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公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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2.发明申请公开(公告)号：US20100128240A1
公开(公告)日：2010-05-27
申请号：US12621239
申请日：2009-11-18
CPC分类号： G03F7/70216 , G02B13/143 , G02B13/146 , G02B17/08 , G02B17/0892 , G02B27/0012 , G02B27/0025 , G03B27/54 , G03F7/70225 , G03F7/70241 , G03F7/70375 , G03F7/706
摘要： An objective having a plurality of optical elements arranged to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ, includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation ∑ i = 1 N Δ n i ( s i - d i ) λ 0 NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.
摘要翻译： 具有多个光学元件的目标，该多个光学元件布置成将物体的物体表面中的物体的图案成像到图像侧数值孔径NA> 0.8的物镜的图像表面区域中的图像场，其中电磁辐射来自 围绕波长λ的波长带包括数目N的度数光学元件，每个折射光学元件i由具有归一化光学色散＆Dgr; ni = ni（λ0）-ni（λ0+1μm）的透明材料制成，用于 从波长λ0的1 pm的波长变化。 目标满足关系Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。
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公开(公告)号：US08068276B2
公开(公告)日：2011-11-29
申请号：US12899297
申请日：2010-10-06
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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5.发明授权Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same 有权具有特定结构和布置的度数光学元件的色校正物镜和包括该光学元件的投影曝光设备公开(公告)号：US08345350B2
公开(公告)日：2013-01-01
申请号：US12621239
申请日：2009-11-18
IPC分类号： G02B17/00
CPC分类号： G03F7/70216 , G02B13/143 , G02B13/146 , G02B17/08 , G02B17/0892 , G02B27/0012 , G02B27/0025 , G03B27/54 , G03F7/70225 , G03F7/70241 , G03F7/70375 , G03F7/706
摘要： An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation ∑ i = 1 N Δ n i ( s i - d i ) λ 0 NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.
摘要翻译： 具有多个光学元件的目标是将来自波长λ的波长带的电磁辐射从图像侧的数值孔径NA> 0.8到目标场的图像成像到多个光学元件，具有数量N的折射光学元件 对于波长为λ0的波长变化为1μm的透明材料制成的每个折射光学元件i由具有归一化光学色散的Dgr ni = ni（λ0）-ni（λ0+1μm）制成。 该目标满足关系式Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。
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公开(公告)号：US20080174858A1
公开(公告)日：2008-07-24
申请号：US12014496
申请日：2008-01-15
IPC分类号： G02B27/18
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。
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公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。
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9.发明授权Projection exposure apparatus, projection exposure method and projection objective 有权投影曝光装置，投影曝光方法和投影物镜公开(公告)号：US07834981B2
公开(公告)日：2010-11-16
申请号：US11747630
申请日：2007-05-11
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
摘要翻译： 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽＆Dgr;λ>10μm的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。
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公开(公告)号：US08451458B2
公开(公告)日：2013-05-28
申请号：US13423760
申请日：2012-03-19
IPC分类号： G02B13/14
CPC分类号： G03F7/70666 , G02B13/143
摘要： An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.
摘要翻译： 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供了一个放大| beta | | > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。
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