-
公开(公告)号：US20050190455A1
公开(公告)日：2005-09-01
申请号：US11011610
申请日：2004-12-15
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有 提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。 束束狭窄收缩的收缩位置位于腰部区域。 在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。 本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。
-
32.发明申请公开(公告)号：US20120075602A1
公开(公告)日：2012-03-29
申请号：US13235651
申请日：2011-09-19
CPC分类号： G02B17/0663 , G02B7/182 , G02B17/061 , G03F7/70233
摘要： The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要翻译： 本公开涉及一种设计用于在EUV中操作的微光刻投影曝光装置的投影物镜中的光学装置。 光学装置包括沿着投影光束方向彼此直接相继的第一和第二反射镜。 第二个镜子刚性连接到第一个镜子。
-
33.发明授权公开(公告)号：US07411201B2
公开(公告)日：2008-08-12
申请号：US11460706
申请日：2006-07-28
IPC分类号： G21G5/00
CPC分类号： G03F7/70341
摘要： A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection objective. This immersion space can be filled with an immersion liquid. At least one liquid or solid volume having plane-parallel interfaces can be introduced into the beam path of the projection objective, the optical thickness of the at least one volume being at least substantially equal to the optical thickness of the immersion space. By introducing and removing the volume, it is possible to convert the projection objective from dry operation to immersed operation in a straightforward way, without extensive adjustments to the projection objective or alignment work.
摘要翻译： 微光刻投影曝光装置的投影物镜在图像侧具有平面于图像侧的最后一个光学元件，并且与投影物镜的像面一起在光轴的方向上限定浸没空间 投影目标。 该浸渍空间可以用浸没液体填充。 具有平面 - 平行界面的至少一个液体或固体体积可以被引入到投影物镜的光束路径中，至少一个体积的光学厚度至少基本上等于浸没空间的光学厚度。 通过引入和移除音量，可以以直接的方式将投影物镜从干燥操作转换为浸入式操作，而无需对投影物镜或对准工作进行广泛的调整。
-
公开(公告)号：US07277231B2
公开(公告)日：2007-10-02
申请号：US11097398
申请日：2005-04-01
IPC分类号： G02B1/06
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。
-
公开(公告)号：US20050219707A1
公开(公告)日：2005-10-06
申请号：US11097398
申请日：2005-04-01
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。
-
公开(公告)号：US08451458B2
公开(公告)日：2013-05-28
申请号：US13423760
申请日：2012-03-19
IPC分类号： G02B13/14
CPC分类号： G03F7/70666 , G02B13/143
摘要： An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.
摘要翻译： 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供了一个放大| beta | | > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。
-
公开(公告)号：US20120176670A1
公开(公告)日：2012-07-12
申请号：US13423760
申请日：2012-03-19
IPC分类号： G02B11/04
CPC分类号： G03F7/70666 , G02B13/143
摘要： An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.
摘要翻译： 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供放大| | bgr;'| > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。
-
公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
-
39.发明申请公开(公告)号：US20100128240A1
公开(公告)日：2010-05-27
申请号：US12621239
申请日：2009-11-18
CPC分类号： G03F7/70216 , G02B13/143 , G02B13/146 , G02B17/08 , G02B17/0892 , G02B27/0012 , G02B27/0025 , G03B27/54 , G03F7/70225 , G03F7/70241 , G03F7/70375 , G03F7/706
摘要： An objective having a plurality of optical elements arranged to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ, includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation ∑ i = 1 N Δ n i ( s i - d i ) λ 0 NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.
摘要翻译： 具有多个光学元件的目标，该多个光学元件布置成将物体的物体表面中的物体的图案成像到图像侧数值孔径NA> 0.8的物镜的图像表面区域中的图像场，其中电磁辐射来自 围绕波长λ的波长带包括数目N的度数光学元件，每个折射光学元件i由具有归一化光学色散＆Dgr; ni = ni（λ0）-ni（λ0+1μm）的透明材料制成，用于 从波长λ0的1 pm的波长变化。 目标满足关系Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。
-
公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有 提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。 束束狭窄收缩的收缩位置位于腰部区域。 在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。 本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。
-
-
-
-
-
-
-
-
-
搜索结果
52 条记录 (耗时 0.037 秒)
