Multilayer mirror, method for manufacturing the same, and exposure equipment
    31.
    发明授权
    Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
    多层镜,其制造方法和曝光设备

    公开(公告)号:US07706058B2

    公开(公告)日:2010-04-27

    申请号:US12232241

    申请日:2008-09-12

    IPC分类号: G02B5/26

    摘要: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

    摘要翻译: 多层反射镜旨在减少反射率的入射角依赖性。 衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。 在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层,并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。 与仅提供Ru / Si相比,具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。 由于Ru吸收比Mo更多的EUV射线,因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。 具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性,从而在投影光学系统中实现高成像性能。

    Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same
    32.
    发明授权
    Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same 有权
    多层膜镜,包括它的光刻系统及其制造方法

    公开(公告)号:US07599112B2

    公开(公告)日:2009-10-06

    申请号:US11544483

    申请日:2006-10-06

    IPC分类号: G02B5/08

    摘要: Multilayer-film (MLF) reflective mirrors are disclosed that have a highly precise surface profile. An exemplary MLF reflective mirror includes multilayer film in which layers of molybdenum (Mo) and layers of silicon (Si) are periodically deposited in an alternating manner on the surface of a mirror substrate. One or more selected regions of the multilayer film have been “shaved” away layer-wise as required to impart an in-plane distribution of removed material sufficient to correct a wavefront error in light reflected from the mirror. After such “layer-machining,” a single-layer film of Si (or Si-containing material) is applied to fill in the machined areas and restore the original contour, as designed, for the surface of the multilayer film. I.e., the Si film has a thickness distribution corresponding to the depth profile of material removed from the multilayer film. A capping layer can be deposited uniformly on the surface of the single-layer film.

    摘要翻译: 公开了具有高精度表面轮廓的多层膜(MLF)反射镜。 示例性MLF反射镜包括多层膜,其中钼(Mo)层和硅层(Si)以交替的方式周期性地沉积在反射镜基板的表面上。 多层膜的一个或多个选择的区域已根据需要被层次地“剃光”,以便赋予去除材料的平面内分布足以校正从反射镜反射的光的波前误差。 在这样的“层加工”之后,施加单层Si(或含Si材料)膜以填充加工区域,并恢复原始轮廓,如同设计的,用于多层膜的表面。 即,Si膜具有与从多层膜去除的材料的深度分布相对应的厚度分布。 可以在单层膜的表面上均匀地沉积覆盖层。

    Multilayer mirror, method for manufacturing the same, and exposure equipment
    33.
    发明申请
    Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
    多层镜,其制造方法和曝光设备

    公开(公告)号:US20080049307A1

    公开(公告)日:2008-02-28

    申请号:US11907798

    申请日:2007-10-17

    IPC分类号: G02B5/09

    摘要: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full- width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

    摘要翻译: 多层反射镜旨在减少反射率的入射角依赖性。 衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。 在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层,并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。 与单独提供的Ru / Si相比,具有比仅提供Mo / Si多层的全宽半宽的反射率峰值更高的反射率。 由于Ru吸收比Mo更多的EUV射线,因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。 具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性,从而在投影光学系统中实现高成像性能。

    Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same
    34.
    发明申请
    Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same 有权
    多层膜镜,包括它的光刻系统及其制造方法

    公开(公告)号:US20070081229A1

    公开(公告)日:2007-04-12

    申请号:US11544483

    申请日:2006-10-06

    IPC分类号: F21V9/04

    摘要: Multilayer-film (MLF) reflective mirrors are disclosed that have a highly precise surface profile. An exemplary MLF reflective mirror includes multilayer film in which layers of molybdenum (Mo) and layers of silicon (Si) are periodically deposited in an alternating manner on the surface of a mirror substrate. One or more selected regions of the multilayer film have been “shaved” away layer-wise as required to impart an in-plane distribution of removed material sufficient to correct a wavefront error in light reflected from the mirror. After such “layer-machining,” a single-layer film of Si (or Si-containing material) is applied to fill in the machined areas and restore the original contour, as designed, for the surface of the multilayer film. I.e., the Si film has a thickness distribution corresponding to the depth profile of material removed from the multilayer film. A capping layer can be deposited uniformly on the surface of the single-layer film.

    摘要翻译: 公开了具有高精度表面轮廓的多层膜(MLF)反射镜。 示例性的MLF反射镜包括多层膜,其中钼(Mo)层和硅层(Si)以交替的方式周期性地沉积在反射镜基板的表面上。 多层膜的一个或多个选择的区域已根据需要被层次地“剃光”,以便赋予去除材料的平面内分布足以校正从反射镜反射的光的波前误差。 在这样的“层加工”之后,施加单层Si(或含Si材料)膜以填充加工区域,并恢复原始轮廓,如同设计的,用于多层膜的表面。 即,Si膜具有与从多层膜去除的材料的深度分布相对应的厚度分布。 可以在单层膜的表面上均匀地沉积覆盖层。

    Exposure apparatus
    35.
    发明申请
    Exposure apparatus 有权
    曝光装置

    公开(公告)号:US20070008509A1

    公开(公告)日:2007-01-11

    申请号:US11478686

    申请日:2006-07-03

    IPC分类号: G03B27/72

    摘要: An exposure apparatus that exposes an object to be exposed with light from an EUV light source. The light has an exposure wavelength component and a non-exposure wavelength component. The exposure apparatus has a detector that independently detects the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component of the light. Therefore, for example, even if the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component individually fluctuate, it is possible to accurately ascertain fluctuations in the characteristics of the optical system resulting from irradiation heat. As a result, it is also possible to achieve a high performance mirror adjustment system.

    摘要翻译: 曝光装置,用来自EUV光源的光进行曝光。 光具有曝光波长分量和非曝光波长分量。 曝光装置具有独立地检测曝光波长成分的光量和光的非曝光波长成分的光量的检测器。 因此,例如,即使曝光波长成分的光量和非曝光波长成分的光量各自波动,也能够精确地确定由照射热导致的光学系统的特性的波动。 结果,也可以实现高性能的镜面调节系统。

    Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same
    36.
    发明授权
    Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same 有权
    用于X射线光学系统的多层涂覆反射镜及其制造方法

    公开(公告)号:US06728037B2

    公开(公告)日:2004-04-27

    申请号:US10196528

    申请日:2002-07-15

    IPC分类号: G02B110

    摘要: Multilayer-film mirrors are disclosed that include multiple units of Mo and Si layers formed on the surface of a mirror substrate and that exhibit reduced internal stress and hence improved imaging properties. Hence, the mirrors are especially suitable for use in X-ray optical systems such as used in X-ray lithography systems. In an exemplary mirror, a molybdenum oxide layer is formed on at least one Mo layer at the interface surface between the Mo layer and an adjacent Si layer. The molybdenum oxide layer is formed by irradiation with oxygen ions, or by forming at least a portion of the Mo layer in an atmosphere including oxygen.

    摘要翻译: 公开了多层膜反射镜,其包括在镜面基板的表面上形成的Mo和Si层的多个单元,并且表现出减小的内部应力并因此改善成像性能。 因此,镜子特别适用于X射线光学系统,例如用于X射线光刻系统中。 在示例性反射镜中,在Mo层和相邻Si层之间的界面处的至少一个Mo层上形成氧化钼层。 通过用氧离子照射或通过在包含氧的气​​氛中形成M​​o层的至少一部分来形成氧化钼层。

    X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same
    37.
    发明授权
    X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same 有权
    X射线产生装置,包括该X射线产生装置的X射线微光刻装置以及利用其的微电子器件制造方法

    公开(公告)号:US06507641B1

    公开(公告)日:2003-01-14

    申请号:US09684872

    申请日:2000-10-06

    IPC分类号: H01I3700

    摘要: X-ray-generation devices are disclosed that generate X-rays in a stable manner over extended periods of time. An exemplary device includes an anode electrode and a cathode electrode coaxially arranged, and an insulating member. A nozzle connected to a reservoir of fluid target material directs a flow of fluid target material to the anode electrode. Meanwhile, a pulsed high voltage is applied between the anode electrode and cathode electrode in coordination with the supply of target material. The pulses are timed such that, whenever a unit of target material reaches a tip of the anode electrode, a plasma sheath generated at the surface of the insulating member also reaches the tip of the anode electrode. Hence, the target material is supplied automatically as required to produce X-rays continuously over an extended time period. Intense X-ray fluxes can be produced in a stable manner by monitoring the rate at which target material is supplied to the plasma, relative to the timing of discharge pulses.

    摘要翻译: 公开了在长时间内以稳定的方式产生X射线的X射线产生装置。 示例性装置包括同轴布置的阳极电极和阴极电极以及绝缘构件。 连接到流体目标材料的储存器的喷嘴将流体目标材料流引导到阳极电极。 同时,与目标材料的供应协调,在阳极和阴极之间施加脉冲高压。 脉冲被定时,使得当目标材料的单位到达阳极电极的尖端时,在绝缘构件的表面处产生的等离子体鞘也到达阳极电极的尖端。 因此,根据需要自动提供目标材料以在延长的时间段内连续地产生X射线。 相对于放电脉冲的定时,可以通过监测向等离子体供给目标材料的速率,以稳定的方式产生强烈的X射线通量。

    Optical sample X-ray testing apparatus and method for testing optical sample with X-rays

    公开(公告)号:US06504900B2

    公开(公告)日:2003-01-07

    申请号:US09814729

    申请日:2001-03-23

    IPC分类号: G01N2320

    CPC分类号: G01N23/20

    摘要: An optical sample X-ray testing apparatus including an X-ray source which is configured to radiate X-rays including a group of line spectra. At least one line spectrum selecting device is provided between the X-ray source and an optical sample and configured to direct substantially one line spectrum among the group of line spectra from the X-ray source toward the optical sample. An optical characteristics finding device is configured to find optical characteristics of the optical sample based on radiation of the substantially one line spectrum through the line spectrum selecting device onto the optical sample.

    Multi-layered mirror
    39.
    发明授权
    Multi-layered mirror 有权
    多层镜

    公开(公告)号:US06441963B2

    公开(公告)日:2002-08-27

    申请号:US09867191

    申请日:2001-05-30

    IPC分类号: G02B110

    摘要: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

    摘要翻译: 多层反射镜具有基板,第一物质的第一层和第二物质的第二层。 所使用的波长区域中的第一物质的折射率与第二物质的折射率不同。 第一层和第二层交替层叠在基板上。 为了获得高反射率和优异的光学特性,使用至少两种在所使用的波长区域中的复数折射率的实部大致相同的物质,在第一层或第二层内形成多层结构。 或者,在形成下一层之前使层表面平滑。 使用本发明的多层反射镜的曝光装置以更高的效率使用光。

    Multi-layered mirror
    40.
    发明授权
    Multi-layered mirror 有权
    多层镜

    公开(公告)号:US06295164B1

    公开(公告)日:2001-09-25

    申请号:US09391376

    申请日:1999-09-08

    IPC分类号: G02B110

    摘要: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

    摘要翻译: 多层反射镜具有基板,第一物质的第一层和第二物质的第二层。 所使用的波长区域中的第一物质的折射率与第二物质的折射率不同。 第一层和第二层交替层叠在基板上。 为了获得高反射率和优异的光学特性,使用至少两种在所使用的波长区域中的复数折射率的实部大致相同的物质,在第一层或第二层内形成多层结构。 或者,在形成下一层之前使层表面平滑。 使用本发明的多层反射镜的曝光装置以更高的效率使用光。