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    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    1.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开

    公开(公告)号：US20180059551A1

    公开(公告)日：2018-03-01

    申请号：US15803304

    申请日：2017-11-03

    申请人： Carl Zeiss SMT GmbH

    发明人： Markus Deguenther

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70075 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70208

    摘要： An illumination system of a microlithographic projection exposure apparatus includes first and second optical raster plates. An irradiance distribution of projection light on the first and second optical raster plates determines an angular light distribution of the projection light exclusively at a first portion and a second portion, respectively, of an illuminated field. The second portion is distinct from and arranged adjacent to the first portion. It is possible to produce different illumination settings in different adjacent portions on the mask. First and second Fourier optics establish a Fourier relationship between the first and second optical raster plates one the one hand and the first and second portion on the other hand. The first and second Fourier optics have a first and second focal length, respectively, that are variable in response to a focal length change command signal from a control unit.

    Method and Apparatuses for Optical Pupil Symmetrization
    6.
    发明申请
    Method and Apparatuses for Optical Pupil Symmetrization 有权
    光学瞳孔对称的方法和装置

    公开(公告)号：US20160209755A1

    公开(公告)日：2016-07-21

    申请号：US14970247

    申请日：2015-12-15

    申请人： ASML Holding N.V.

    发明人： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV

    IPC分类号： G03F7/20 ,  G02B27/10 ,  G02B5/04 ,  G01N21/47

    CPC分类号： G03F7/70133 ,  G01N21/4738 ,  G01N2201/061 ,  G01N2201/06113 ,  G01N2201/068 ,  G02B5/04 ,  G02B27/106 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70208

    摘要： An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one light source and less than a depth of focus in the pupil plane of the objective optical system.

    摘要翻译： 检查装置可以使用光瞳对称器来确定基板上的目标物的精确的OV测量，以减小检查装置对瞳孔平面中的照明束的不对称性和不均匀性的敏感度。 检查装置包括：（1）将照明光束分成子光束形成对称的照明光瞳的照明系统，（2）沿着不同的光分支引导子光束，（3）反转或旋转至少一个 子光束在二维中，并且沿着照明路径重新组合子光束以使强度分布对称化。 该照明系统被进一步配置成使得第一和第二子光束的光程差大于至少一个光源的时间相干长度，并且小于物镜光瞳面中的焦深 系统。

    Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate
    7.
    发明授权
    Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate 有权
    形成图案层的方法，形成图案化光致抗蚀剂层的方法和有源器件阵列衬底

    公开(公告)号：US09341950B2

    公开(公告)日：2016-05-17

    申请号：US14722166

    申请日：2015-05-27

    申请人： Au Optronics Corporation

    发明人： Hsiang-Chih Hsiao ,  Ta-Wen Liao ,  Tzu-Min Yang ,  Shan-Fang Chen ,  Ya-Ping Chang ,  Chi-Hung Yang ,  Chung-Yuan Liao

    IPC分类号： G02F1/1343 ,  G03F7/20 ,  G03B27/58 ,  G03F1/00 ,  G02F1/1335

    CPC分类号： G03F7/20 ,  G02F1/133526 ,  G02F1/134309 ,  G03B27/58 ,  G03F1/14 ,  G03F7/70208 ,  Y10T428/24802

    摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

    摘要翻译： 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。

    Illumination optical system, exposure apparatus, and method of manufacturing device
    9.
    发明授权
    Illumination optical system, exposure apparatus, and method of manufacturing device 有权
    照明光学系统，曝光装置和制造装置的方法

    公开(公告)号：US09280054B2

    公开(公告)日：2016-03-08

    申请号：US13371637

    申请日：2012-02-13

    申请人： Noboru Osaka

    发明人： Noboru Osaka

    IPC分类号： G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/7005 ,  G03F7/70075 ,  G03F7/70208

    摘要： An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light beams. The combining optical system combines the light beams emitted from the rod integrators, so that the light beams are adjacent to each other in cross-sections thereof. The light transmission unit has an entrance plane and an exit plane, divides the light beam combined by the combining optical system into plural light beams on the entrance plane, joins the divided light beams so that a cross-sectional shape of a joined pattern of the light beams on the exit plane is different from a cross-sectional shape of a joined pattern of the light beams on the entrance plane, and transfers each of the light beams from the entrance plane to the exit plane using plural optically coupled light pipes.

    摘要翻译： 照明光学系统包括多个杆状积分器，组合光学系统和光传输单元。 杆状积分器使光束的光强分布均匀化。 组合光学系统组合从杆状积分器发射的光束，使得光束的横截面彼此相邻。 光传输单元具有入射面和出射面，将由组合光学系统组合的光束分成入射面上的多个光束，将分割的光束接合，使得接合图案的横截面形状 出射面上的光束与入射面上的光束的接合图案的截面形状不同，并且使用多个光耦合光管将每个光束从入射面传送到出射面。