Image sensor and a method to manufacture thereof

    公开(公告)号:US10825848B2

    公开(公告)日:2020-11-03

    申请号:US14851943

    申请日:2015-09-11

    Abstract: The disclosed embodiments include an image sensor and a method to manufacture thereof. In one embodiment, the method includes forming a plurality of semiconductor slices having a uniform width, at least two of the semiconductor slices having different lengths, and each of the semiconductor slices having a slice edge defining a side of the semiconductor slice. The method further includes arranging the semiconductor slices to form a semi-rectangular shape defining boundaries of the image sensor, each of the semiconductor slices being disposed proximate to another semiconductor slice of the plurality of semiconductor slices. Forming each semiconductor slice includes forming a plurality of pixel arrays over the semiconductor slice, the pixel arrays having an approximately uniform pixel pitch, and forming a seal ring around the semiconductor slice, the seal ring enclosing the semiconductor slice and the pixel arrays of the semiconductor slice, and each semiconductor slice having a different seal ring.

    IMAGE SENSOR SYSTEM
    53.
    发明申请
    IMAGE SENSOR SYSTEM 审中-公开

    公开(公告)号:US20200120302A1

    公开(公告)日:2020-04-16

    申请号:US16517095

    申请日:2019-07-19

    Abstract: The present invention relates to an image sensor system. The invention further relates to an X-ray imaging system comprising such an image sensor system. More in particular, the present invention is related to image sensor systems that use a relatively small pixel width.According to the present invention, the conversion unit comprises, for each column of pixels, a load that comprises a toggling unit configured for toggling a predefined number of bits in response to the clock signal. Furthermore, the load and binary counter are operable in a counting mode, in which mode the binary counter increases the binary count value in dependence of the clock signal and the load does not toggle, and in a non-counting mode, in which mode the binary counter has stopped counting and the load toggles said predefined number of bits in dependence of the clock signal. The predefined number corresponds to the average number of bits that toggle in the binary counter per counting step while the binary counter is in the counting mode.

    DOSE SENSING PIXELS REFERENCE VOLTAGE
    54.
    发明申请

    公开(公告)号:US20190298293A1

    公开(公告)日:2019-10-03

    申请号:US16370778

    申请日:2019-03-29

    Abstract: The present invention relates to an image sensor and to an X-ray system comprising such image sensor. More in particular, the invention relates to an image sensor wherein dose sensing pixels are used in conjunction with artificial pixels to sense a dose of incoming light or radiation.According to the invention, the image sensor comprises one or more shielded photo-sensitive pixels that are shielded for incoming photons and which are each configured for outputting a further reference voltage, wherein the input voltage of the artificial pixels is set in dependence on the outputted further reference voltage(s).

    A RADIATION DETECTOR AND A METHOD THEREOF
    56.
    发明申请

    公开(公告)号:US20170307767A1

    公开(公告)日:2017-10-26

    申请号:US15526646

    申请日:2015-02-05

    Inventor: Alexander Zyazin

    CPC classification number: G01T1/2018 B82B1/005 B82B1/007 G01T1/2002

    Abstract: The radiation detector (10) comprises a scintillator (15) having a first refractive index (ns) for converting incident radiation (RR) received at a first side (S1) of the radiation detector (10) into converted radiation (CR), a photosensor (20) for receiving the converted radiation (CR) from the scintillator (15), and an optical coating layer (25) arranged between the scintillator (15) and the photosensor (20). The scintillator (15) has regions (RR) arranged for being imaged, when impinged by the incident radiation (RR), onto corresponding regions of the photosensor (20). The optical coating layer (25) has a second refractive index (no) lower than the first refractive index (ns) for reflecting the converted radiation (CR) resulting from the incident radiation (RR) impinged on a particular region (A1) of the scintillator (15) and received by a region (A3) of the optical coating layer (25) corresponding to a photosensor region different from the imaged one (A2).

    IMAGE SENSOR AND A METHOD TO MANUFACTURE THEREOF
    57.
    发明申请
    IMAGE SENSOR AND A METHOD TO MANUFACTURE THEREOF 审中-公开
    图像传感器及其制造方法

    公开(公告)号:US20170077152A1

    公开(公告)日:2017-03-16

    申请号:US14851943

    申请日:2015-09-11

    Abstract: The disclosed embodiments include an image sensor and a method to manufacture thereof. In one embodiment, the method includes forming a plurality of semiconductor slices having a uniform width, at least two of the semiconductor slices having different lengths, and each of the semiconductor slices having a slice edge defining a side of the semiconductor slice. The method further includes arranging the semiconductor slices to form a semi-rectangular shape defining boundaries of the image sensor, each of the semiconductor slices being disposed proximate to another semiconductor slice of the plurality of semiconductor slices. Forming each semiconductor slice includes forming a plurality of pixel arrays over the semiconductor slice, the pixel arrays having an approximately uniform pixel pitch, and forming a seal ring around the semiconductor slice, the seal ring enclosing the semiconductor slice and the pixel arrays of the semiconductor slice, and each semiconductor slice having a different seal ring.

    Abstract translation: 所公开的实施例包括图像传感器及其制造方法。 在一个实施例中,该方法包括形成具有均匀宽度的多个半导体薄片,至少两个半导体薄片具有不同的长度,并且每个半导体薄片具有限定半导体薄片的一侧的切片边缘。 该方法还包括布置半导体薄片以形成限定图像传感器边界的半矩形形状,每个半导体薄片被设置在多个半导体薄片的另一个半导体薄片附近。 形成每个半导体薄片包括在半导体薄片上形成多个像素阵列,像素阵列具有大致均匀的像素间距,以及在半导体薄片周围形成密封环,密封环包围半导体薄片和半导体的像素阵列 切片,并且每个半导体切片具有不同的密封环。

    A MOISTURE PROTECTION STRUCTURE FOR A DEVICE AND A FABRICATION METHOD THEREOF
    58.
    发明申请
    A MOISTURE PROTECTION STRUCTURE FOR A DEVICE AND A FABRICATION METHOD THEREOF 有权
    一种设备的水分保护结构及其制造方法

    公开(公告)号:US20160091615A1

    公开(公告)日:2016-03-31

    申请号:US14893442

    申请日:2013-05-24

    CPC classification number: G01T1/2018 G01T1/2002 G01T1/202

    Abstract: A moisture protection structure (10) used to protect a device (15) against moisture penetration. The device (15) has a first area (A1) at a first side (S1) for emitting or receiving radiation (RE;RR). The device (15) has a second side (S2) opposite to the first side (S1) attached to a supporting means (20). A lateral side (LS) of the device (15) is defined between a first perimeter delimiting the first area (A1) on the first side (S1) and a second perimeter delimiting a second area (A2) on the second side (S2). The moisture protection structure (10) includes at least one moisture-resistant layer (25) deposited on the first area (A1) and the lateral side (LS) of the device (15) and a moisture-resistant cover (30) arranged to cover the at least one moisture-resistant layer (25) at the first side (S1). The moisture-resistant cover (30) and the at least one moisture-resistant layer (25) are transparent for the emitting or receiving radiation (RE;RR). The moisture protective structure (10) further includes a pressurizing member (55;57;59) attached to the supporting means (20). The pressurizing member (55;57;59) includes an elastic deformable material (40;42) and it is arranged to exert a pressure on the moisture-resistant cover (30) towards the second side (S2) of the device (15). The pressure on the moisture-resistant cover (30) ensures that the first side (S1) of the device (15) is sealed against moisture penetration.

    Abstract translation: 用于保护装置(15)防止湿气渗透的防潮结构(10)。 装置(15)具有用于发射或接收辐射(RE; RR)的第一侧(S1)的第一区域(A1)。 装置(15)具有与附接到支撑装置(20)的第一侧(S1)相对的第二侧(S2)。 设备(15)的侧面(LS)被限定在限定第一侧面(S1)上的第一区域(A1)的第一周边和限定第二侧面(S2)上的第二区域(A2)的第二周边之间, 。 防潮结构(10)包括沉积在装置(15)的第一区域(A1)和侧面(LS)上的至少一个防潮层(25)和防潮盖(30) 在第一侧覆盖至少一个防潮层(S1)(S1)。 防潮罩(30)和至少一个防潮层(25)对于发射或接收辐射是透明的(RE; RR)。 湿气保护结构(10)还包括附接到支撑装置(20)的加压构件(55; 57; 59)。 加压构件(55; 57; 59)包括弹性可变形材料(40; 42),并且其布置成朝向装置(15)的第二侧(S2)向耐湿盖(30)施加压力, 。 防潮盖(30)上的压力确保了装置(15)的第一侧(S1)被密封以防止湿气穿透。

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