公开(公告)号：US06371712B1

公开(公告)日：2002-04-16

申请号：US09693613

申请日：2000-10-20

申请人： John M. White ,  Larry Chang ,  Emanuel Beer

发明人： John M. White ,  Larry Chang ,  Emanuel Beer

IPC分类号： F27D500

CPC分类号： C30B31/14 ,  C23C16/4583 ,  C30B25/12 ,  F27D5/00

摘要： The present invention generally provides a system and method for supporting a substrate having a support frame that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members preferably define a supporting surface on which a heated susceptor is mounted. The longitudinal member is preferably disposed below the heated susceptor, thus minimizing thermal expansion of the longitudinal member. Spacers made of thermally conductive material may be disposed at appropriate locations along the members to provide more uniform distribution of heat within the members.

摘要翻译： 本发明通常提供一种用于支撑具有支撑框架的基板的系统和方法，该支撑框架最小化在处理室中热膨胀期间遇到的挠曲。 在一个实施例中，支撑框架包括联接到一个或多个横向构件的一个或多个纵向构件。 横向构件优选地限定了其上安装有加热的基座的支撑表面。 纵向构件优选地设置在加热的基座下方，从而最小化纵向构件的热膨胀。 由导热材料制成的隔板可以沿着构件设置在适当的位置，以在构件内提供更均匀的热分布。