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公开(公告)号：US5395734A
公开(公告)日：1995-03-07
申请号：US983124
申请日：1992-11-30
申请人： Dennis E. Vogel , Leonard J. Stulc
发明人： Dennis E. Vogel , Leonard J. Stulc
IPC分类号： B41N1/08 , B41N1/14 , B41N3/08 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , G03F7/075 , G03F7/26 , G03F7/021 , G03C1/77
CPC分类号： G03F7/0758 , G03F7/039 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T--(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T--(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.4 is not bonded to the polymer backbone, the divalent linking group containing a total of from 0 (a covalent bond) or 1 to 18 carbon atoms where up to one of each three carbon atoms may be replaced by oxygen, nitrogen, or sulfur atoms or combinations thereof in the polymer backbone.
摘要翻译： 公开了使用它们的酸敏感聚合物和可成像制品。 特别地，公开了光敏组合物，其包含：（a）在暴露于辐射时产生酸的光引发剂; 和（b）具有从聚合物主链悬挂的酸不稳定基团的聚合物，所述酸不稳定侧基包含A和B中的至少一个，其中A具有式-T-（C = O）OCR 1 R 2 R 3，B具有式 -T-（C = O）OR 4 Si（R 5）3，其中R 1和R 2各自表示H或烷基，条件是R 1和R 2中的至少一个必须是氢; R3表示烷基; 或者R 1，R 2和R 3中的任何两个可以一起形成具有3至36个碳原子的环基; R5表示烷基，芳基，烷氧基，芳氧基，酰氧基或三烷基甲硅烷氧基; 并且R 4和T表示二价连接基团，其中T与聚合物主链键合，并且R 4不与聚合物主链结合，二价连接基团含有总共0（共价键）或1至18个碳原子 可以在聚合物主链中被氧，氮或硫原子或其组合替代为每三个碳原子中的一个。
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公开(公告)号：US5314785A
公开(公告)日：1994-05-24
申请号：US34696
申请日：1993-03-19
摘要： Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.
摘要翻译： 含有光引发剂的光敏组合物，其在暴露于光时产生酸和含有侧链烷氧基烷基酯基团的聚合物。 还公开了包含涂覆在基材上的本发明的光敏组合物的可成像制品以及用于形成成像制品的方法。
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公开(公告)号：US5102771A
公开(公告)日：1992-04-07
申请号：US618213
申请日：1990-11-26
摘要： Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.
摘要翻译： 含有光引发剂的光敏组合物，其在暴露于光时产生酸和含有侧链烷氧基烷基酯基团的聚合物。 还公开了包含涂覆在基材上的本发明的光敏组合物的可成像制品以及用于形成成像制品的方法。
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公开(公告)号：US5085972A
公开(公告)日：1992-02-04
申请号：US618212
申请日：1990-11-26
申请人： Dennis E. Vogel
发明人： Dennis E. Vogel
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Solubility inhibitors for phenolic resins are disclosed, which when used in phenolic resin/iodonium salt positive printing plate constructions result in significantly increased sensitivity. The solubility inhibitors contain an alkoxyalkyl ester moiety. Also disclosed are presensitized lithogaphic plates containing the solubility inhibitors and a process for developing a photoimage.
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