公开(公告)号：US4343080A

公开(公告)日：1982-08-10

申请号：US155122

申请日：1980-05-30

申请人： Osamu Hataishi ,  Yoshinobu Momma ,  Ryoji Abe

发明人： Osamu Hataishi ,  Yoshinobu Momma ,  Ryoji Abe

IPC分类号： H01L21/316 ,  H01L21/331 ,  H01L21/76 ,  H01L29/73 ,  H01L21/22

CPC分类号： H01L21/76

摘要： In a case where a semiconductor device is produced comprising at least one semiconductor element, an isolation region surrounding the semiconductor element and a thick silicon oxide layer lying on and around the semiconductor element, the thick oxide layer is formed by thermally-oxidizing the epitaxial layer having a buried layer and, at the same time, the isolation region is formed in the epitaxial layer by heating for thermal oxidation. Prior to a step of introducing impurities into the epitaxial layer, a patterned thin silicon oxide layer is formed. This thin silicon oxide layer is varied into the thick oxide layer by the thermal-oxidation treatment.

摘要翻译： 在制造包括至少一个半导体元件，围绕半导体元件的隔离区域和位于半导体元件周围和周围的厚氧化硅层的半导体器件的情况下，通过热氧化外延层形成厚氧化物层 具有掩埋层，并且同时通过加热进行热氧化而在外延层中形成隔离区。 在将杂质引入外延层的步骤之前，形成图案化的氧化硅薄层。 该氧化硅薄层通过热氧化处理变成厚氧化物层。

公开(公告)号：US20080041097A1

公开(公告)日：2008-02-21

申请号：US11841042

申请日：2007-08-20

申请人： Ryo Oya ,  Kazunobu Sekiguchi ,  Masahiko Takagi ,  Ryoji Abe ,  Yoshiaki Kuwahara

发明人： Ryo Oya ,  Kazunobu Sekiguchi ,  Masahiko Takagi ,  Ryoji Abe ,  Yoshiaki Kuwahara

IPC分类号： F25B41/00 ,  F25B41/06

CPC分类号： F25B39/028

摘要： The present invention aims to provide a refrigerant distribution device which eliminates a need for maintaining a certain length of a straight portion at an inflow tube to a distributor, and for adjusting lengths of capillary tubes to send a refrigerant to each flow path of the refrigerant of a heat exchanger, and which resolves an unevenness of a liquid refrigerant at a bend of the inflow tube due to a centrifugal force. A refrigerant distribution device according to the present invention including an inflow tube, which is connected to a distributor for distributing and providing a refrigerant in a gas-liquid two-phase state to a heat exchanger, wherein an upstream side of the inflow tube is in an approximately horizontal position and a downstream side of the inflow tube is bent to stand approximately at a right angle, includes a bend of the inflow tube, a longitudinal form of which is made of a combination of straight lines and is bent approximately at a right angle.

摘要翻译： 本发明的目的在于提供一种制冷剂分配装置，其不需要在分流器的流入管处保持一定长度的直线部分，并且用于调节毛细管的长度以将致冷剂输送到制冷剂的每个流动路径 热交换器，其由于离心力而解决了流入管的弯曲处的液体制冷剂的不均匀性。 根据本发明的制冷剂分配装置包括流入管，该流入管连接到分配器，用于将气液两相状态的制冷剂分配并提供给热交换器，其中流入管的上游侧处于 流入管的大致水平位置和下游侧被弯曲成大致直角地放置，包括流入管的弯曲部，其纵向形式由直线组合并且大致向右弯曲 角度。

公开(公告)号：US07295670B2

公开(公告)日：2007-11-13

申请号：US10533653

申请日：2004-02-27

申请人： Ryoji Abe

发明人： Ryoji Abe

IPC分类号： H04M9/08

CPC分类号： H04R3/02

摘要： An acoustic feedback suppression apparatus according to the present invention comprises a notch filter (109) for filtering out acoustic feedback components, a plurality of first sample fast Fourier transformation means (118 to 120) for performing frequency analysis of every 512 data samples, a plurality of peak frequency detecting means (121 to 123) for detecting peak frequencies of respective channels, adding means (124) for adding signals on the respective channels, second sample fast Fourier transformation means (125) for performing frequency analysis of every 4096 data samples of the added signal, peak frequency detecting means (126) for detecting a peak frequency of the output signal outputted from the 4096 fast Fourier transformation means (125), and coefficient specifying means (129) for specifying filter coefficients of the notch filter (109).

摘要翻译： 根据本发明的声反馈抑制装置包括用于滤出声反馈分量的陷波滤波器（109），用于对每512个数据样本进行频率分析的多个第一采样快速傅里叶变换装置（118至120），多个 用于检测各个通道的峰值频率的峰值频率检测装置（121至123），用于在各个通道上相加信号的加法装置（124），用于对每个4096个数据样本进行频率分析的第二采样快速傅里叶变换装置 加法信号，用于检测从4096快速傅立叶变换装置输出的输出信号的峰值频率的峰值频率检测装置，以及用于指定陷波滤波器（109）的滤波器系数的系数指定装置（129） 。

公开(公告)号：US06219392B1

公开(公告)日：2001-04-17

申请号：US09482080

申请日：2000-01-13

申请人： Ryoji Abe

发明人： Ryoji Abe

IPC分类号： H04B110

CPC分类号： H03H17/0294

摘要： A filter device includes a first section for receiving data of a desired cutoff frequency. A second section operates for deciding whether the desired cutoff frequency is in a predetermined low frequency band or a predetermined high frequency band. The predetermined low frequency band is lower in frequency than the predetermined high frequency band. A third section stores data of filter coefficients corresponding to different cutoff frequencies in the predetermined low frequency band. A fourth section stores data of precalculated basic coefficients corresponding to different cutoff frequencies in the predetermined high frequency band. The precalculated basic coefficients are equal to values resulting from a part of calculation to provide final filter coefficients. A fifth section operates for calculating final filter coefficients from precalculated basic coefficients through a coefficient expanding process. In cases where the second section decides that the desired cutoff frequency is in the predetermined low frequency band, data of filter coefficients corresponding to the desired cutoff frequency are read out from the third section, and are set in a filtering section. In cases where the second section decides that the desired cutoff frequency is in the predetermined high frequency band, data of precalculated basic coefficients corresponding to the desired cutoff frequency are read out from the fourth section. Then, the fifth section is caused to calculate final filter coefficients from the read-out precalculated basic coefficients, and data of the calculated final filter coefficients are set in the filtering section.

摘要翻译： 滤波器装置包括用于接收期望截止频率的数据的第一部分。 第二部分用于确定期望的截止频率是否处于预定的低频带或预定的高频带。 预定的低频带的频率比预定的高频带低。 第三部分存储与预定低频带中的不同截止频率对应的滤波器系数的数据。 第四部分存储与预定高频带中的不同截止频率对应的预先计算的基本系数的数据。 预先计算的基本系数等于由一部分计算产生的值以提供最终的滤波器系数。 第五部分用于通过系数扩展过程从预先计算的基本系数计算最终滤波器系数。 在第二部分确定期望的截止频率处于预定的低频带的情况下，从第三部分读出对应于期望的截止频率的滤波器系数的数据，并将其设置在滤波部分中。 在第二部分确定期望的截止频率处于预定的高频带的情况下，从第四部分读出与期望的截止频率对应的预先计算的基本系数的数据。 然后，使第五部分根据读出的预先计算的基本系数计算最终滤波器系数，并且在滤波部分中设置所计算的最终滤波器系数的数据。

公开(公告)号：US06214136B1

公开(公告)日：2001-04-10

申请号：US09124239

申请日：1998-07-29

申请人： Kazuyuki Yoshimoto ,  Ryoji Abe ,  Yukihiro Sugimoto ,  Fuminori Ishimura ,  Yukio Yamamoto ,  Nobuyuki Oda ,  Yukiyoshi Fukuda ,  Toshio Miyatani ,  Hiroshi Kodama ,  Akihiro Nakano

发明人： Kazuyuki Yoshimoto ,  Ryoji Abe ,  Yukihiro Sugimoto ,  Fuminori Ishimura ,  Yukio Yamamoto ,  Nobuyuki Oda ,  Yukiyoshi Fukuda ,  Toshio Miyatani ,  Hiroshi Kodama ,  Akihiro Nakano

IPC分类号： C21D1613

CPC分类号： C21D1/60 ,  C22F1/00 ,  C22F1/04

摘要： The film boiling state of a refrigerant is maintained for a time longer than in the prior art by t to lower the nuclear boiling start temperature to a temperature at which the material proof strength of a work exceeds thermal stress, thereby lowering the cooling rate of the work. In addition, by controlling the cooling rate in hardening, the film boiling state of the refrigerant is maintained to a temperature at which the material proof strength exceeds thermal stress, thereby cooling the work at a temperature equal to or higher than the critical cooling rate of the work.

摘要翻译： 制冷剂的薄膜沸腾状态比现有技术中的t保持时间要长，以将核沸腾开始温度降低到工件的耐热强度超过热应力的温度，从而降低 工作。 此外，通过控制硬化时的冷却速度，制冷剂的膜沸腾状态保持在耐材料强度超过热应力的温度，从而将工件在等于或高于临界冷却速度的温度 工作。