公开(公告)号：US06314352B1

公开(公告)日：2001-11-06

申请号：US09581221

申请日：2000-06-23

申请人： Yoshimasa Kunimatsu ,  Chikao Nagasaka ,  Masato Nishikawa ,  Yoshihisa Hirano ,  Toshiyuki Isogai

发明人： Yoshimasa Kunimatsu ,  Chikao Nagasaka ,  Masato Nishikawa ,  Yoshihisa Hirano ,  Toshiyuki Isogai

IPC分类号： B60R1602

CPC分类号： G01C21/26

摘要： An automatic control system is provided that allows a driver to decide whether some or all of an automatic control content for accessory devices for an automobile is to be executed. Trigger information for performing automatic control is detected by a detecting circuit such as a navigation system 12 and, on the basis of the detected trigger information, control contents are established at a control circuit 20, and the established control contents are announced to the driver through the navigation system 12 and an audio system 16. The driver replies to each of the corresponding announced contents (the contents to be automatically controlled) by operating an answer switch 100. At the control section 20, automatic control is performed in accordance with results of replies from the driver operating the answer switch 100.

摘要翻译： 提供了一种自动控制系统，其允许驾驶员决定是否执行用于汽车的附件装置的自动控制内容的一些或全部。 用于执行自动控制的触发信息由诸如导航系统12的检测电路检测，并且基于检测到的触发信息，在控制电路20建立控制内容，并且将已建立的控制内容通知给驾驶员 导航系统12和音频系统16.驾驶员通过操作应答开关100来回复对应的所宣布的内容（要自动控制的内容）。在控制部分20，根据结果 来自操作应答交换机100的驾驶员的答复。

公开(公告)号：US5541036A

公开(公告)日：1996-07-30

申请号：US46728

申请日：1993-04-16

申请人： Akihiko Igawa ,  Masato Nishikawa ,  Georg Pawlowski ,  Ralph Dammel

发明人： Akihiko Igawa ,  Masato Nishikawa ,  Georg Pawlowski ,  Ralph Dammel

IPC分类号： G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  G03C1/73

CPC分类号： G03F7/038 ,  G03F7/0045

摘要： A negative photoresist composition comprising:(A) a compound represented by the following formula (I): ##STR1## wherein R.sup.1 and R.sup.2 which are different from each other represent a hydrogen atom or a group represented by the following formula (II): ##STR2## (B) an alkoxymethylated melamine, and (C) a novolak resin.The photoresist composition has resolution below submicron, and can form resist patterns with an ideal rectangular profile.

摘要翻译： 一种负性光致抗蚀剂组合物，其包含：（A）由下式（I）表示的化合物：其中彼此不同的R 1和R 2表示氢原子或由下式（II ）（II）（B）烷氧基甲基化三聚氰胺，和（C）酚醛清漆树脂。 光致抗蚀剂组合物具有亚微米以下的分辨率，并且可以形成具有理想矩形轮廓的抗蚀剂图案。