Abstract:
A piezoelectric cantilever pressure sensor has a substrate and a piezoelectric cantilever having a base portion attached to the substrate and a beam portion suspended over a cavity. The piezoelectric cantilever contains a piezoelectric layer sandwiched between two electrodes and generates a measurable voltage when deformed under pressure. The piezoelectric cantilever pressure sensor can be manufactured at low cost and used in various applications including fingerprint identification devices.
Abstract:
A monitoring system for monitoring surroundings of a vehicle by displaying images taken by a plurality of cameras provided at the vehicle on a display apparatus provided in a vehicle compartment includes an image processing portion. The image processing portion includes a boundary-determining portion for determining a boundary of the neighboring images taken by the plurality of cameras for synthesizing the neighboring images in a horizontal direction by approximating the boundary to an exponential curve, a horizontally normalizing portion for normalizing the neighboring images in a horizontal direction so that the boundary approximated to the exponential curve is converted into a linear vertical boundary, a vertically compensating portion for compensating a vertical displacement between the neighboring images on the linear vertical boundary, and a pixel-adjusting portion for adjusting the number of pixels of the synthesized image to the number of pixels suitable for displaying the synthesized image produced by the image processing portion on the display apparatus.
Abstract:
A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation. The phase-shifting photomask blank thus prepared is subjected to a patterning treatment to form a phase-shifting photomask.