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44 条记录 (耗时 0.027 秒)

    Heat sensitive reactive products of hexaarylbiimidazole and antihalation dyes
    42.
    发明授权
    Heat sensitive reactive products of hexaarylbiimidazole and antihalation dyes 失效
    六芳基联咪唑和防晕晕染料的热敏反应产物

    公开(公告)号：US4201590A

    公开(公告)日：1980-05-06

    申请号：US954011

    申请日：1978-10-23

    申请人： Steven R. Levinson ,  Anthony Adin

    发明人： Steven R. Levinson ,  Anthony Adin

    IPC分类号： G03C1/498 ,  G03C1/83 ,  G03C1/02

    CPC分类号： G03C1/49854 ,  G03C1/83 ,  Y10S430/165

    摘要： A heat bleachable material comprises (i) at least one hexaarylbiimidazole with (ii) at least one dye, especially an antihalation or filter dye, that is reactive with the product of the hexaarylbiimidazole formed upon heating the material to a temperature above about 90.degree. C. This provides a material that becomes at least 40% colorless within about 20 minutes, typically within about 30 seconds, upon heating to a temperature as described. The dye-containing material is especially useful for antihalation and filter purposes in a photographic element. The material can be a heat bleachable dye layer of a photothermographic element. The heat bleachable dye layer can also be useful in a thermographic element.

    摘要翻译： 热可漂洗材料包括（i）至少一种六芳基联咪唑与（ii）至少一种染料，特别是防晕或过滤染料，其与加热材料时形成的六芳基联咪唑的产物反应至高于约90℃ 这提供了在加热到如上所述的温度时在约20分钟内，通常在约30秒内变成至少40％无色的材料。 含染料的材料在照相元件中特别适用于防晕和过滤目的。 该材料可以是光热敏成像元件的热漂白染料层。 热可漂洗染料层也可用于热成像元件。

    Radiation sensitive co(III)complex photoreduction element with image recording layer
    43.
    发明授权
    Radiation sensitive co(III)complex photoreduction element with image recording layer 失效
    具有图像记录层的辐射敏感性Co（III）复合光还原元件

    公开(公告)号：US4201588A

    公开(公告)日：1980-05-06

    申请号：US720873

    申请日：1976-09-07

    申请人： Anthony Adin ,  James C. Fleming

    发明人： Anthony Adin ,  James C. Fleming

    IPC分类号： B41M5/32 ,  G03C1/67 ,  G03C1/48 ,  G03C1/49 ,  G03C1/52 ,  G03C1/72

    CPC分类号： G03C1/67 ,  B41M5/32 ,  Y10S430/137

    摘要： A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer. By the selection of amine-responsive reducing agent precursors, the amines released by the cobalt(III) complexes cause an amplified image.

    摘要翻译： 公开了一种辐射敏感元件，其包括由钴（III）络合物和光致感光体组成的辐射敏感层。 公开了一种方法，其中通过暴露于长于300纳米的电磁辐射将光致感光体转化为还原剂。 然后还原剂与钴（III）络合物反应。 可以通过使用未暴露的残留的钴（III）络合物或通过曝光产生的一种或多种反应产物，将图像直接记录在辐射敏感层内或在单独的图像记录元件或层中。 通过使用从暴露于曝光后的氨基配体释放的氨与成像均匀的曝光结合使用，可以在重叠图像记录层或与辐射敏感层相关的元件上形成正或负的图像。 通过选择胺响应性还原剂前体，由钴（III）络合物释放的胺引起放大图像。