公开(公告)号：US09878267B2

公开(公告)日：2018-01-30

申请号：US15639010

申请日：2017-06-30

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Katsunori Ichino ,  Toshinobu Furusho ,  Takashi Sasa ,  Katsuhiro Tsuchiya ,  Yuichi Terashita ,  Hirofumi Takeguchi

IPC: B01D46/46 ,  B01D53/30 ,  B01D19/00 ,  G03F7/16 ,  H01L21/67 ,  G03F7/30

CPC classification number: B01D19/0063 ,  B01D19/0031 ,  B01D19/0068 ,  G03F7/16 ,  G03F7/30 ,  H01L21/6715

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

公开(公告)号：US10268116B2

公开(公告)日：2019-04-23

申请号：US15816088

申请日：2017-11-17

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa ,  Daisuke Ishimaru

IPC: G03F7/16 ,  H01L21/67

Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

公开(公告)号：US10022652B2

公开(公告)日：2018-07-17

申请号：US15818855

申请日：2017-11-21

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Katsunori Ichino ,  Toshinobu Furusho ,  Takashi Sasa ,  Katsuhiro Tsuchiya ,  Yuichi Terashita ,  Hirofumi Takeguchi

IPC: B01D46/46 ,  B01D53/30 ,  B01D19/00 ,  G03F7/30 ,  H01L21/67 ,  G03F7/16

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

公开(公告)号：US09846363B2

公开(公告)日：2017-12-19

申请号：US14528290

申请日：2014-10-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa ,  Daisuke Ishimaru

IPC: G03F7/16 ,  H01L21/67

CPC classification number: G03F7/16 ,  H01L21/67017

Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

公开(公告)号：US20160115952A1

公开(公告)日：2016-04-28

申请号：US14918707

申请日：2015-10-21

Applicant: Tokyo Electron Limited

Inventor： Takashi Sasa ,  Daisuke Ishimaru ,  Takahiro Okubo ,  Tomoyuki Yumoto ,  Tomohiko Muta

IPC: F04B43/08

CPC classification number: F04B43/10 ,  F04B15/02

Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.

Abstract translation: 可以抑制液体滞留。 泵100包括具有弹性的管102，其中作为待输送的靶的液体流动; 管壳体104，其覆盖管102的外部并将气体保持在管102的外表面和管壳体104之间的内部空间V中; 以及电气调节器RE，其构造成将气体供应到内部空间V并从内部空间V排出气体。

公开(公告)号：US20200227286A1

公开(公告)日：2020-07-16

申请号：US16052875

申请日：2018-08-02

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: H01L21/67

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

公开(公告)号：US10655619B2

公开(公告)日：2020-05-19

申请号：US14918707

申请日：2015-10-21

Applicant: Tokyo Electron Limited

Inventor： Takashi Sasa ,  Daisuke Ishimaru ,  Takahiro Okubo ,  Tomoyuki Yumoto ,  Tomohiko Muta

IPC: F04B43/10 ,  F04B15/02 ,  F04B43/00 ,  F04B43/08

Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.

公开(公告)号：US20180093205A1

公开(公告)日：2018-04-05

申请号：US15818855

申请日：2017-11-21

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Katsunori Ichino ,  Toshinobu Furusho ,  Takashi Sasa ,  Katsuhiro Tsuchiya ,  Yuichi Terashita ,  Hirofumi Takeguchi

IPC: B01D19/00 ,  H01L21/67 ,  G03F7/30 ,  G03F7/16

CPC classification number: B01D19/0063 ,  B01D19/0031 ,  B01D19/0068 ,  G03F7/16 ,  G03F7/30 ,  H01L21/6715

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

公开(公告)号：US20150090340A1

公开(公告)日：2015-04-02

申请号：US14497930

申请日：2014-09-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji Takayanagi ,  Kousuke Yoshihara ,  Yuichi Terashita ,  Toshinobu Furusho ,  Takashi Sasa

IPC: F17D3/01

CPC classification number: F17D3/01 ,  F17C1/00 ,  Y10T137/0318 ,  Y10T137/794

Abstract: A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.

Abstract translation: 一种处理液供给装置，包括源，排出装置，连接源放出装置的供给路，位于通道内的过滤装置，形成具有源的第一侧，具有排出装置的第二侧， 在通道中，以及控制装置，其通过泵装置控制吸入和排出。 控制装置控制泵装置使得液体从排出装置排出，第二侧的液体的剩余部分被抽吸回到第一侧，并且剩余的返回到第一侧的液体从 首先朝向第二侧，同时从源的液体的再填充，并且控制装置被设定为使得到过滤装置的液体的返回量等于或大于排出量。

公开(公告)号：US20150000517A1

公开(公告)日：2015-01-01

申请号：US14378337

申请日：2013-02-22

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Katsunori Ichino ,  Toshinobu Furusho ,  Takashi Sasa ,  Katsuhiro Tsuchiya ,  Yuichi Terashita ,  Hirofumi Takeguchi

IPC: B01D19/00

CPC classification number: B01D19/0063 ,  B01D19/0031 ,  B01D19/0068 ,  G03F7/16 ,  G03F7/30 ,  H01L21/6715

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

Abstract translation: 一种与供给处理溶液供给到基板的供给喷嘴连接的固溶处理装置，具备：将处理液储存容器与供给喷嘴连接的供给管路; 设置在所述供给管道中的过滤装置; 过滤装置的二次侧的泵; 连接泵的排出侧和过滤装置的进气侧的循环管路; 供给控制阀，其设置在所述供给管路中的所述泵的次级侧; 设置在循环管道中的循环控制阀; 以及控制单元，其中，当通过关闭所述供给控制阀来停止从所述供给喷嘴向所述基板供给所述处理液时，所述控制单元打开所述循环控制阀并驱动所述泵，从而使所述处理液在所述供给管线 具有过滤装置和循环管道。