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公开(公告)号:US20160238791A1
公开(公告)日:2016-08-18
申请号:US14625023
申请日:2015-02-18
Applicant: Oracle International Corporation
Inventor: Stevan S. Djordjevic , Shiyun Lin , Ivan Shubin , Xuezhe Zheng , John E. Cunningham , Ashok V. Krishnamoorthy
CPC classification number: G02B6/29395 , G02B6/13 , G02B6/2934 , G02F1/2257
Abstract: An optical device is described. This optical device includes optical components having resonance wavelengths that match target values with a predefined accuracy (such as 0.1 nm) and with a predefined time stability (such as permanent or an infinite time stability) without thermal tuning and/or electronic tuning. The stable, accurate resonance wavelengths may be achieved using a wafer-scale, single (sub-second) shot trimming technique that permanently corrects the phase errors induced by material variations and fabrication inaccuracies in the optical components (and, more generally, resonant silicon-photonic optical components). In particular, the trimming technique may use photolithographic exposure of the optical components on the wafer in parallel, with time-modulation for each individual optical component based on active-element control. Note that the physical mechanism in the trimming technique may involve superficial room-temperature oxidation of the silicon surface, which is induced by deep-ultraviolet radiation in the presence of oxygen.
Abstract translation: 描述光学装置。 该光学装置包括具有与预定精度(例如0.1nm)匹配的目标值的谐振波长的光学部件,并且具有预定的时间稳定性(例如永久或无限时间稳定性),而不需要热调谐和/或电子调谐。 稳定,准确的共振波长可以使用晶片级单次(亚秒级)拍摄微调技术来实现,该技术永久地校正由光学部件中的材料变化和制造不精确性引起的相位误差(以及更一般地,谐振硅 - 光子学组件)。 特别地,修剪技术可以使用基于有源元件控制的每个单独光学部件的时间调制来并行地对晶片上的光学部件进行光刻曝光。 注意,修整技术中的物理机制可能涉及在氧存在下由深紫外线辐射诱导的硅表面的室温室温氧化。