公开(公告)号：US20050040813A1

公开(公告)日：2005-02-24

申请号：US10646547

申请日：2003-08-21

申请人： Suresh Ramarajan

发明人： Suresh Ramarajan

IPC分类号： G01P15/00 ,  G01P15/105 ,  G01P3/48 ,  G01P3/54

CPC分类号： G01P15/003 ,  G01P15/105

摘要： Apparatuses and methods for monitoring microfeature workpiece rotation during processing, such as brushing, by monitoring characteristics corresponding to a state of a magnetic field proximate to the rotating microfeature workpiece are disclosed herein. The characteristic can depend on the relative motion between the magnetic field and the conductive material of the microfeature workpiece. The characteristic can include the strength of the magnetic field, current in an electromagnet circuit used to create the magnetic field, force exerted on the magnetic field source, or movement of the magnetic field source. The apparatus can include a feedback control device to adjust the rotation speed of the microfeature workpiece based on the characteristic detected.

摘要翻译： 本文公开了通过监视对应于靠近旋转微特征工件的磁场的状态的特性来监视处理过程中的微特征工件旋转的装置和方法，例如刷涂。 该特性可以取决于微型工件的磁场和导电材料之间的相对运动。 该特性可以包括磁场的强度，用于产生磁场的电磁体电路中的电流，施加在磁场源上的力或磁场源的移动。 该装置可以包括反馈控制装置，用于基于检测到的特性来调节微特征工件的转速。