公开(公告)号：US11345988B2

公开(公告)日：2022-05-31

申请号：US16674997

申请日：2019-11-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hwi Kim ,  In Bae Kim ,  Sung Soon Im ,  Kyu Hwan Hwang

IPC: C23C14/04 ,  C23C16/04 ,  H01L51/56 ,  H01L51/50

Abstract: A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.

公开(公告)号：US09703020B2

公开(公告)日：2017-07-11

申请号：US14660214

申请日：2015-03-17

Applicant: Samsung Display Co., Ltd. ,  KOREA UNIVERSITY Research and Business Foundation

Inventor： Seungin Baek ,  Hwi Kim ,  Dajeong Im ,  Sujin Choi

IPC: G02B5/22 ,  G02B7/00 ,  G02B5/00

CPC classification number: G02B5/003

Abstract: A broadband light absorber and a display apparatus including the same. The broadband light absorber includes a substrate and a pattern layer having a mesh structure including a plurality of openings, wherein any neighboring openings among the plurality of openings are non-uniform and wherein the plurality of openings comprise first openings haying a first size and second openings haying a second size different from the first size, the first openings and the second openings being alternately arranged in a first direction.