公开(公告)号：US08351037B2

公开(公告)日：2013-01-08

申请号：US12834379

申请日：2010-07-12

申请人： Jaione Tirapu Azpiroz ,  Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian

发明人： Jaione Tirapu Azpiroz ,  Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian

IPC分类号： G01B11/00

CPC分类号： G03F1/36 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/70525

摘要： Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.

摘要翻译： 使用曝光工具中的可编程照明器来增加刀具匹配的自由度。 提供了一种工具匹配方法，其利用基于用户特定约束的线性规划（LP）问题对各个源像素强度的精细调整，以最小化两种工具之间的平版印刷晶片数据的差异。 光刻数据可以是来自多个目标和多个工艺条件的关键尺寸差异。 该LP问题可以修改为包括使用多次扫描曝光来匹配源的二进制变量。 该方法可以应用于参考工具是物理工具或虚拟理想工具的场景。 此外，该方法可以匹配不同的光刻系统，每个包括工具和掩模。

公开(公告)号：US08125618B2

公开(公告)日：2012-02-28

申请号：US12208358

申请日：2008-09-11

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03F7/20

CPC分类号： G03F7/70216

摘要： A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist and reflecting back to the resist to form an interference pattern of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种用于将抗蚀剂层暴露于包括反射成像工具辐射的层的图像和在反射层上具有光敏区域的抗蚀剂层的系统。 成像工具将包含空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂并反射回抗蚀剂，以形成通过抗蚀剂层厚度的投影空间图像的干涉图案。 光敏层的抗蚀剂层区域的厚度和位置被选择为在干涉图形之中包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除抗蚀剂厚度方向上的干涉图案的较低对比度部分 从所述抗蚀剂层区域的光敏性，改善所述抗蚀剂层区域中的空间像的光敏性的对比度。

公开(公告)号：US07736841B2

公开(公告)日：2010-06-15

申请号：US12233245

申请日：2008-09-18

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03F7/26

CPC分类号： G03F7/70216

摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种用于使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于对图像的光敏感区域的方法和系统。 采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。 成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。 反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。 选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分 从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

公开(公告)号：US07675378B2

公开(公告)日：2010-03-09

申请号：US12114029

申请日：2008-05-02

申请人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

发明人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

IPC分类号： H03B5/12 ,  H03L7/099

CPC分类号： H03B5/1206 ,  H03B5/1243

摘要： Disclosed are embodiments of a voltage controlled oscillator (VCO) capable of non-volatile self-correction to compensate for process variations and to ensure that the center frequency of the oscillator is maintained within a predetermined frequency range. This VCO incorporates a pair of varactors connected in parallel to an inductor-capacitor (LC) tank circuit for outputting a periodic signal having a frequency that is proportional to an input voltage. A control loop uses a programmable variable resistance e-fuse to set a compensation voltage to be applied to the pair of varactors. By adjusting the compensation voltage, the capacitance of the pair of varactors can be adjusted in order to selectively increase or decrease the frequency of the periodic signal in response to a set input voltage and, thereby to bring the frequency of that periodic signal into the predetermined frequency range. Also disclosed are embodiments of an associated design structure for such a VCO and an associated method for operating such a VCO.

摘要翻译： 公开了能够进行非易失性自校正以补偿过程变化并确保振荡器的中心频率保持在预定频率范围内的压控振荡器（VCO）的实施例。 该VCO包含一对与电感 - 电容（LC）电路并联连接的变容二极管，用于输出具有与输入电压成比例的频率的周期性信号。 控制回路使用可编程可变电阻电熔丝设置要施加到该变容二极管的补偿电压。 通过调整补偿电压，可以调整一对变容二极管的电容，以便响应于设定的输入电压选择性地增加或减小周期信号的频率，从而使该周期信号的频率达到预定的 频率范围。 还公开了用于这种VCO的相关设计结构的实施例以及用于操作这样的VCO的相关方法。

公开(公告)号：US07609121B2

公开(公告)日：2009-10-27

申请号：US12057494

申请日：2008-03-28

申请人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

发明人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

IPC分类号： H03B5/12 ,  H03L7/099

CPC分类号： H03B5/1206 ,  H03B5/1243

摘要： Disclosed are embodiments of a voltage controlled oscillator (VCO) capable of non-volatile self-correction to compensate for process variations and to ensure that the center frequency of the oscillator is maintained within a predetermined frequency range. This VCO incorporates a pair of varactors connected in parallel to an inductor-capacitor (LC) tank circuit for outputting a periodic signal having a frequency that is proportional to an input voltage. A control loop uses a programmable variable resistance e-fuse to set a compensation voltage to be applied to the pair of varactors. By adjusting the compensation voltage, the capacitance of the pair of varactors can be adjusted in order to selectively increase or decrease the frequency of the periodic signal in response to a set input voltage and, thereby to bring the frequency of that periodic signal into the predetermined frequency range. Also disclosed are embodiments of an associated design structure for such a VCO and an associated method for operating such a VCO.

摘要翻译： 公开了能够进行非易失性自校正以补偿过程变化并确保振荡器的中心频率保持在预定频率范围内的压控振荡器（VCO）的实施例。 该VCO包含一对与电感 - 电容（LC）电路并联连接的变容二极管，用于输出具有与输入电压成比例的频率的周期性信号。 控制回路使用可编程可变电阻电熔丝设置要施加到该变容二极管的补偿电压。 通过调整补偿电压，可以调整一对变容二极管的电容，以便响应于设定的输入电压选择性地增加或减小周期信号的频率，从而使该周期信号的频率达到预定的 频率范围。 还公开了用于这种VCO的相关设计结构的实施例以及用于操作这样的VCO的相关方法。

公开(公告)号：US20090243739A1

公开(公告)日：2009-10-01

申请号：US12114029

申请日：2008-05-02

申请人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

发明人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

IPC分类号： H03B5/08 ,  G06F17/50

CPC分类号： H03B5/1206 ,  H03B5/1243

摘要： Disclosed are embodiments of a voltage controlled oscillator (VCO) capable of non-volatile self-correction to compensate for process variations and to ensure that the center frequency of the oscillator is maintained within a predetermined frequency range. This VCO incorporates a pair of varactors connected in parallel to an inductor-capacitor (LC) tank circuit for outputting a periodic signal having a frequency that is proportional to an input voltage. A control loop uses a programmable variable resistance e-fuse to set a compensation voltage to be applied to the pair of varactors. By adjusting the compensation voltage, the capacitance of the pair of varactors can be adjusted in order to selectively increase or decrease the frequency of the periodic signal in response to a set input voltage and, thereby to bring the frequency of that periodic signal into the predetermined frequency range. Also disclosed are embodiments of an associated design structure for such a VCO and an associated method for operating such a VCO.

公开(公告)号：US20090243738A1

公开(公告)日：2009-10-01

申请号：US12057494

申请日：2008-03-28

申请人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

发明人： Kai D. Feng ,  Kafai Lai ,  Ping-Chuan Wang ,  Zhijian J. Yang

IPC分类号： H03B5/08

CPC分类号： H03B5/1206 ,  H03B5/1243

摘要： Disclosed are embodiments of a voltage controlled oscillator (VCO) capable of non-volatile self-correction to compensate for process variations and to ensure that the center frequency of the oscillator is maintained within a predetermined frequency range. This VCO incorporates a pair of varactors connected in parallel to an inductor-capacitor (LC) tank circuit for outputting a periodic signal having a frequency that is proportional to an input voltage. A control loop uses a programmable variable resistance e-fuse to set a compensation voltage to be applied to the pair of varactors. By adjusting the compensation voltage, the capacitance of the pair of varactors can be adjusted in order to selectively increase or decrease the frequency of the periodic signal in response to a set input voltage and, thereby to bring the frequency of that periodic signal into the predetermined frequency range. Also disclosed are embodiments of an associated design structure for such a VCO and an associated method for operating such a VCO.

摘要翻译： 公开了能够进行非易失性自校正以补偿过程变化并确保振荡器的中心频率保持在预定频率范围内的压控振荡器（VCO）的实施例。 该VCO包含一对与电感 - 电容（LC）电路并联连接的变容二极管，用于输出具有与输入电压成比例的频率的周期性信号。 控制回路使用可编程可变电阻电熔丝设置要施加到该变容二极管的补偿电压。 通过调整补偿电压，可以调整一对变容二极管的电容，以便响应于设定的输入电压选择性地增加或减小周期信号的频率，从而使该周期信号的频率达到预定的 频率范围。 还公开了用于这种VCO的相关设计结构的实施例以及用于操作这样的VCO的相关方法。

公开(公告)号：US07470504B2

公开(公告)日：2008-12-30

申请号：US11265822

申请日：2005-11-03

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03F7/26

CPC分类号： G03F7/70216

摘要： A method for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于图像的光敏区域的方法。 采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。 成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。 反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。 选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分 从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

公开(公告)号：US07434196B2

公开(公告)日：2008-10-07

申请号：US11242723

申请日：2005-10-03

申请人： Gregg M Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/5068

摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchical arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchical arrangement to ultimately correct for optical lithography.

摘要翻译： 方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。 该布局代表了所需的设计数据层次结构。 然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。 使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。 截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。 使用这些桶生成分层布置，并且使用分层布置强制执行所需的设计数据层级以最终校正光刻。

公开(公告)号：US20080127027A1

公开(公告)日：2008-05-29

申请号：US11555854

申请日：2006-11-02

申请人： Gregg M. Gallatin ,  Kafai Lai ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

发明人： Gregg M. Gallatin ,  Kafai Lai ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.

摘要翻译： 提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。 逐步准确的光学模型包括提供连续影响较小的SOCS内核。 构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。 优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场 模拟。