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    ILLUMINATION CORRECTION APPARATUS
    2.
    发明公开
    ILLUMINATION CORRECTION APPARATUS 审中-公开

    公开(公告)号：US20240069443A1

    公开(公告)日：2024-02-29

    申请号：US18144622

    申请日：2023-05-08

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Donghyeong Kim ,  Eunhee Jeang ,  Teun Boeren ,  Yoonsang Lee ,  Jeonggil Kim ,  Kyungbin Park

    IPC: G03F7/20 ,  G01J1/42

    CPC classification number: G03F7/70266 ,  G01J1/4257 ,  G03F7/70308 ,  G03F7/70516 ,  G03F7/706 ,  H01L21/0274

    Abstract: An illumination correction apparatus for correcting a radiation beam incident on a reticle from an exposure apparatus includes a plurality of fingers each having a surface facing an incident direction of the radiation beam, the plurality of fingers being arranged in a first direction to be adjacent to a path of the radiation beam, and configured to adjust an amount of the incident radiation beam by moving in a second direction, intersecting the first direction, a controller connected to the plurality of fingers and configured to control movement of the plurality of fingers such that an intensity of the radiation beam has uniformity in the first direction, at least one optical sensor on the surface of at least one finger of the plurality of fingers, and a measurement unit configured to measure, based on an output of the at least one optical sensor, the intensity of the radiation beam.

    EXPOSURE DEVICE
    6.
    发明申请
    EXPOSURE DEVICE 审中-公开

    公开(公告)号：US20180157177A1

    公开(公告)日：2018-06-07

    申请号：US15576606

    申请日：2016-05-19

    Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.

    Inventor： Jinglu SUN ,  Jian ZHOU

    IPC: G03F7/20 ,  G03F7/24 ,  G02B7/00

    CPC classification number: G03F7/70475 ,  G02B7/005 ,  G03F7/2004 ,  G03F7/2045 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70308 ,  G03F7/70716

    Abstract: An exposure device is disclosed, including: a light source (1), an illumination module (2), a mask stage (5), a projection objective module, an imaging position adjustment module (4) and a wafer stage (6), disposed sequentially along a direction of light propagation, the imaging position adjustment module (4) including a plurality of adjustment elements (410) arranged individually, the projection objective module including a plurality of projection objectives (3) each having an FoV in positional correspondence with a respective one of the plurality of adjustment elements (410). The imaging position adjustment module (4) ensures satisfactory imaging quality and FoV stitching quality of the projection objectives (3) by performing translation, magnification, focal plane and other adjustments on an image formed by the projection objective module. The projection objective module is simpler as it does not contain any component or mechanism for imaging position adjustment.

    Optical system and method of use
    9.
    发明授权
    Optical system and method of use 有权

    公开(公告)号：US09823579B2

    公开(公告)日：2017-11-21

    申请号：US14597497

    申请日：2015-01-15

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Olaf Conradi

    IPC: G03F7/20

    CPC classification number: G03F7/70266 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70891

    Abstract: A method for improving imaging properties of an optical system and an optical system of this type having improved imaging properties are described. The optical system can have a plurality of optical elements. In some embodiments, an optical element is positioned and/or deformed by mechanical force action and by thermal action. In certain embodiments, one optical element is positioned and/or deformed by mechanical force action and another optical element is deformed by thermal action.

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