Photo-masks and methods of fabricating periodic optical structures
    21.
    发明授权
    Photo-masks and methods of fabricating periodic optical structures 有权
    光掩模和制造周期性光学结构的方法

    公开(公告)号:US07906255B2

    公开(公告)日:2011-03-15

    申请号:US11970502

    申请日:2008-01-07

    IPC分类号: G03F1/00 G02B5/18

    摘要: Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.

    摘要翻译: 本文公开了用于制造周期性结构的改进的光掩模。 还公开了制备周期结构的方法,以及由其制造的周期性结构。 光掩模可以包括主体元件和设置在主体元件上或体内元件内的一组或多组衍射元件和/或折射元件。 每组衍射元件和/或折射元件可被配置为当光束通过时产生四个非共面光束。 每组四个非共面光束可用于在感光记录材料内的特定位置处干涉地产生特定的周期性结构。

    OPTICAL INTERCONNECT DEVICES AND STRUCTURES BASED ON METAMATERIALS
    22.
    发明申请
    OPTICAL INTERCONNECT DEVICES AND STRUCTURES BASED ON METAMATERIALS 审中-公开
    基于元素的光学互连器件和结构

    公开(公告)号:US20080212921A1

    公开(公告)日:2008-09-04

    申请号:US12041491

    申请日:2008-03-03

    IPC分类号: G02B6/12 G02B6/10

    摘要: Improved optical interconnect devices, structures, and methods of making and using the devices and structures are provided herein. The optical interconnect devices, which can be used to connect components or route signals in an integrated-circuit or circuits, generally include an optical element having a metamaterial with a negative index of refraction. The optical element is configured to receive an optical signal from a first component and transmit the optical signal to a second component. Each interconnect device or structure can be fabricated to have a small size and complex functionalities integrated therein. Other embodiments are also claimed and described.

    摘要翻译: 本文提供了改进的光学互连装置,结构以及制造和使用装置和结构的方法。 可用于连接集成电路或电路中的组件或路由信号的光学互连装置通常包括具有负折射率的超材料的光学元件。 光学元件被配置为从第一分量接收光信号并将光信号发送到第二分量。 每个互连装置或结构可被制造成具有集成在其中的小尺寸和复杂的功能。 还要求保护和描述其它实施例。

    PHOTO-MASKS AND METHODS OF FABRICATING PERIODIC OPTICAL STRUCTURES
    23.
    发明申请
    PHOTO-MASKS AND METHODS OF FABRICATING PERIODIC OPTICAL STRUCTURES 有权
    制作周期性光学结构的照片和方法

    公开(公告)号:US20080174754A1

    公开(公告)日:2008-07-24

    申请号:US11970502

    申请日:2008-01-07

    摘要: Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.

    摘要翻译: 本文公开了用于制造周期性结构的改进的光掩模。 还公开了制备周期结构的方法,以及由其制造的周期性结构。 光掩模可以包括主体元件和设置在主体元件上或体内元件内的一组或多组衍射元件和/或折射元件。 每组衍射元件和/或折射元件可被配置为当光束通过时产生四个非共面光束。 每组四个非共面光束可用于在感光记录材料内的特定位置处干涉地产生特定的周期性结构。

    Performing retardation measurements
    24.
    发明授权
    Performing retardation measurements 失效
    执行延迟测量

    公开(公告)号:US07233395B2

    公开(公告)日:2007-06-19

    申请号:US10950048

    申请日:2004-09-24

    IPC分类号: G01J4/00

    CPC分类号: G01N21/23 G01J4/00

    摘要: Systems and methods of measuring birefringence or retardation are provided. For some embodiments, a system is provided, which comprises a polarizer, an analyzer, a first waveplate, and a second waveplate. The system is configured to obtain light intensity measurements by recursively rotating the second waveplate. The obtained light intensity measurements are retrieved, and a light transmission intensity curve is determined from the light intensity measurements.

    摘要翻译: 提供了测量双折射或延迟的系统和方法。 对于一些实施例,提供了一种系统,其包括偏振器,分析器,第一波片和第二波片。 该系统被配置为通过递归地旋转第二波片来获得光强度测量。 检索所获得的光强度测量值,并根据光强度测量确定光透射强度曲线。

    Optical holographic content-addressable memory system for truth table
look-up processing
    25.
    发明授权
    Optical holographic content-addressable memory system for truth table look-up processing 失效
    光学全息内容寻址存储系统,用于真值表查找处理

    公开(公告)号:US4318581A

    公开(公告)日:1982-03-09

    申请号:US149540

    申请日:1980-05-13

    摘要: A numerical optical processor which utilizes a holographic content-addressable memory is disclosed. The holographic memory stores relationships between various inputs and system outputs in the form of a plurality of truth tables in a digital format. One or more digital input words are processed by the numerical optical processor to produce digital outputs wherein the input words are modified by the contents of the holographic memory.Two configurations of the numerical optical processor are disclosed. The first system is based on an EXCLUSIVE OR operation performed holographically on binary arrays. The second system performs an operation which is equivalent to two levels of logic: a NAND and OR followed by another OR operation. Various specific embodiments of the two configurations are disclosed.

    摘要翻译: 公开了一种利用全息内容寻址存储器的数字光学处理器。 全息存储器以数字格式的多个真值表的形式存储各种输入和系统输出之间的关系。 一个或多个数字输入字由数字光学处理器处理以产生数字输出,其中输入字被全息存储器的内容修改。 公开了数字光学处理器的两种配置。 第一个系统是基于二进制数组全息执行的EXCLUSIVE OR操作。 第二个系统执行一个等同于两个逻辑电平的操作:一个NAND和OR后跟另一个OR运算。 公开了两种配置的各种具体实施例。

    Performing retardation measurements
    27.
    发明授权
    Performing retardation measurements 失效
    执行延迟测量

    公开(公告)号:US07224457B2

    公开(公告)日:2007-05-29

    申请号:US10949855

    申请日:2004-09-24

    IPC分类号: G01J4/00

    CPC分类号: G01J4/00 G01N21/23

    摘要: Some embodiments include a system having a polarizer and an analyzer to define a light transmission axis. Both the polarizer and the analyzer have a polarization transmission direction, which is substantially perpendicular to the light transmission axis. A first waveplate and a second waveplate are is interposed between the polarizer and the analyzer, such that both waveplates are located along the light transmission axis. Both waveplates have a slow axis, which is substantially perpendicular to the light transmission axis. The first waveplate is rotated about the light transmission axis, such that the slow axis of the first waveplate is at an angle with a polarization transmission direction of the polarizer. The analyzer is rotated about the light transmission axis until the light transmitted through the system is minimized. The first waveplate and the analyzer are recursively rotated until an extinction angle is determined.

    摘要翻译: 一些实施例包括具有偏振器的系统和用于限定光透射轴的分析器。 偏振器和分析器都具有基本上垂直于透光轴的偏振透射方向。 第一波片和第二波片插入在偏振器和分析器之间,使得两个波片都沿着透光轴定位。 两个波片都具有基本垂直于透光轴的慢轴。 第一波片围绕光透射轴旋转,使得第一波片的慢轴与偏振器的偏振透射方向成一角度。 分析仪围绕光透射轴线旋转,直到透过系统的光线被最小化。 第一波片和分析仪被递归地旋转直到确定消光角。

    Interferometric optical tomography
    28.
    发明授权
    Interferometric optical tomography 失效
    干涉光学层析成像

    公开(公告)号:US07352474B2

    公开(公告)日:2008-04-01

    申请号:US11040418

    申请日:2005-01-21

    IPC分类号: G01B11/02

    摘要: Embodiments of the present disclosure provide systems and methods for constructing a profile of sample object. Briefly described, in architecture, one embodiment of the system, among others, can be implemented as follows. An interferometer device is used to collect interference images of a sample object at a sequence of angles around the sample object. Accordingly, a controller device rotates the sample object to enable acquisition of the interference images; and a projection generator produces projections of the sample object from the interference images at the sequence of angles. Further, a tomographic device constructs the profile of the optical device from the projections of the interference images. The profile is capable of characterizing small index variations of less than 1×10−4. Other systems and methods are also included.

    摘要翻译: 本公开的实施例提供了用于构建样本对象的轮廓的系统和方法。 简要描述,在架构中,系统的一个实施例等可以如下实现。 干涉仪装置用于以样本对象周围的一系列角度收集样本对象的干涉图像。 因此,控制器装置旋转样品物体以使得能够获取干涉图像; 并且投影发生器以角度顺序从干涉图像产生样本物体的投影。 此外,断层摄影装置从干涉图像的投影中构建光学装置的轮廓。 该轮廓能够表征小于1×10 -4 -4的小指数变化。 还包括其他系统和方法。

    Interference projection exposure system and method of using same
    29.
    发明授权
    Interference projection exposure system and method of using same 有权
    干涉投影曝光系统及其使用方法

    公开(公告)号:US09019468B2

    公开(公告)日:2015-04-28

    申请号:US13249841

    申请日:2011-09-30

    IPC分类号: G02B27/10 G03F7/20

    摘要: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.

    摘要翻译: 本发明的示例性实施例提供了一种干涉投影曝光系统,其包括光束提供子系统和物镜子系统,其可以提供多个光束,所述光束在图像平面处相交并干涉以产生高空间频率的周期光学强度 分配。 干涉投影系统还可以包括可以改变周期性光强度分布以便在周期性光强度分布内并入功能元件的图案掩模。 波束提供子系统可以包括波束发生子系统,波束调节子系统和波束定向子系统。 本发明的另一示例性实施例提供使用干涉投影曝光系统产生高空间频率周期性光强度分布的方法。

    DIFFRACTIVE PHOTO MASKS AND METHODS OF USING AND FABRICATING THE SAME

    公开(公告)号:US20120082943A1

    公开(公告)日:2012-04-05

    申请号:US13250011

    申请日:2011-09-30

    IPC分类号: G03F7/20 G03H1/26 G02B5/32

    摘要: An exemplary embodiment of the present invention provides a diffractive photo-mask comprising a body element, a plurality of interference/image-forming hologram gratings, and a zero-order beam blocking element. The plurality of interference/image-forming hologram gratings can be located on or in the body element. The plurality of interference/image-forming hologram gratings are configured to diffract a light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane when the light beam is incident upon the diffractive photo-mask. The zero-order beam blocking element is configured to block zero-order diffracted beams when the light beam is incident upon the diffractive photo-mask

    摘要翻译: 本发明的示例性实施例提供了一种衍射光掩模,其包括主体元件,多个干涉图像形成全息图光栅和零阶光束阻挡元件。 多个干涉图像形成全息图光栅可以位于身体元件上或身体元件中。 多个干涉图像形成全息图光栅被配置为当光束入射到衍射时,衍射光束以产生由基板平面处的高空间频率周期光学强度分布包围的一个或多个功能元件 光罩。 零级光束阻挡元件被配置为当光束入射到衍射光掩模上时阻挡零级衍射光束