公开(公告)号：US10023477B2

公开(公告)日：2018-07-17

申请号：US14724922

申请日：2015-05-29

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Toyohisa Tsuruda ,  Masayuki Kajiwara

IPC: C02F1/463 ,  C02F1/461 ,  C02F103/02 ,  G03F7/30

Abstract: A treatment solution supply method of supplying a treatment solution to a substrate, the method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a predetermined reference value.