公开(公告)号：US20170282210A1

公开(公告)日：2017-10-05

申请号：US15471405

申请日：2017-03-28

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Manabu OKUTANI ,  Takashi OTA ,  Hiroshi ABE ,  Naohiko YOSHIHARA

IPC: B05D1/00 ,  B05B3/02

Abstract: A processing liquid is supplied to an upper surface of a horizontally-held substrate to form a liquid film of the processing liquid that covers an entirety of the substrate upper surface. The substrate is heated to evaporate the processing liquid in contact with the upper surface of the substrate to form a gas phase layer between the upper surface of the substrate and the liquid film of the processing liquid. After the gas phase layer has been formed, a gas is blown onto the liquid film above the substrate to open a hole in the liquid film. The gas is blown onto a region inside the hole in the liquid film to move the liquid film on the gas phase layer. A direction of a gas stream at a substrate outer peripheral portion is changed to remove the liquid film at the substrate outer peripheral portion.