公开(公告)号：US20050016567A1

公开(公告)日：2005-01-27

申请号：US10872319

申请日：2004-06-18

Applicant: Ho-Min Kang ,  Jin-Su Kim

Inventor： Ho-Min Kang ,  Jin-Su Kim

IPC: G02F1/13 ,  B08B3/02 ,  B08B11/02 ,  G02F1/1333 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H05K3/06 ,  H05K3/26 ,  B08B3/04

CPC classification number: H01L21/6708 ,  B08B3/022 ,  B08B11/02 ,  H01L21/67051

Abstract: A substrate treatment apparatus for transferring a substrate in a horizontal direction and supplying a process solution to a surface of the substrate is provided, which includes: a substrate support unit holding the substrate thereunder; a shower unit for supplying the process solution, the shower unit placed under the substrate and spaced apart from the substrate; and a transfer unit for transferring the substrate support unit 10 in the horizontal direction.

Abstract translation: 提供了一种用于在水平方向上转印衬底并将工艺溶液提供到衬底的表面的衬底处理装置，其包括：保持衬底的衬底支撑单元; 用于提供处理溶液的淋浴单元，布置在基板下方并与基板间隔开的淋浴单元; 以及用于在水平方向上传送基板支撑单元10的转印单元。