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    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
    1.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
    充电颗粒光束写字装置和充电颗粒光束写字方法

    公开(公告)号：US20160336141A1

    公开(公告)日：2016-11-17

    申请号：US15145398

    申请日：2016-05-03

    申请人： NuFlare Technology, Inc.

    发明人： Haruyuki NOMURA

    IPC分类号： H01J37/14 ,  H01J37/317

    CPC分类号： H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

    摘要： A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

    摘要翻译： 带电粒子束写入装置包括在发射源的下游侧的限制孔径构件，其布置成使得其高度位置可以根据条件被选择性地调节为第n高度位置之一（n为整数） 基于根据发光源的高度位置和发射电流值中的至少一个的第n个条件，并且第（n + m）个高度位置（m是1或更大的整数） ）基于取决于发射源的高度位置和发射电流值中的至少一个的第（n + m）条件，以及在电子透镜的下游侧的成形孔构件和限制孔径构件 带电粒子束通过使一部分带电粒子束通过第二个开口。

    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
    2.
    发明申请
    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
    这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件

    公开(公告)号：US20160155603A1

    公开(公告)日：2016-06-02

    申请号：US15016743

    申请日：2016-02-05

    申请人： Applied Materials Israel Ltd. ,  Carl Zeiss Microscopy GMBH

    发明人： Dirk Zeidler ,  Thomas KEMEN ,  Anger Pascal ,  Antonio Casares ,  Christof Riedesel

    IPC分类号： H01J37/09 ,  H01J37/21

    CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    摘要： The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    摘要翻译： 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 更容易（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

    Charged particle beam system having multiple user-selectable operating modes
    5.
    发明授权
    Charged particle beam system having multiple user-selectable operating modes 有权
    具有多个用户可选操作模式的带电粒子束系统

    公开(公告)号：US08445870B2

    公开(公告)日：2013-05-21

    申请号：US13338456

    申请日：2011-12-28

    申请人： Shouyin Zhang ,  Tom Miller ,  Sean Kellog ,  Anthony Graupera

    发明人： Shouyin Zhang ,  Tom Miller ,  Sean Kellog ,  Anthony Graupera

    IPC分类号： H01J37/30 ,  H01J37/302

    CPC分类号： H01J37/3005 ,  H01J37/3023 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/06366 ,  H01J2237/0815 ,  H01J2237/31749

    摘要： A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.

    摘要翻译： 一种在采用电感耦合等离子体离子源的聚焦离子束（FIB）系统中进行铣削和成像的方法，其中使用两组FIB系统操作参数：第一组，表示用于在铣削中操作FIB系统的优化参数 模式，以及表示用于在成像模式下操作的优化参数的第二组。 这些操作参数可以包括ICP源中的气体压力，ICP源的RF功率，离子提取电压，以及在一些实施例中，FIB系统离子列内的各种参数，包括透镜电压和光束限定孔直径 。 优化的铣削工艺提供了从基材表面快速去除材料的体积（低空间分辨率）的最大研磨速度。 优化的成像过程提供最小化的材料去除和更高的空间分辨率，用于改进正在研磨的衬底区域的成像。

    Focused Ion Beam Device and Focused Ion Beam Processing Method
    6.
    发明申请
    Focused Ion Beam Device and Focused Ion Beam Processing Method 失效
    聚焦离子束装置和聚焦离子束加工方法

    公开(公告)号：US20120235055A1

    公开(公告)日：2012-09-20

    申请号：US13513256

    申请日：2010-11-15

    申请人： Yuichi Madokoro ,  Hirokazu Kaneoya ,  Tsuyoshi Onishi ,  Isamu Sekihara

    发明人： Yuichi Madokoro ,  Hirokazu Kaneoya ,  Tsuyoshi Onishi ,  Isamu Sekihara

    IPC分类号： H01J3/28

    CPC分类号： G21K1/00 ,  H01J37/1478 ,  H01J37/3056 ,  H01J2237/0458 ,  H01J2237/31745

    摘要： Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.

    摘要翻译： 公开了一种光学系统的操作，其实现了与样品台机械倾斜的情况相当的聚焦离子束处理的观察。 在聚焦离子束光学系统中，控制孔径，倾斜偏转器，光束扫描器和物镜，以照射倾斜到光学系统的光轴的离子束，由此实现薄膜处理和交叉 部分处理，而不需要对样品台进行调整和操作。 利用聚焦离子束的薄膜处理和横截面加工可以自动化，并且可以提高收率。 例如，通过将本发明应用于截面监视器来检测终点，可以容易地自动化横截面处理。

    Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
    7.
    发明授权
    Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope 有权
    界面，在非真空环境中观察物体的方法和扫描电子显微镜

    公开(公告)号：US08164057B2

    公开(公告)日：2012-04-24

    申请号：US12446757

    申请日：2007-10-23

    申请人： Dov Shachal

    发明人： Dov Shachal

    IPC分类号： G01N23/00

    CPC分类号： H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

    摘要： An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

    摘要翻译： 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

    METHOD FOR CONTROLLING CHARGING OF SAMPLE AND SCANNING ELECTRON MICROSCOPE
    8.
    发明申请
    METHOD FOR CONTROLLING CHARGING OF SAMPLE AND SCANNING ELECTRON MICROSCOPE 有权
    用于控制样品和扫描电子显微镜充电的方法

    公开(公告)号：US20110139981A1

    公开(公告)日：2011-06-16

    申请号：US13059537

    申请日：2009-08-08

    申请人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

    发明人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

    IPC分类号： G01N23/225 ,  G01N23/00

    CPC分类号： H01J37/026 ,  H01J37/09 ,  H01J37/15 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/0045 ,  H01J2237/0458

    摘要： An object of the present invention is to provide a scanning electron microscope aiming at making it possible to control the quantity of electrons generated by collision of electrons emitted from a sample with other members, and a sample charging control method using the control of electron quantity. To achieve the object, a scanning electron microscope including a plurality of apertures through which an electron beam can pass and a mechanism for switching the apertures for the electron beam, and a method for controlling sample charging by switching the apertures are proposed. The plurality of apertures are at least two apertures. Portions respectively having different secondary electron emission efficiencies are provided on peripheral portions of the at least two apertures on a side opposed to the sample. The quantity of electrons generated by collision of electrons emitted from the sample can be controlled by switching the apertures.

    摘要翻译： 本发明的目的是提供一种扫描电子显微镜，其目的在于可以控制从样品与其他部件发射的电子的碰撞产生的电子的量，以及使用电子量的控制的样品充电控制方法。 为了实现该目的，提出了一种扫描电子显微镜，其包括电子束可以通过的多个孔，以及用于切换电子束的孔的机构，以及通过切换孔来控制样品充电的方法。 多个孔是至少两个孔。 分别具有不同二次电子发射效率的部分设置在与样品相对的一侧上的至少两个孔的周边部分上。 可以通过切换孔来控制从样品发射的电子的碰撞产生的电子的量。

    Variable shaped electron beam lithography system and method for manufacturing substrate
    10.
    发明授权
    Variable shaped electron beam lithography system and method for manufacturing substrate 失效
    可变形电子束光刻系统及基板制造方法

    公开(公告)号：US07714308B2

    公开(公告)日：2010-05-11

    申请号：US11899291

    申请日：2007-09-05

    申请人： Masahito Hiroshima

    发明人： Masahito Hiroshima

    IPC分类号： H01J37/30 ,  H01J37/08 ,  G21K5/00

    CPC分类号： H01J37/1472 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0455 ,  H01J2237/0456 ,  H01J2237/0458 ,  H01J2237/0835

    摘要： This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern using the single electron beam formed by passing the beam through the first, second and third aperture in sequence. Each of the first, second and third aperture has a mechanism for rotationally driving the aperture around an optical axis up to an arbitrary angle from 0 to 360°. Further, in the third aperture, a mechanism for varying the opening slit width of the rectangular opening portion is provided.

    摘要翻译： 该VSB光刻系统包括用于在设置的每个矩形开口部分中形成单个电子束的第一，第二和第三孔，并且使用通过使光束穿过第一，第二和第二孔而形成的单个电子束来绘制图形图案 第三个孔径顺序。 第一，第二和第三孔中的每一个具有用于围绕光轴旋转地驱动孔径至0至360°任意角度的机构。 此外，在第三孔中，设置有用于改变矩形开口部分的开口狭缝宽度的机构。