公开(公告)号：US20150092167A1

公开(公告)日：2015-04-02

申请号：US14485914

申请日：2014-09-15

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: G03F7/20

CPC classification number: H01L21/67017

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

Abstract translation: 公开了一种处理液供给装置。 该装置包括：处理液供给源，被配置为提供用于处理待处理基板的处理液; 喷射单元，被配置为将处理液喷射到待处理的基板; 被配置为去除处理液中的异物的过滤装置; 供给泵和喷射泵，其分别设置在所述供给路径中的所述过滤装置的初级侧和次级侧; 以及控制单元，其被配置为输出控制信号，以通过使用所述供给泵和所述喷射泵中的一个来对从所述处理液体供给源供给的处理液进行解压缩和脱气，并且随后将所述脱气处理液通过所述过滤装置，从 通过使用供应泵和排出泵将过滤装置的次级侧的初级侧。