摘要:
An ink jet print head front face or nozzle plate having a textured superoleophobic surface that prevents undesirable drooling, wetting and/or adhesion of the ink on the print head. The textured surface includes a rim formed around the nozzle. Also described are methods for forming the textured superoleophobic ink jet print head front face or nozzle plate from silicon having the textured, oleophobic surface.
摘要:
A thermal bubble jetting device including a substrate. A superoleophobic, textured surface is positioned on the substrate. The textured surface comprises one or more gaps configured for holding a gas. A receptacle is positioned in fluid communication with the textured surface. Both an inlet and nozzle are in fluid communication with the receptacle. The device includes a heater mechanism configured to expand a gas in the one or more gaps so as to sufficiently increase pressure in the receptacle to force liquid through the nozzle.
摘要:
An ink jet print head front face or nozzle plate having a textured superoleophobic surface that prevents undesirable drooling, wetting and/or adhesion of the ink on the print head. The textured surface includes a rim formed around the nozzle. Also described are methods for forming the textured superoleophobic ink jet print head front face or nozzle plate from silicon having the textured, oleophobic surface.
摘要:
Various embodiments provide materials and methods for a superoleophobic device, which can include a conformal oleophobic coating disposed on glass pillars and/or stripe-shaped glass structures on a glass substrate to provide the device with a textured superoleophobic surface.
摘要:
The present teachings provide a fuser member. The fuser member includes a substrate, a functional layer disposed on the substrate, and an outer layer disposed on the functional layer. The outer layer includes silicon having a texture, and a conformal oleophobic coating disposed on the silicon.
摘要:
In accordance with the invention, there are printing apparatuses and methods of forming an image. An exemplary printing apparatus can include a fuser subsystem including one or more light induced heating elements, each of the one or more light induced heating elements including plurality of nanomaterials, wherein the nanomaterials are selected from the group consisting of carbon nanotubes and metal nanoshells. The exemplary printing apparatus can also include one or more light sources disposed in close proximity to the one or more light induced heating elements, each of the one or more light sources having an emission in the absorption range of the plurality of nanomaterials and disposed to produce heat in the fuser subsystem by light absorption by the plurality of nanomaterials.
摘要:
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
摘要:
A process for preparing a flexible device having a textured superoleophobic surface comprising providing a flexible substrate; disposing a silicon layer on the flexible substrate; using photolithography to create a textured pattern in the silicon layer on the substrate wherein the textured pattern comprises an array of pillars; and chemically modifying the textured surface by disposing a conformal oleophobic coating thereon; to provide a flexible device having a superoleophobic surface and, in embodiments, to provide a flexible device having a surface that is both superoleophobic and superhydrophobic.
摘要:
Various embodiments provide a device having a multi-scale superoleophobic surface and methods for forming and using the device, wherein a particulate composite layer including metal-containing particulates is formed on a textured micron-/sub-micron surface of a semiconductor layer to provide device with multi-scale rough surface.
摘要:
A process for preparing a flexible device having a superoleophobic surface comprising providing a flexible substrate; disposing a silicon layer on the flexible substrate; using photolithography to create a textured pattern in the silicon layer on the substrate wherein the textured pattern comprises a groove structure; and chemically modifying the textured surface by disposing a conformal oleophobic coating thereon; to provide a flexible device having a superoleophobic surface.