METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
    41.
    发明申请
    METHOD FOR FABRICATING SEMICONDUCTOR DEVICE 审中-公开
    制造半导体器件的方法

    公开(公告)号:US20120108073A1

    公开(公告)日:2012-05-03

    申请号:US12981983

    申请日:2010-12-30

    IPC分类号: H01L21/3065

    CPC分类号: H01L21/32137 H01L21/32155

    摘要: A method for fabricating a semiconductor device includes forming a plurality of patterns, forming an etch target layer to gap-fill the plurality of patterns, forming an impurity region in the etch target layer, and performing an etch-back process on the etch target layer using the impurity region as an etch stop barrier.

    摘要翻译: 一种用于制造半导体器件的方法包括形成多个图案,形成蚀刻目标层以间隙填充多个图案,在蚀刻目标层中形成杂质区域,并在蚀刻目标层上执行回蚀刻工艺 使用杂质区域作为蚀刻阻挡层。

    STORAGE DEVICE SUPPORTING AUTO BACKUP FUNCTION
    42.
    发明申请
    STORAGE DEVICE SUPPORTING AUTO BACKUP FUNCTION 审中-公开
    支持自动备份功能的存储设备

    公开(公告)号:US20110047409A1

    公开(公告)日:2011-02-24

    申请号:US12844391

    申请日:2010-07-27

    IPC分类号: G06F12/16 G06F11/20

    摘要: A storage device having an automatic backup function, which is connected to a host apparatus to store user data, is provided. The storage device includes a storage medium which stores the user data, and a controller which controls data writing and reading of the storage medium. The controller backs up at least a portion of the user data stored in the storage medium in an available region of the storage medium when the storage device is in an idle mode.

    摘要翻译: 提供具有自动备份功能的存储设备,其连接到主机设备以存储用户数据。 存储装置包括存储用户数据的存储介质和控制存储介质的数据写入和读取的控制器。 当存储设备处于空闲模式时,控制器在存储介质的可用区域中备份存储在存储介质中的用户数据的至少一部分。

    Semiconductor device and method of fabricating the same
    43.
    发明申请
    Semiconductor device and method of fabricating the same 有权
    半导体装置及其制造方法

    公开(公告)号:US20100025806A1

    公开(公告)日:2010-02-04

    申请号:US12318466

    申请日:2008-12-30

    IPC分类号: H01L29/78 H01L21/762

    CPC分类号: H01L29/66795 H01L29/7851

    摘要: In a semiconductor device and related method of fabricating the same, a hard mask layer is formed over a substrate, portions of the hard mask layer and the substrate are etched to form trenches having protruding portions at sidewalls, and an insulation layer buried in the trenches is formed to form device isolation regions having protruding portions at sidewalls, wherein the device isolation regions decrease a portion of a width of active regions.

    摘要翻译: 在制造半导体器件及其相关方法中,在衬底上形成硬掩模层,硬掩模层和衬底的部分被蚀刻以形成在侧壁具有突出部分的沟槽,并且埋在沟槽中的绝缘层 被形成以形成在侧壁具有突出部分的器件隔离区域,其中器件隔离区域减小有效区域宽度的一部分。

    DIAGNOSIS SYSTEM OF DEFICIENT AND FORCEFUL PULSE
    44.
    发明申请
    DIAGNOSIS SYSTEM OF DEFICIENT AND FORCEFUL PULSE 有权
    缺陷和有力脉搏诊断系统

    公开(公告)号:US20100022895A1

    公开(公告)日:2010-01-28

    申请号:US12531246

    申请日:2007-09-28

    IPC分类号: A61B5/021 A61B5/02

    摘要: Disclosed herein is a system for diagnosing a deficient pulse and an forceful pulse. The system includes a pulse diagnotic device, a deficient pulse and forceful pulse determining device, and an output device. The pulse diagnotic device measures pulse condition information at an examinee's Cun (˜\f˜) Gu (H), and Chi (,R) pulse-taking locations on his or her wrist using one or more pulse-taking sensors. The deficient pulse and forceful pulse determining device is operably connected to the pulse diagnotic device, analyzes the pulse pressure information measured by the pulse diagnotic device, calculates a quantified deficiency/forceful coefficient, and determines whether a pulse of interest is a deficient pulse or an forceful pulse. The output device is connected to the determining device and displays results of the determination.

    摘要翻译: 本文公开了一种用于诊断缺陷脉冲和有力脉冲的系统。 该系统包括脉冲诊断装置,缺陷脉冲和有力的脉冲确定装置,以及输出装置。 脉冲诊断装置使用一个或多个脉冲采集传感器来测量他或她的手腕上的受检者Cun(〜\ f〜)Gu(H)和Chi(,R)脉搏取得位置的脉搏状况信息。 脉冲和有力的脉冲确定装置可操作地连接到脉冲诊断装置,分析由脉冲诊断装置测量的脉搏压力信息,计算定量不足/有力系数,并确定感兴趣的脉冲是否是缺陷脉冲 有力的脉搏 输出设备连接到确定设备并显示确定的结果。

    Method for forming storage node contact plug in semiconductor device
    45.
    发明授权
    Method for forming storage node contact plug in semiconductor device 有权
    在半导体器件中形成存储节点接触插头的方法

    公开(公告)号:US07427564B2

    公开(公告)日:2008-09-23

    申请号:US11418720

    申请日:2006-05-05

    IPC分类号: H01L21/44

    摘要: A method for forming a storage node contact plug in a semiconductor device is provided. The method includes: forming an inter-layer insulation layer over a substrate having a conductive plug; etching a portion of the inter-layer insulation layer using at least line type storage node contact masks as an etch mask to form a first contact hole with sloping sidewalls; etching another portion of the inter-layer insulation layer underneath the first contact hole to form a second contact hole exposing the conductive plug, the second contact hole having substantially vertical sidewalls; and filling the first and second storage node contact holes to form a storage node contact plug.

    摘要翻译: 提供一种在半导体器件中形成存储节点接触插头的方法。 该方法包括:在具有导电插塞的基板上形成层间绝缘层; 使用至少线型存储节点接触掩模作为蚀刻掩模蚀刻层间绝缘层的一部分,以形成具有倾斜侧壁的第一接触孔; 蚀刻在第一接触孔下面的层间绝缘层的另一部分,以形成露出导电插塞的第二接触孔,第二接触孔具有基本垂直的侧壁; 以及填充所述第一和第二存储节点接触孔以形成存储节点接触插头。

    Method for fabricating isolation layer in semiconductor device
    46.
    发明申请
    Method for fabricating isolation layer in semiconductor device 有权
    在半导体器件中制造隔离层的方法

    公开(公告)号:US20080160718A1

    公开(公告)日:2008-07-03

    申请号:US12004240

    申请日:2007-12-18

    IPC分类号: H01L21/762

    CPC分类号: H01L21/76232

    摘要: A method for fabricating an isolation layer in a semiconductor device includes providing a substrate, forming a trench over the substrate, forming a liner nitride layer and a liner oxide layer along a surface of the trench, forming an insulation layer having an etch selectivity ratio different from that of the liner oxide layer over the liner oxide layer, forming a spin on dielectric (SOD) oxide layer to fill a portion of the trench over the insulation layer, and forming a high density plasma (HDP) oxide layer for filling the remaining a portion of the trench.

    摘要翻译: 在半导体器件中制造隔离层的方法包括:提供衬底,在衬底上形成沟槽,沿着沟槽的表面形成衬里氮化物层和衬垫氧化物层,形成具有不同蚀刻选择比的绝缘层 与衬垫氧化物层上的衬垫氧化物层的衬垫氧化物层的形成自旋在电介质(SOD)氧化物层上形成,以填充绝缘层上的一部分沟槽,并形成高密度等离子体(HDP)氧化物层,用于填充剩余的 一部分沟槽。

    Methods and apparatus determining and/or using overshoot control of write current for optimized head write control in assembled disk drives
    47.
    发明授权
    Methods and apparatus determining and/or using overshoot control of write current for optimized head write control in assembled disk drives 失效
    方法和装置确定和/或使用写入电流的过冲控制,以便在组装的磁盘驱动器中优化磁头写入控制

    公开(公告)号:US07253978B2

    公开(公告)日:2007-08-07

    申请号:US11176414

    申请日:2005-07-06

    IPC分类号: G11B27/36

    CPC分类号: G11B5/455 G11B2005/0008

    摘要: The invention includes a testing method which may be applied to at least one writer in a disk drive during the self-test phase to generate write parameters, focused on the Over Shoot Control (OSC) of the write current parameter to improve the reliability of write operations by that writer. The Minimum OSC is used for write operations in normal temperatures. The Optimum OSC is used for a first lower temperature range, preferably between essentially 15 degrees Centigrade and essentially 5 degrees Centigrade. The Maximum OSC is preferred below essentially 5 degrees Centigrade. The Minimum OSC should preferably guarantee both an Adjacent Track Write (ATW) criteria, as well as guarantee a Write Induced Instability (WII) criteria. The invention includes the write parameter collection, as well as the disk drive containing the generated write parameter collection. The invention also includes the method of using that write parameter collection to control a writer while writing to tracks belonging to the radial zone collection and program systems implementing the invention's methods.

    摘要翻译: 本发明包括测试方法,其可以在自检阶段期间应用于磁盘驱动器中的至少一个写入器以产生写入参数,其集中在写入当前参数的过拍控制(OSC)上,以提高写入的可靠性 作家的作业。 最低OSC用于正常温度下的写入操作。 最佳OSC用于第一较低温度范围,优选在基本上15摄氏度和基本上5摄氏度之间。 最高OSC优选低于基本上5摄氏度。 最小OSC应优选保证相邻轨道写入(ATW)标准,并保证写入诱发不稳定(WII)标准。 本发明包括写入参数集合以及包含生成的写入参数集合的磁盘驱动器。 本发明还包括使用该写入参数集来控制写入器同时写入属于径向区域集合的轨道和实现本发明方法的程序系统的方法。

    Magneto-resistive head having the sensor orthogonally positioned relative to the write gap
    48.
    发明授权
    Magneto-resistive head having the sensor orthogonally positioned relative to the write gap 有权
    磁阻头具有相对于写入间隙正交定位的传感器

    公开(公告)号:US06169645A

    公开(公告)日:2001-01-02

    申请号:US09232139

    申请日:1999-01-15

    申请人: Hae-Jung Lee

    发明人: Hae-Jung Lee

    IPC分类号: G11B539

    摘要: There is provided a magneto-resistive head in a hard disk drive. In the magneto-resistive head, an upper write pole has a write track width, and a lower write pole is positioned under the upper write pole, separated by a predetermined write gap. A magneto-resistive sensor is positioned under the lower write pole, apart by a predetermined gap and orthogonally to the length of the write gap, and has a predetermined read track width, for efficiently reading data from a disk. A shield is positioned under the magneto-resistive sensor, separated by a predetermined gap.

    摘要翻译: 在硬盘驱动器中提供了磁阻头。 在磁阻头中,上写磁极具有写磁道宽度,下写磁极定位在上写磁极之下,以预定的写间隙分开。 磁阻传感器位于下写磁极之下,与预定的间隙隔开并与写入间隙的长度正交,并且具有预定的读磁道宽度,用于从磁盘有效地读取数据。 屏蔽位于磁阻传感器的下方,隔开预定间隙。

    Method for compensating for track shift during servo control of a
magneto resistive head
    49.
    发明授权
    Method for compensating for track shift during servo control of a magneto resistive head 失效
    用于在磁阻头的伺服控制期间补偿轨道偏移的方法

    公开(公告)号:US6034836A

    公开(公告)日:2000-03-07

    申请号:US963518

    申请日:1997-11-03

    申请人: Hae-Jung Lee

    发明人: Hae-Jung Lee

    IPC分类号: G11B5/02 G11B5/596

    CPC分类号: G11B5/59633

    摘要: A servo burst recording and servo control method for a magnetic storage device having a magneto resistive (MR) head comprises the steps of recording an additional burst signal having a magnitude as large as the quantity of track shift caused by a displacement angle of the MR head around each center line of each track, and using the additional burst signal as position identification information for the MR head during servo control thereof. The additional burst signal can be used during a read operation only or during a write operation only.

    摘要翻译: 用于具有磁阻(MR)磁头的磁存储装置的伺服脉冲串记录和伺服控制方法包括以下步骤:记录具有由MR磁头的位移角度引起的磁道偏移量的大小的附加突发信号 围绕每个轨道的每个中心线,并且在其伺服控制期间使用附加突发信号作为MR磁头的位置识别信息。 附加的突发信号只能在读操作期间或仅在写操作期间使用。

    Method for fabricating semiconductor device
    50.
    发明授权
    Method for fabricating semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08426257B2

    公开(公告)日:2013-04-23

    申请号:US12004179

    申请日:2007-12-20

    IPC分类号: H01L27/10

    摘要: A method for fabricating a semiconductor device includes forming a fuse over a substrate, the fuse having a barrier layer, a metal layer, and an anti-reflective layer stacked, selectively removing the anti-reflective layer, forming an insulation layer over a whole surface of the resultant structure including the fuse, and performing repair-etching such that part of the insulation layer remains above the fuse.

    摘要翻译: 一种用于制造半导体器件的方法,包括在衬底上形成熔丝,所述熔丝具有阻挡层,金属层和抗反射层,层叠,选择性地去除抗反射层,在整个表面上形成绝缘层 包括保险丝的所得结构,并执行修补蚀刻,使得绝缘层的一部分保留在保险丝上方。