公开(公告)号：US3675373A

公开(公告)日：1972-07-11

申请号：US3675373D

申请日：1970-05-28

申请人： IBM

发明人： PUTNAM DAVID T

IPC分类号： B24C3/04 ,  B24C5/06 ,  B24C3/00

CPC分类号： B24C3/04 ,  B24C5/06

摘要： An enclosed chamber carries a high speed rotating abrasive throwing wheel which discharges, by centrifugal force, abrasive particles through radially extending channels against a circumferential array of workpieces requiring machining, and positioned in the path of the high speed abrasive particles. The chamber is subjected to vacuum pressure or a low density atmosphere, with little aerodynamic loss due to windage effects on the high speed rotating wheel, low drag on the abrasive particles as they move freely from the channels to the work piece and no cushioning due to the entrapment of air between the particles and the workpiece.

摘要翻译： 封闭的腔室装有高速旋转研磨抛光轮，其通过离心力将研磨颗粒通过径向延伸的通道排出，抵靠要求加工的工件的圆周阵列，并定位在高速磨料颗粒的路径中。 该室受到真空压力或低密度气氛，由于对高速旋转轮的风阻影响，几乎没有空气动力学损失，因为磨料颗粒从通道自由移动到工件上时的低阻力，并且由于 颗粒与工件之间的空气夹带。

公开(公告)号：US3611639A

公开(公告)日：1971-10-12

申请号：US3611639D

申请日：1969-08-19

申请人： ABRASIVE DEV

发明人： ASHWORTH STEWART IVES ,  FIELD ANTHONY GERARD

IPC分类号： B24C3/12 ,  B24C9/00 ,  B24C3/04

CPC分类号： B24C3/12 ,  B24C9/003

摘要： THE SPECIFICATION DISCLOSES AN ABRADING MACHINE AND METHOD IN WHICH AIR AND ABRASIVE ARE DIRECTED AT A WORKPIECE IN A BLASTING CHAMBER WHICH IS SEALED DURING OPERATION BY THE WORKPIECE. THE ABRASIVE IS ENTRAINED IN PRIMARY AIR, SECONDARY AIR ENTERS THE CHAMBER AROUND THE WORKPIECE AND TERTIARY AIR IS ALLOWED TO MIX WITH PRIMARY AIR CARRYING THE ABRASIVE BEFORE THGE LATTER ENTERS THE CHAMBER. THE CHAMBE MAY BE TUBULAR AND FRO TREATING WIRE OR BAR MAY BE IN TWO CHANNEL-SHAPED PARTS HINGED TOGETHER SO THAT THE CHAMBER MAY BE OPENED TO LEAD THE WIRE OR BAR THROUGH. WHERE STRIP IS BEING TREATED THE STRIP MAY PASS THROUGH THE TUBULAR CHAMBER TRANSVERSE TO THE AXIS THEREOF.

公开(公告)号：US20240198487A1

公开(公告)日：2024-06-20

申请号：US18084862

申请日：2022-12-20

申请人： 2623223 Ontario Inc.

发明人： John Walter McIntyre

IPC分类号： B24C7/00 ,  B24C3/04

CPC分类号： B24C7/0061 ,  B24C3/04

摘要： A wet and dry abrasive media blasting system comprises a compressed air supply providing a supply of blast air and pot air. The blast air is communicated along a blast air supply line and pot air is communicated along a pot air supply line. A blast pot is configured to receive abrasive media and pot air and release abrasive media at a discharge and into a media conduit which communicated abrasive media to a mixing device. An air pressure amplifier disposed on the pot air supply line is adapted to selectively increase the air pressure of a pot air head creating an over-pressure, such that the over-pressure which is pressure of pot air head less the pressure of the blast air is positive. The blast air and the abrasive media are mixed together in the mixing device to form a blast air media mixture which is communicated to a nozzle and discharged from the nozzle as a blast spray. The system further includes a metering valve disposed on the media conduit, downstream of the discharge, and up stream of the mixing device, the metering valve selectively controls the flow and therefore the amount of abrasive media communicated to the mixing device.

公开(公告)号：US11260503B2

公开(公告)日：2022-03-01

申请号：US15106244

申请日：2014-10-31

申请人： Flow International Corporation

发明人： Mohamed A. Hashish ,  Robert Niblock ,  Steven J. Craigen ,  Bruce M. Schuman

IPC分类号： B24C7/00 ,  B24C5/02 ,  B24C1/04 ,  B24C3/04

摘要： An abrasive slurry delivery system configured to discharge a high pressure mixture of water (30) and abrasives (54, 54′) for further admixture with a flow of high pressure water (30) to generate an abrasive slurry and ultimately an abrasive slurry jet is provided. The delivery system includes a storage chamber (56), a discharge chamber (58) and a shuttle chamber (60) positioned therebetween. The shuttle chamber (60) is configured to intermittently receive abrasives (54) from the storage chamber (56) and intermittently supply the abrasives (54, 54′) mixed with high pressure water (30) to the discharge chamber (58) to be selectively discharged therefrom. High pressure abrasive slurry cutting systems and related methods are also provided.

公开(公告)号：US10239188B2

公开(公告)日：2019-03-26

申请号：US14953402

申请日：2015-11-29

申请人： Alessandro Paolo Sommacal

发明人： Alessandro Paolo Sommacal

IPC分类号： B24C11/00 ,  B24C1/00 ,  B24C3/04 ,  A61B90/70 ,  A61B19/00

摘要： A method of cleaning and sanitizing surgical tools or surgical instruments and accessories in general, and a device configured to implement the method. The method includes the use of a an abrasive cleaning material, which is emitted under pressure and at high speed to abrade and remove substances that adhere to the surfaces of the instruments and accessories, and the pressure of which can be regulated according to the type of surface to be cleaned.

公开(公告)号：US10150203B1

公开(公告)日：2018-12-11

申请号：US14826694

申请日：2015-08-14

申请人： OCEANIT LABORATORIES, INC.

发明人： Christopher Sullivan ,  Daniel Kokubun

IPC分类号： B24C5/04 ,  B24C3/02 ,  B24C3/04

摘要： Reduced noise abrasive blasting assemblies and systems are described. The new assemblies and systems are comprised of standard blast hose, accelerator hose, couplings and nozzle. The improved abrasive blasting system maintains abrasive particle velocity while decreasing the exit gas velocity and consequently decreasing sound production. This is accomplished through an acceleration section with reduced inner diameter and sufficient length to provide the necessary abrasive particle velocity. The new system maintains the productivity and efficiency of conventional abrasive blasting systems but with greatly reduced acoustic noise production and reduces operator fatigue due to the lower weight of the carried portion of the system.

公开(公告)号：US09839988B2

公开(公告)日：2017-12-12

申请号：US14341403

申请日：2014-07-25

申请人： Fuji Jukogyo Kabushiki Kaisha

发明人： Yoshihiko Kondo ,  Hirotsugu Takazawa ,  Manabu Saito ,  Tatsuo Nakahata ,  Hisayuki Oode

IPC分类号： B24C3/32 ,  B24C7/00 ,  B24C3/02 ,  B24C3/04

CPC分类号： B24C3/32 ,  B24C3/02 ,  B24C3/04 ,  B24C7/0053

摘要： A blast processing device includes a first nozzle, a second nozzle, and a moving mechanism. The first nozzle blasts a blasting material toward a workpiece, using first compressed air. The second nozzle blasts second compressed air for adjusting a diffusion range of the blasting material. The moving mechanism moves the first nozzle and the second nozzle over the workpiece.

公开(公告)号：US08926405B2

公开(公告)日：2015-01-06

申请号：US14054101

申请日：2013-10-15

申请人： William R Lynn

发明人： William R Lynn

IPC分类号： B24C3/04 ,  B24C9/00 ,  B24C3/02

CPC分类号： B24C9/003 ,  B24C3/02 ,  B24C3/04 ,  B24C9/00

摘要： A treatment system for achieving a substantially uniform surface profile of a surface to be treated. The treatment system comprises a support panel which supports a rotatable orb, and the rotatable orb has an access aperture extending therethrough which facilitates receiving a desired surface treatment equipment. The access aperture is sized so as to permit the desired surface treatment equipment to pass therethrough and move relative thereto the access aperture, during surface treatment. The treatment system comprises a monitoring system for monitoring at least one of a spacing of a remote end of the surface treatment equipment from the surface to be treated and a treatment angle of the surface treatment equipment in order to control the surface treatment of the surface to be treated and achieve a substantially uniform surface profile, of the surface to be treated, following treatment.

摘要翻译： 一种用于实现待处理表面的基本上均匀的表面轮廓的处理系统。 治疗系统包括支撑可旋转的球体的支撑面板，并且可旋转的球体具有延伸穿过其中的进入孔，其有助于接收所需的表面处理设备。 进入孔的尺寸设计成在表面处理期间允许期望的表面处理设备通过并相对于其移动进入孔。 处理系统包括监测系统，用于监测表面处理设备的远端与待处理表面的间距中的至少一个以及表面处理设备的处理角度，以便控制表面的表面处理 在处理后待处理并获得待处理表面的基本均匀的表面轮廓。

公开(公告)号：US08905816B2

公开(公告)日：2014-12-09

申请号：US13766286

申请日：2013-02-13

申请人： Marco Group International, Inc.

发明人： Chris Gramling ,  Richard McLaughlin

IPC分类号： B24C1/00 ,  B24C9/00 ,  B24C3/00 ,  B24C3/04

CPC分类号： B24C3/00 ,  B24C3/04 ,  B24C9/00

摘要： A system for system for controlling functions of a multi-feed blasting apparatus is disclosed. Tank pressure, charge/discharge control, status of a vessel cover, total hours of pressurization or operation for the vessel and individual feed lines, ambient environmental or weather conditions, and abrasive material level inside the vessel may also be monitored and controlled by the disclosed system.

摘要翻译： 公开了一种用于控制多进给喷砂装置的功能的系统。 容器压力，充放电控制，容器盖的状态，容器和单个进料管的加压或操作的总小时数，周围环境或天气条件以及容器内的研磨材料水平也可以由所公开的 系统。

公开(公告)号：US08834231B2

公开(公告)日：2014-09-16

申请号：US13055750

申请日：2008-07-25

申请人： Sandeep Sharma

发明人： Sandeep Sharma

IPC分类号： B24C3/04

CPC分类号： H01L21/67051 ,  B24C1/003 ,  B24C1/08 ,  B24C3/322 ,  H01L21/565 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method and apparatus for removing contaminants from at least one portion of a semiconductor mold are disclosed. A nozzle is positioned at a preset position with respect to the portion of the semiconductor mold. Solid particles of a material that sublimes instantaneously along with at least one of the abrasives and additives are blasted at a predefined temperature and/or pressure over the portion, through the nozzle. On impact, the particles remove the contaminants from the portion of the semiconductor mold.

摘要翻译： 公开了一种用于从半导体模具的至少一部分去除污染物的方法和装置。 喷嘴相对于半导体模具的部分定位在预设位置。 材料的固体颗粒与至少一种研磨剂和添加剂一起瞬间升华，并通过喷嘴以预定的温度和/或压力喷射到该部分上。 在冲击时，颗粒从半导体模具的部分去除污染物。