction rate restricting section that calculates a reduction rate restricted secondary pressure and a reduction rate restricted primary pressure by restricting respective reduction rates of the target secondary pressure and the target primary pressure when the reduction rates of the target secondary pressure and the target primary pressure calculated by a target secondary pressure calculating section and a target primary pressure calculating section, respectively, are equal to or greater than respective predetermined values. The secondary pressure and the primary pressure are controlled based on the reduction rate restricted secondary pressure and the reduction rate restricted primary pressure whose reduction rates have been restricted such that the gradient thereof are small. This prevents the actual secondary pressure and primary pressure from undershooting the respective target pressures, and therefore prevents a shortage in torque capacity, which is caused by oil pressure decrease.

摘要翻译： 提供了一种用于V型皮带式无级变速器的油压降低率限制装置，其包括通过限制相应的减速率来计算减速率限制二次压力和减速率限制一次压力的减速率限制部分 当由目标二次压力计算部和目标主压力计算部计算出的目标二次压力和目标一次压力的压下率分别等于或大于相应的预定值时，目标二次压力和目标主压力 。 二次压力和一次压力基于限制二次压力的还原率和限制了其降低率的压缩率限制的一次压力被控制，使得其梯度小。 这样可以防止实际的次级压力和一次压力低于相应的目标压力，从而防止由油压下降引起的扭矩容量的不足。

公开(公告)号：US4828392A

公开(公告)日：1989-05-09

申请号：US837766

申请日：1986-03-10

申请人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

发明人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7076

摘要： A reduction projection type alignment and exposure apparatus which comprises a light source, a reticle having a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a substrate having a second grating, and a plurality of photo-detectors for detecting light intensities of a plurality of spectrums appearing on the spatial filter.The light beam generated from the light source is applied to the reticle at which it is divided into a plurality of diffracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, the spatial filter and the second lens system onto the substrate so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams appear as a plurality of spectrums on the spatial filter. These spectrums are detected by photo-detectors and used for alignment of the reticle and the substrate.

摘要翻译： 一种还原投影型取向曝光装置，包括光源，具有第一光栅的掩模版，第一透镜系统，设置在第一透镜系统的傅立叶光谱平面附近的空间滤光器，第二透镜系统，具有第二光栅的基板 以及用于检测出现在空间滤波器上的多个光谱的光强度的多个光检测器。 从光源产生的光束被施加到光掩模，在该掩模版处，由第一光栅将其分成多个衍射光束，衍射光束通过第一透镜系统，空间滤光器和第二透镜 系统到基板上，使得衍射光束被第二光栅重衍射，并且再衍射光束在空间滤光器上表现为多个光谱。 这些光谱由光电检测器检测并用于对准标线片和基板。