公开(公告)号：US20130320853A1

公开(公告)日：2013-12-05

申请号：US13681258

申请日：2012-11-19

Applicant: Advanced Energy Industries, Inc.

Inventor： Daniel Carter ,  Victor Brouk

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/32174 ,  H01J37/32183 ,  H05H1/46

Abstract: Systems, methods, and Apparatus for controlling the spatial distribution of a plasma in a processing chamber are disclosed. An exemplary system includes a primary inductor disposed to excite the plasma when power is actively applied to the primary inductor; at least one secondary inductor located in proximity to the primary inductor such that substantially all current that passes through the secondary inductor results from mutual inductance through the plasma with the primary inductor. In addition, at least one terminating element is coupled to the at least one secondary inductor, the at least one terminating element affecting the current through the at least one secondary inductor so as to affect the spatial distribution of the plasma.

Abstract translation: 公开了用于控制处理室中的等离子体的空间分布的系统，方法和装置。 示例性系统包括主电感器，其设置成当功率被主动施加到初级电感器时激发等离子体; 位于主电感器附近的至少一个次级电感器，使得通过次级电感器的基本上所有的电流都是由与主电感器的等离子体的互感产生的。 另外，至少一个终端元件耦合到至少一个次级电感器，所述至少一个终端元件影响通过至少一个次级电感器的电流，以便影响等离子体的空间分布。