公开(公告)号：US20140045117A1

公开(公告)日：2014-02-13

申请号：US14035139

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/28 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  C08F2220/283 ,  C08F220/42 ,  C08F2220/1825

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）能够通过酸的作用分解的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 以产生由本说明书中定义的下式（I）表示的羧基，和（B）能够在用光化射线或辐射照射时产生酸的化合物; （ii）曝光胶片的步骤; 和（iii）通过使用含有有机溶剂的显影剂进行显影以形成负图案的步骤。

公开(公告)号：US20140011134A1

公开(公告)日：2014-01-09

申请号：US14011837

申请日：2013-08-28

Applicant: Fujifilm Corporation

Inventor： Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shohei KATAOKA ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO ,  Shoichi SAITOH

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括（i）通过含有（P）具有（a）由该具体式表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（B） 能够在用光化射线或辐射照射时产生有机酸的化合物; （ii）曝光该薄膜的步骤，（iii）通过使用含有机溶剂的显影剂来显影该薄膜以形成负图形的步骤。