公开(公告)号：US06888958B1

公开(公告)日：2005-05-03

申请号：US09538398

申请日：2000-03-29

申请人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

发明人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

IPC分类号： G06K9/00 ,  G06K9/36 ,  G06K9/62 ,  G06T7/00

CPC分类号： G06T7/001 ,  G06T7/32

摘要： The difference data between the real patter data Sij, and a 5×5 window with a noticed pixel in the center and the design pattern data Rij obtained by the design pattern data of the window being shifted in a plurality of directions with respect to the design pattern data Rij is found by a shift direction operation section, and the design pattern data in the direction in which the total of the pixels is minimum is selected from the difference data by a selection section, the difference between the central pixels Sij, Qij of the selected design pattern data and the central pixels Sij, Qij of the windows of the real pattern data is found by a difference operation section, and the difference and a threshold are compared in a defect judgement section, and thereby the pattern inspection of the object is carried out.

摘要翻译： 实际图形数据Sij和中心处的注意像素的5×5窗口与通过相对于设计图案数据在多个方向上偏移的窗口的设计图案数据获得的设计图案数据Rij之间的差分数据 通过移位方向操作部分找到Rij，并且通过选择部分从差分数据中选择像素总数最小的方向上的设计图案数据，所选择的中心像素Sij，Qij之间的差异 设计图案数据和实际图案数据的窗口的中心像素Sij，Qij由差异运算部分找到，并且在缺陷判断部分比较差异和阈值，从而携带对象的图案检查 出来

公开(公告)号：US06656648B2

公开(公告)日：2003-12-02

申请号：US09990357

申请日：2001-11-23

申请人： Hiromu Inoue

发明人： Hiromu Inoue

IPC分类号： G03F900

CPC分类号： G03F1/84 ,  G06T7/0002 ,  G06T7/001 ,  G06T2207/30148 ,  G06T2207/30164

摘要： A pattern inspection device comprises a section for obtaining a sensor data by imaging a pattern formed on an object to be inspected, a reference data creation section to create a reference data obtained from a design data of the pattern, a pattern recognition section for cutting out a predetermined area from the reference data and recognizing the pattern, and a level conversion section for converting a level of one of the reference data and the sensor data according to a recognition result in the pattern recognition section.