SEMICONDUCTOR GAS SENSOR DEVICE AND MANUFACTURING METHOD THEREOF
    21.
    发明申请
    SEMICONDUCTOR GAS SENSOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    半导体气体传感器装置及其制造方法

    公开(公告)号:US20150377813A1

    公开(公告)日:2015-12-31

    申请号:US14725842

    申请日:2015-05-29

    Abstract: A semiconductor gas sensor device includes a first cavity that is enclosed by opposing first and second semiconductor substrate slices. At least one conducting filament is provided to extend over the first cavity, and a passageway is provided to permit gas to enter the first cavity. The sensor device may further including a second cavity that is hermetically enclosed by the opposing first and second semiconductor substrate slices. At least one another conducting filament is provided to extend over the second cavity.

    Abstract translation: 半导体气体传感器装置包括由相对的第一和第二半导体衬底切片包围的第一腔体。 提供至少一个导电细丝以在第一腔上延伸,并且设置通道以允许气体进入第一腔。 传感器装置还可以包括被相对的第一和第二半导体衬底切片气密地包围的第二腔体。 提供至少另一个导电细丝以在第二腔上延伸。

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