公开(公告)号：US08046048B2

公开(公告)日：2011-10-25

申请号：US12220819

申请日：2008-07-29

申请人： Torsten Scheuermann

发明人： Torsten Scheuermann

IPC分类号： A61B5/05

CPC分类号： G01R33/286 ,  G01R33/3628

摘要： Systems and methods for a resonator with an adjustable capacitance for a medical device. In one embodiment, a resonator system includes a resonator device with an LC resonator circuit that has an adjustable capacitance, an inductor coil in series with the adjustable capacitance, and an adjustable capacitance control that can control the adjustable capacitance to obtain different particular capacitance values. This embodiment also includes a medical device, positioned with the resonator device, so that at least a portion of the inductor coil surrounds a space that is surrounded by at least a portion of the medical device.

摘要翻译： 用于医疗设备具有可调电容的谐振器的系统和方法。 在一个实施例中，谐振器系统包括具有可调电容的LC谐振器电路的谐振器装置，与可调电容串联的电感线圈，以及可调节的电容控制，其可以控制可调电容以获得不同的特定电容值。 该实施例还包括与谐振器装置一起定位的医疗装置，使得电感线圈的至少一部分围绕由医疗装置的至少一部分包围的空间。

公开(公告)号：US20080290958A1

公开(公告)日：2008-11-27

申请号：US12220819

申请日：2008-07-29

申请人： Torsten Scheuermann

发明人： Torsten Scheuermann

IPC分类号： H03B5/08 ,  A61B5/055

CPC分类号： G01R33/286 ,  G01R33/3628

摘要： Systems and methods for a resonator with an adjustable capacitance for a medical device. In one embodiment, a resonator system includes a resonator device with an LC resonator circuit that has an adjustable capacitance, an inductor coil in series with the adjustable capacitance, and an adjustable capacitance control that can control the adjustable capacitance to obtain different particular capacitance values. This embodiment also includes a medical device, positioned with the resonator device, so that at least a portion of the inductor coil surrounds a space that is surrounded by at least a portion of the medical device.

公开(公告)号：US20060196581A1

公开(公告)日：2006-09-07

申请号：US11417856

申请日：2006-05-03

申请人： Torsten Scheuermann ,  Eckhard Alt

发明人： Torsten Scheuermann ,  Eckhard Alt

IPC分类号： C23C8/06

CPC分类号： A61L31/18 ,  A61F2/91 ,  A61F2/915 ,  A61F2002/91541 ,  A61F2002/91558 ,  A61F2310/00598 ,  A61L31/022 ,  A61L31/088

摘要： In a process of fabricating a stent composed primarily of niobium alloyed with a trace amount of zirconium, tantalum, or titanium for hardening, the stent is annealed under vacuum in a substantially oxygen-free environment. The vacuum is preferably maintained at pressure less than 10−4 millibars, oxygen-content less than about 80 parts per million, and the annealing temperature exceeds 400° C. for at least one hour, and is preferably kept in a range from about 1100-1200° C. for several hours. This may be followed by applying a surface layer of oxide, such as iridium oxide, with a thickness of 299-300 nm to the stent.

摘要翻译： 在制造主要由铌合金化的用于硬化的锆，钽或钛的支架的制造过程中，支架在基本上无氧的环境中在真空下退火。 真空优选保持在小于10 -4毫巴的压力下，含氧量小于约百万分之八十，退火温度超过400℃至少一小时，优选 保持在约1100-1200℃的范围内几个小时。 然后可以向支架施加厚度为299-300nm的氧化物表面层，例如氧化铱。

公开(公告)号：US07101391B2

公开(公告)日：2006-09-05

申请号：US10232774

申请日：2002-08-31

申请人： Torsten Scheuermann ,  Eckhard Alt

发明人： Torsten Scheuermann ,  Eckhard Alt

IPC分类号： A61F2/06

CPC分类号： A61L31/18 ,  A61F2/91 ,  A61F2/915 ,  A61F2002/91541 ,  A61F2002/91558 ,  A61F2310/00598 ,  A61L31/022 ,  A61L31/088

摘要： In a process of fabricating a stent composed primarily of niobium alloyed with a trace amount of zirconium, tantalum, or titanium for hardening, the stent is annealed under vacuum in a substantially oxygen-free environment. The vacuum is preferably maintained at pressure less than 10−4 millibars, oxygen-content less than about 80 parts per million, and the annealing temperature exceeds 400° C. for at least one hour, and is preferably kept in a range from about 1100–1200° C. for several hours. This may be followed by applying a surface layer of oxide, such as iridium oxide, with a thickness of 299–300 nm to the stent.