公开(公告)号：US20060287207A1

公开(公告)日：2006-12-21

申请号：US11406243

申请日：2006-04-19

Applicant: Jung-Dae Park ,  Pil-Kwon Jun ,  Myoung-Ok Han ,  Se-Yeon Kim ,  Kwang-Shin Lim ,  Tae-Hyo Choi ,  Seung-Ki Chae ,  Yang-Koo Lee

Inventor： Jung-Dae Park ,  Pil-Kwon Jun ,  Myoung-Ok Han ,  Se-Yeon Kim ,  Kwang-Shin Lim ,  Tae-Hyo Choi ,  Seung-Ki Chae ,  Yang-Koo Lee

IPC: C11D7/32

CPC classification number: C11D7/5013 ,  C11D7/263 ,  C11D7/266 ,  C11D7/3263 ,  C11D7/3272 ,  C11D7/3281 ,  C11D7/34 ,  C11D11/0047

Abstract: A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where R1 is a hydroxyl group or a hydroxyalkyl group, and R2 is a hydrogen atom or a hydroxyalkyl group.

Abstract translation: 用于除去光致抗蚀剂的组合物包括约5至约20重量％的醇酰胺化合物，约15至约60重量％的极性非质子溶剂，约0.1至约6重量％的添加剂和纯水。 醇酰胺化合物的化学结构如下：其中R 1是羟基或羟烷基，R 2是氢原子或羟烷基。

公开(公告)号：US20060160239A1

公开(公告)日：2006-07-20

申请号：US11193301

申请日：2005-07-29

Applicant: Sung-Jae Lee ,  Yang-Koo Lee ,  Jae-Seok Lee ,  Sang-Mun Chon ,  Pil-Kwon Jun ,  Dong-Won Hwang

Inventor： Sung-Jae Lee ,  Yang-Koo Lee ,  Jae-Seok Lee ,  Sang-Mun Chon ,  Pil-Kwon Jun ,  Dong-Won Hwang

IPC: B08B7/04 ,  C23G1/00

CPC classification number: G01N21/314 ,  G01N21/94

Abstract: In one embodiment, a sample of chemical solution is provided. A first optical property of the sample is detected at a first wavelength and an expected optical property is predicted at a second wavelength, using the first optical property. A second optical property of the sample is detected at the second wavelength. The second optical property is compared with the expected optical property to measure a contamination level of a particular contaminant in the sample.

Abstract translation: 在一个实施方案中，提供了化学溶液样品。 使用第一光学特性，以第一波长检测样品的第一光学特性并且以第二波长预测预期的光学特性。 在第二波长处检测样品的第二光学特性。 将第二光学性质与预期的光学性质进行比较，以测量样品中特定污染物的污染水平。

公开(公告)号：US06423589B1

公开(公告)日：2002-07-23

申请号：US09885432

申请日：2001-06-20

Applicant: Young-hoon Park ,  Yang-koo Lee ,  Kyung-seok Oh

Inventor： Young-hoon Park ,  Yang-koo Lee ,  Kyung-seok Oh

IPC: H01L21828

Abstract: A CMOS integrated circuit includes an NMOS transistor and a PMOS transistor in an integrated circuit substrate. The NMOS transistor and the PMOS transistor each include a gate, and a source/drain on opposing sides of the gate. An insulating layer is located on the integrated circuit substrate. The insulating layer includes a contact hole therein which exposes a portion of a corresponding one of the source/drains. A source/drain plug is formed in the corresponding one of the source/drains. The source/drain plug is of opposite conductivity from the corresponding one of the source/drains. The source/drain plug is centered about the portion of the corresponding one of the source/drains. The source/drain plug may be formed by ion implantation through the contact hole and is thereby self-aligned to the contact hole. The source/drain plug can compensate for misalignment and the diffusion for highly integrated CMOS devices.

公开(公告)号：US06302962B1

公开(公告)日：2001-10-16

申请号：US09336751

申请日：1999-06-21

Applicant: Ki-heum Nam ,  Yang-koo Lee

Inventor： Ki-heum Nam ,  Yang-koo Lee

IPC: C23C1600

CPC classification number: H01L21/67017 ,  C30B31/12

Abstract: A diffusion system for manufacturing semiconductor devices has an air curtain formed across a furnace opening for preventing the loss of heat energy from inside the furnace. The diffusion system includes the furnace having an opening through which a wafer boat having a plurality of wafers is loaded/unloaded; an air curtain apparatus for spraying a gas across the opening so as to form an air curtain cutting off the atmosphere inside of the furnace from the outside environment; and a controlling unit for controlling the air curtain apparatus by applying on/off signals to the air curtain apparatus. The diffusion system is controlled by the controlling unit so as to form the air curtain at the opening of the furnace while the wafer boat moves in and out of the furnace. After the wafer boat is completely loaded into the furnace, the air curtain is removed.

Abstract translation: 用于制造半导体器件的扩散系统具有形成在炉开口上的气幕，用于防止炉内的热能损失。 扩散系统包括具有开口的炉子，通过该开口装载/卸载具有多个晶片的晶片舟皿; 用于将气体喷射穿过所述开口以形成从所述外部环境切断所述炉内的气氛的气帘的气幕装置; 以及控制单元，用于通过向气幕装置施加开/关信号来控制气幕装置。 扩散系统由控制单元控制，以便在晶片舟移入和移出炉内时在炉的开口处形成气幕。 在晶圆舟完全装入炉中之后，将空气幕移除。