PROCESS FOR PREPARING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, PROCESS FOR VERIFYING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, PROCESS FOR DISPLAYING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, AND EXPOSURE DEVICE
    31.
    发明授权
    PROCESS FOR PREPARING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, PROCESS FOR VERIFYING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, PROCESS FOR DISPLAYING DATA FOR DIRECT-WRITING BY A CHARGED PARTICLE RAY, AND EXPOSURE DEVICE 失效
    用于通过充电颗粒制备用于直接写入的数据的过程,用于通过充电颗粒进行直接写入的数据验证过程,用于显示由充电粒子和曝光装置进行直接写入的数据的过程

    公开(公告)号:US06393604B1

    公开(公告)日:2002-05-21

    申请号:US09435630

    申请日:1999-11-08

    Abstract: Plural patterns of cell projections made in an aperture are stored in a register. Cells in designed data are compared with the cell projections stored in the register by an interlayer operation, to judge whether or not a cell which coincides with any one of the cells in the designed data is present among the patterns of the cell projections stored in the register. In the case that the judgement that the coinciding cell is present is given, the coinciding cell projection is e acted and outputted as data for direct-writing. In the case that the judgement that no coinciding cell is present is given, if a cell whose reference frequency is over a given value is present, this cell is extracted and registered as a new cell projection.

    Abstract translation: 在孔中制作的多个单元格投影图案存储在寄存器中。 将设计数据中的单元与通过层间操作存储在寄存器中的单元投影进行比较,以判断与设计数据中的任何一个单元格重合的单元是否存在于存储在 寄存器。 在给出存在一致单元的判断的情况下,将重合的单元投影作为直接写入的数据输出并输出。 在给出不存在符合小区的判断的情况下,如果存在参考频率超过给定值的小区,则将该小区提取并登记为新的小区投影。

    Method for making partial full-wafer pattern for charged particle beam lithography
    32.
    发明授权
    Method for making partial full-wafer pattern for charged particle beam lithography 有权
    用于制造用于带电粒子束光刻的部分全晶片图案的方法

    公开(公告)号:US06277530B1

    公开(公告)日:2001-08-21

    申请号:US09417099

    申请日:1999-10-13

    Inventor: Yasuhisa Yamada

    CPC classification number: B82Y10/00 B82Y40/00 H01J37/3023 H01J37/3174

    Abstract: Disclosed is a method for making a partial full-wafer pattern for charged particle beam lithography based on circuit design data. This method has the steps of: conducting the interlayer operation between the circuit design data of a pattern of lithographed layer and the circuit design data of a pattern of base layer underlying the lithographed layer to extract a product-set pattern; and making data of partial full-wafer pattern by setting the product-set pattern to be a target region of partial full-wafer pattern.

    Abstract translation: 公开了一种基于电路设计数据制造用于带电粒子束光刻的部分全晶片图案的方法。 该方法具有以下步骤:在光刻层的图案的电路设计数据与石版印刷层下面的基底图案的电路设计数据之间进行层间操作以提取产品集图案; 以及通过将产品集合图案设置为部分全晶片图案的目标区域来制作部分全晶片图案的数据。

    Method of preparing a partial one-shot electron beam exposure mask and method of direct-writing patterns by use of a partial one-shot electron beam exposure mask
    33.
    发明授权
    Method of preparing a partial one-shot electron beam exposure mask and method of direct-writing patterns by use of a partial one-shot electron beam exposure mask 失效
    制备局部单次电子束曝光掩模的方法和使用部分单次电子束曝光掩模直接写入图案的方法

    公开(公告)号:US06192510B1

    公开(公告)日:2001-02-20

    申请号:US09118860

    申请日:1998-07-20

    Inventor: Yasuhisa Yamada

    CPC classification number: H01J37/3026 H01J2237/3175

    Abstract: A method of extracting data of at least one aperture mask pattern from design data which includes write-required patterns and repeating units, so that boundary lines of the at least one aperture mask pattern are different from boundary lines of the repeating unit on the design data and so that the at least one aperture mask pattern completely includes at least one of the write-required patterns without partially or incompletely including the write-required pattern.

    Abstract translation: 从包括写入需要的图案和重复单元的设计数据中提取至少一个孔径掩模图案的数据的方法,使得至少一个孔径掩模图案的边界线与设计数据上的重复单元的边界线不同 并且使得所述至少一个孔径掩模图案完全包括写需要图案中的至少一个,而不部分地或不完全地包括写需要图案。

    Beam exposure system having improved mask unit
    34.
    发明授权
    Beam exposure system having improved mask unit 失效
    光束曝光系统具有改进的掩模单元

    公开(公告)号:US5731591A

    公开(公告)日:1998-03-24

    申请号:US784513

    申请日:1997-01-17

    CPC classification number: B82Y10/00 B82Y40/00 H01J37/3174 H01J2237/0458

    Abstract: In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.

    Abstract translation: 在光束曝光系统中,将光束照射到掩模单元上,并且通过掩模单元的光束被偏转并照射到目标上。 掩模单元包括多边形中空的保持器和多个掩模。 保持器由具有用于安装掩模的孔的掩模安装板和每个具有用于使梁通过的孔的框架形成。

    Steering apparatus
    35.
    发明授权
    Steering apparatus 有权
    转向装置

    公开(公告)号:US08336669B2

    公开(公告)日:2012-12-25

    申请号:US13058890

    申请日:2010-09-10

    Inventor: Yasuhisa Yamada

    CPC classification number: B60R21/045 B60R2021/0051

    Abstract: Low cost construction of a steering apparatus is provided that is capable of protecting an operator's knees 28 during an automobile collision. A tilted plate 30 is arranged below and behind a bottom end section of a housing 21 which is a component of an electric power assist mechanism 20 connected to a front end section of a steering column 9. In case that the automobile is in a collision, automobile equipment 29 that moves forward under pressure from the driver's knees hits against a bottom surface of the tilted plate. This allows the impact energy to be absorbed by the elasticity or deformation of the tilted plate 30 during impact, and after impact as well, the automobile equipment 29 to move in a direction along the bottom surface of the tilted plate.

    Abstract translation: 提供了一种转向装置的廉价构造,其能够在汽车碰撞期间保护操作者的膝盖28。 在作为与转向柱9的前端部连接的电动辅助机构20的部件的壳体21的下端部的下方配置有倾斜板30.在汽车碰撞的情况下, 在驾驶员膝盖的压力下向前移动的汽车设备29碰到倾斜板的底面。 这样就可以使撞击能量在冲击期间被倾斜板30的弹性或变形所吸收,并且在冲击之后,汽车设备29沿着倾斜板的底面的方向移动。

    Image stabilization control circuit
    36.
    发明授权
    Image stabilization control circuit 有权
    图像稳定控制电路

    公开(公告)号:US08089517B2

    公开(公告)日:2012-01-03

    申请号:US12314989

    申请日:2008-12-19

    CPC classification number: G03B5/00

    Abstract: In an image stabilization control circuit of an image-capturing device, a gyro-equalizer (24) is used to integrate an angular velocity signal corresponding to vibration, and determine a required magnitude of displacement of a lens. The gyro-equalizer (24) integrates the angular velocity signal from a gyro-sensor (12) using an integration circuit (46) (LPF), and converts the result into an angular signal. A direct-current component of the angular signal is removed using a centering circuit (52) (HPF). Excessive phase delay of the angular signal on a high-frequency side caused by a phase characteristic of the gyro-sensor (12) is compensated by a phase lead compensation circuit (50) composed of a high-boost filter, and the phase delay of the angular signal with respect to the angular velocity signal is brought nearer to 90° by an integration process.

    Abstract translation: 在图像拍摄装置的图像稳定控制电路中,陀螺均衡器(24)用于对与振动相对应的角速度信号进行积分,并且确定透镜所需的位移大小。 陀螺均衡器(24)使用积分电路(46)(LPF)对来自陀螺仪传感器(12)的角速度信号进行积分,并将结果转换成角度信号。 使用定心电路(52)(HPF)去除角度信号的直流分量。 由陀螺仪传感器(12)的相位特性引起的高频侧的角度信号的相位延迟过大由由高升压滤波器构成的相位超前补偿电路(50)补偿,相位延迟 相对于角速度信号的角度信号通过积分处理使其接近90°。

    Image stabilization control circuit
    37.
    发明申请
    Image stabilization control circuit 有权
    图像稳定控制电路

    公开(公告)号:US20090161237A1

    公开(公告)日:2009-06-25

    申请号:US12314306

    申请日:2008-12-08

    CPC classification number: G03B5/00

    Abstract: A image stabilization control circuit for an image capturing device, wherein a gyro-equalizer (24) integrates an angular velocity signal from a gyro-sensor (12) in an integration circuit (46). The integration circuit (46) is composed of a low-boost filter (LBF), and a phase delay in a target compensation region is set to a value appropriate for an integration process. Furthermore, a characteristic whereby the LBF reduces the phase delay at higher frequencies is used, compensation is applied to the excess phase delay of the angular signal in the high-frequency region brought about by the effect of the phase delay generated in the high-frequency region by the output signal of the gyro-sensor (12), and the phase delay in the high-frequency region is brought nearer to 90 degrees. This allows the accuracy of the process for determining the required displacement magnitude of a lens to be increased.

    Abstract translation: 一种用于图像捕获装置的图像稳定控制电路,其中陀螺均衡器(24)将来自陀螺仪传感器(12)的角速度信号积分在积分电路(46)中。 积分电路(46)由低升压滤波器(LBF)构成,目标补偿区域的相位延迟被设定为适合于积分处理的值。 此外,使用LBF在较高频率下降低相位延迟的特性,对由高频中产生的相位延迟的影响引起的高频区域的角度信号的超相位延迟进行补偿 区域,由陀螺仪传感器(12)的输出信号,使高频区域的相位延迟更靠近90度。 这允许用于确定要增加的透镜的所需位移幅度的处理的精度。

    Image stabilization control circuit
    38.
    发明申请
    Image stabilization control circuit 有权
    图像稳定控制电路

    公开(公告)号:US20090160953A1

    公开(公告)日:2009-06-25

    申请号:US12314989

    申请日:2008-12-19

    CPC classification number: G03B5/00

    Abstract: In an image stabilization control circuit of an image-capturing device, a gyro-equalizer (24) is used to integrate an angular velocity signal corresponding to vibration, and determine a required magnitude of displacement of a lens. The gyro-equalizer (24) integrates the angular velocity signal from a gyro-sensor (12) using an integration circuit (46) (LPF), and converts the result into an angular signal. A direct-current component of the angular signal is removed using a centering circuit (52) (HPF). Excessive phase delay of the angular signal on a high-frequency side caused by a phase characteristic of the gyro-sensor (12) is compensated by a phase lead compensation circuit (50) composed of a high-boost filter, and the phase delay of the angular signal with respect to the angular velocity signal is brought nearer to 90° by an integration process.

    Abstract translation: 在图像拍摄装置的图像稳定控制电路中,陀螺均衡器(24)用于对与振动相对应的角速度信号进行积分,并且确定透镜所需的位移大小。 陀螺均衡器(24)使用积分电路(46)(LPF)对来自陀螺仪传感器(12)的角速度信号进行积分,并将结果转换成角度信号。 使用定心电路(52)(HPF)去除角度信号的直流分量。 由陀螺仪传感器(12)的相位特性引起的高频侧的角度信号的相位延迟过大由由高升压滤波器构成的相位超前补偿电路(50)补偿,相位延迟 相对于角速度信号的角度信号通过积分处理使其接近90°。

    Extendable vehicle steering shaft
    39.
    发明授权
    Extendable vehicle steering shaft 有权
    可扩展车辆转向轴

    公开(公告)号:US07338382B2

    公开(公告)日:2008-03-04

    申请号:US10531180

    申请日:2003-10-08

    Inventor: Yasuhisa Yamada

    Abstract: In a telescopic shaft for vehicle steering, assembled in a steering shaft of a vehicle and including a male shaft and a female shaft so fitted as to be mutually incapable of rotating but mutually slidable, at least one set of torque transmission members are disposed in at least one set of accommodating portions formed in an outer peripheral surface of the male shaft and in an inner peripheral surface of the female shaft, and at least the one set of torque transmission members are cylindrical members that gradually decrease in their diameters toward end portions in an axial direction.

    Abstract translation: 在用于车辆转向的伸缩轴中,组装在车辆的转向轴中并且包括相互不能旋转但相互可滑动的公轴和母轴,所述至少一组扭矩传递构件设置在 至少一组容纳部分形成在阳轴的外周表面和阴轴的内周表面中,并且至少一组扭矩传递构件是圆柱形构件,其直径朝向端部的端部逐渐减小 轴向。

    Telescopic shaft
    40.
    发明申请
    Telescopic shaft 审中-公开
    伸缩轴

    公开(公告)号:US20060181069A1

    公开(公告)日:2006-08-17

    申请号:US11353113

    申请日:2006-02-14

    Inventor: Yasuhisa Yamada

    Abstract: A surface hardening treatment is applied to an inner peripheral surface of a female shaft 2, thereby forming a hard layer Ha thereon. Surface harness of the hard layer is 400 Hv or more. The thickness of the hard layer Ha is 10 μm to 100 μm, and for example gas nitrocarburizing treatment is performed as the surface hardening treatment. A surface hardening treatment is also applied to an outer surface of each cylindrical member 8 by a heat treatment, thereby forming a hard layer Hb thereon. With this construction, the inner peripheral surface of the female shaft is prevented from deformation and wear under a high contact pressure, so that the smooth sliding movement can be obtained.

    Abstract translation: 对母轴2的内周面施加表面硬化处理,由此在其上形成硬质层Ha。 硬层的表面线束为400Hv以上。 硬质层Ha的厚度为10μm〜100μm,例如进行气体氮碳共渗处理,作为表面硬化处理。 通过热处理也对每个圆柱形构件8的外表面进行表面硬化处理,从而在其上形成硬质层Hb。 通过这种结构,能够防止母轴的内周面在高接触压力下变形和磨损,从而可以获得平滑的滑动运动。

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