公开(公告)号：US10074451B2

公开(公告)日：2018-09-11

申请号：US15235173

申请日：2016-08-12

申请人： CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE S.A.-RECHERCHE ET DEVELOPPEMENT

发明人： Christian Kottler ,  Vincent Revol

IPC分类号： G21K1/06 ,  G01N23/20 ,  G02B5/18 ,  G02B27/42 ,  G01N23/20008 ,  G02B27/00 ,  A61B6/00 ,  A61B6/06

CPC分类号： G21K1/067 ,  A61B6/06 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/588 ,  A61B6/589 ,  G01N23/20008 ,  G01N23/20075 ,  G01N2223/1003 ,  G01N2223/313 ,  G02B5/1814 ,  G02B5/1819 ,  G02B5/1838 ,  G02B5/1871 ,  G02B27/0087 ,  G02B27/42 ,  G02B2005/1804 ,  G21K1/06 ,  G21K2201/067 ,  G21K2207/005

摘要： Embodiments relate to an X-ray interferometer for imaging an object comprising: a phase grating for effecting in correspondence with the phase grating geometry a phase shift to at least a part of X-ray incident onto the phase grating; and an absorption grating for effecting in correspondence with the absorption grating geometry absorption to at least a part of X-ray incident onto the absorption grating. The grating period of the phase grating, and the grating period of the absorption grating may be dimensioned such that a detector for X-rays can be placed at a relatively large distance away from the absorption grating such the phase contrast sensitivity of the image of the object detected by the detector remains substantially unaffected.

公开(公告)号：US10020087B1

公开(公告)日：2018-07-10

申请号：US14692570

申请日：2015-04-21

申请人： Michael Kozhukh

发明人： Michael Kozhukh

IPC分类号： G21K1/06

CPC分类号： G21K1/062 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

摘要： A crystal monochromator is manufactured by heating a crystal having an original thickness to a temperature of over about 850° C. The crystal is compressed for a duration of approximately 1-5 minutes with a force of about 5-10 metric tons while the crystal is maintained at the temperature of over about 850° C. to plastically deform the crystal along an axis, wherein the compressing causes a plastic deformation of about 0.5%-1.5% of the original thickness. The crystal may be sliced to form crystal monochromators having a mosaicity of between about 15-28 arcminutes and a slow neutron reflectivity of over 70% at a rocking curve peak.

公开(公告)号：US10001709B2

公开(公告)日：2018-06-19

申请号：US15432698

申请日：2017-02-14

申请人： ASML Netherlands B.V.

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Antonius Johannes Josephus Van Dijsseldonk ,  Wilhelmus Petrus De Boeij

IPC分类号： G03F7/20 ,  G02B5/18 ,  G02B1/11 ,  G02B5/28 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

公开(公告)号：US20180075938A1

公开(公告)日：2018-03-15

申请号：US15802473

申请日：2017-11-03

申请人： Tsinghua University ,  Nuctech Company Limited

发明人： Li ZHANG ,  Mingzhi HONG ,  Qingping HUANG ,  Le SHEN

IPC分类号： G21K1/06 ,  G02B5/18

CPC分类号： G21K1/06 ,  G02B5/1838 ,  G21K1/025 ,  G21K2201/067 ,  G21K2207/005

摘要： The disclosure relates to a grating and a radiation imaging device. The grating comprises a plurality of stacked grating elements. The grating elements are stacked to form a grid. The grating element comprises a first sheet and a second sheet having two parallel planes. The second sheet is stacked at the first sheet in a length direction of the first sheet. The first sheet is almost impervious to radiation. The present disclosure stacks the sheets having different specifications together to form the grating with uniform grating slits, such that there is no limitation on the thickness of the grating and the grating can be used along with high-energy radiations.

公开(公告)号：US09891530B2

公开(公告)日：2018-02-13

申请号：US14567645

申请日：2014-12-11

申请人： Carl Zeiss SMT GmbH

发明人： Martin Endres ,  Michael Patra

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B26/08 ,  G21K1/06

CPC分类号： G03F7/70116 ,  G02B26/0833 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/702 ,  G03F7/70233 ,  G21K1/06 ,  G21K2201/067

摘要： An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets.

公开(公告)号：US20180039001A1

公开(公告)日：2018-02-08

申请号：US15789125

申请日：2017-10-20

申请人： Carl Zeiss SMT GmbH

发明人： Anastasia GONCHAR

IPC分类号： G02B5/08 ,  G02B1/14 ,  G21K1/06 ,  G03F7/20

CPC分类号： G02B5/0891 ,  G02B1/14 ,  G02B5/0816 ,  G02B27/0006 ,  G03F1/24 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A mirror, in particular for a microlithographic projection exposure apparatus, has a mirror substrate (101), a reflection layer system (102) configured to reflect electromagnetic radiation that is incident on the optically effective surface (100a), and a capping layer (104), which is arranged on the side of the reflection layer system (102) facing the optically effective surface. The capping layer is produced from a first material. Particles (105) of a second material, either individually or in clusters, are applied onto this capping layer, wherein the second material differs from the first material.

公开(公告)号：US20180011035A1

公开(公告)日：2018-01-11

申请号：US15712799

申请日：2017-09-22

申请人： RIGAKU CORPORATION

发明人： Naoki KAWAHARA

IPC分类号： G01N23/207 ,  G21K1/06

CPC分类号： G01N23/223 ,  G01N23/207 ,  G01N23/22 ,  G01N2223/315 ,  G21K1/06 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

摘要： A doubly bent X-ray spectroscopic device (1) according to the present invention includes: a glass plate (3) which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface (21a) of a convex forming die (21) and a doubly curved concave surface (22a), of a concave forming die (22), that matches the doubly curved convex surface (21a), and being heated to a temperature of 400° C. to 600° C.; and a reflection coating (5) configured to reflect X-rays, which is formed on a concave surface (3a) of the deformed glass plate (3 ).

公开(公告)号：US09773578B2

公开(公告)日：2017-09-26

申请号：US14765367

申请日：2014-01-14

申请人： ASML Netherlands B.V.

发明人： Alexey Sergeevich Kuznetsov ,  Arjen Boogaard ,  Jeroen Marcel Huijbregtse ,  Andrey Nikipelov ,  Maarten Van Kampen

IPC分类号： G21K1/06 ,  G03F7/20 ,  H05G2/00 ,  B82Y10/00 ,  C23C28/00 ,  G03F1/24

CPC分类号： G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

摘要： A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

公开(公告)号：US09761340B2

公开(公告)日：2017-09-12

申请号：US15275430

申请日：2016-09-25

申请人： Qing Qian

发明人： Qing Qian

IPC分类号： H01L31/08 ,  H01L31/18 ,  G01N23/207 ,  G21K1/00

CPC分类号： G21K1/00 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067 ,  H01L31/085 ,  H01L31/1804

摘要： A method of preparing two dimension bent X-ray crystal analyzers in strips feature is provided. A crystal wafer in strips is bonded to a curved substrate which offers the desired focus length. A crystal wafer in strips is pressed against the surface of the substrate forming curved shape by anodic bonding or glue bonding. The bonding is permanently formed between crystal wafer and its substrate surface, which makes crystal wafer has same curvature as previously prepared substrate.

公开(公告)号：US09690016B2

公开(公告)日：2017-06-27

申请号：US14696331

申请日：2015-04-24

申请人： Applied Materials, Inc.

发明人： Ralf Hofmann ,  Cara Beasley ,  Vinayak Vishwanath Hassan ,  Majeed A. Foad

IPC分类号： G02B5/08 ,  C23C16/24 ,  C23C16/455 ,  G03F7/20 ,  C23C14/06 ,  C23C14/14 ,  G21K1/06 ,  H05G2/00

CPC分类号： G02B5/0891 ,  C23C14/06 ,  C23C14/14 ,  C23C16/24 ,  C23C16/45525 ,  G02B5/0833 ,  G02B5/0875 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/008

摘要： An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.