摘要:
An intentional recess or indentation is created in a region of semiconductor material that will become part of a channel of a metal oxide semiconductor (MOS) transistor structure. A layer is created on a surface of the recess to induce an appropriate type of stress in the channel.
摘要:
An ink-stamp storage system for magnetically storing ink stamps. The storage system has a storage panel with a strip of ferrous metal. The ink stamps are provided with a magnet and are magnetically mountable on the storage panel. One type of storage system is a rack that has a rotatable base element with multiple storage panels mounted on the base element; another type of storage system has a flat base with a single storage panel fixedly attached to the base. An anti-slip means is provided on the underside of the flat base, to prevent the base from inadvertently moving across a desk-top surface.
摘要:
Systems and methods for determining and sending a preferred of two electronic mail communications or messages (‘emails’) to a group to increase likelihood of its review. Information for conducting a test between two emails, referred to as A email and B email, is collected. The information may identify a particular group, and segments A and B of the group. The information may provide content for the emails and include differentiation information between the emails. Determination information on how to select one of the emails as the preferred email and when to select the preferred email may be collected. The information is used to send the A email to the segment A, to send the B email to the segment B, to determine the preferred email between the A email and the B email, and to send the preferred email to at least a portion of the particular group.
摘要:
A nanowire device having a plurality of internal spacers and a method for forming said internal spacers are disclosed. In an embodiment, a semiconductor device comprises a nanowire stack disposed above a substrate, the nanowire stack having a plurality of vertically-stacked nanowires, a gate structure wrapped around each of the plurality of nanowires, defining a channel region of the device, the gate structure having gate sidewalls, a pair of source/drain regions on opposite sides of the channel region; and an internal spacer on a portion of the gate sidewall between two adjacent nanowires, internal to the nanowire stack. In an embodiment, the internal spacers are formed by depositing spacer material in dimples etched adjacent to the channel region. In an embodiment, the dimples are etched through the channel region. In another embodiment, the dimples are etched through the source/drain region.
摘要:
A nanowire device having a plurality of internal spacers and a method for forming said internal spacers are disclosed. In an embodiment, a semiconductor device comprises a nanowire stack disposed above a substrate, the nanowire stack having a plurality of vertically-stacked nanowires, a gate structure wrapped around each of the plurality of nanowires, defining a channel region of the device, the gate structure having gate sidewalls, a pair of source/drain regions on opposite sides of the channel region; and an internal spacer on a portion of the gate sidewall between two adjacent nanowires, internal to the nanowire stack. In an embodiment, the internal spacers are formed by depositing spacer material in dimples etched adjacent to the channel region. In an embodiment, the dimples are etched through the channel region. In another embodiment, the dimples are etched through the source/drain region.