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1.发明授权Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process 失效用于产生用于多次曝光光刻工艺的多个优化波前的方法公开(公告)号：US08495528B2
公开(公告)日：2013-07-23
申请号：US12890854
申请日：2010-09-27
申请人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
发明人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
IPC分类号： G06F17/50
CPC分类号： G03F7/70466 , G03F1/70
摘要： A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification is to reduce the full problem to an unconstrained formulation. The full problem of minimizing dark region intensity while maintaining intensity above threshold at each bright point can be converted to the unconstrained problem of minimizing average dark region intensity per unit of average intensity in the bright regions. The extrema solutions to the simplified problem can be obtained for each source. This set of extrema solutions is then assessed to determine which features are predominantly printed by which source. A minimal set of extrema solutions serves as a space of reduced dimensionality within which to maximize the primary objective under constraints. The space typically has reduced dimensionality through selection of highest quality extrema solutions.
摘要翻译： 解决了一个简化版本的多功能面罩优化问题，以便找到一个压缩空间，在该空间中搜索解决问题的全部问题。 简化是将完整的问题减少到无约束的公式。 将每个亮点处的强度保持在阈值以上的暗区强度最小化的问题可以转化为明亮区域每单位平均强度平均暗区强度最小化的无约束问题。 可以为每个源获得简化问题的极值解。 然后评估这组极值解决方案，以确定哪些特征主要由哪个来源打印。 最小的一组极值解决方案作为减小维数的空间，在这个空间内可以在约束条件下最大化主要目标。 该空间通常通过选择最高质量的极值解决方案降低维度。
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公开(公告)号：US08351037B2
公开(公告)日：2013-01-08
申请号：US12834379
申请日：2010-07-12
申请人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
发明人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
IPC分类号： G01B11/00
CPC分类号： G03F1/36 , G03F7/70116 , G03F7/70125 , G03F7/70525
摘要： Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.
摘要翻译： 使用曝光工具中的可编程照明器来增加刀具匹配的自由度。 提供了一种工具匹配方法，其利用基于用户特定约束的线性规划（LP）问题对各个源像素强度的精细调整，以最小化两种工具之间的平版印刷晶片数据的差异。 光刻数据可以是来自多个目标和多个工艺条件的关键尺寸差异。 该LP问题可以修改为包括使用多次扫描曝光来匹配源的二进制变量。 该方法可以应用于参考工具是物理工具或虚拟理想工具的场景。 此外，该方法可以匹配不同的光刻系统，每个包括工具和掩模。
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3.发明申请METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MULTIPLE EXPOSURE LITHOGRAPHIC PROCESS 失效一种用于多次曝光的光刻过程产生多重优化波形的方法公开(公告)号：US20120077130A1
公开(公告)日：2012-03-29
申请号：US12890854
申请日：2010-09-27
申请人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
发明人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
CPC分类号： G03F7/70466 , G03F1/70
摘要： A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification is to reduce the full problem to an unconstrained formulation. The full problem of minimizing dark region intensity while maintaining intensity above threshold at each bright point can be converted to the unconstrained problem of minimizing average dark region intensity per unit of average intensity in the bright regions. The extrema solutions to the simplified problem can be obtained for each source. This set of extrema solutions is then assessed to determine which features are predominantly printed by which source. A minimal set of extrema solutions serves as a space of reduced dimensionality within which to maximize the primary objective under constraints. The space typically has reduced dimensionality through selection of highest quality extrema solutions.
摘要翻译： 解决了一个简化版本的多功能面罩优化问题，以便找到一个压缩空间，在该空间中搜索解决问题的全部问题。 简化是将完整的问题减少到无约束的公式。 将每个亮点处的强度保持在阈值以上的暗区强度最小化的问题可以转化为明亮区域每单位平均强度平均暗区强度最小化的无约束问题。 可以为每个源获得简化问题的极值解。 然后评估这组极值解决方案，以确定哪些特征主要由哪个来源打印。 最小的一组极值解决方案作为减小维数的空间，在这个空间内可以在约束条件下最大化主要目标。 该空间通常通过选择最高质量的极值解决方案降低维度。
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4.发明授权Method for optimizing source and mask to control line width roughness and image log slope 有权优化源和掩码以控制线宽粗糙度和图像对数斜率的方法公开(公告)号：US08372565B2
公开(公告)日：2013-02-12
申请号：US12872312
申请日：2010-08-31
申请人： Kehan Tian , Alan E. Rosenbluth , David O. Melville , Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai
发明人： Kehan Tian , Alan E. Rosenbluth , David O. Melville , Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai
IPC分类号： G03F9/00
CPC分类号： G03F1/70 , G03F7/70433
摘要： A method for illuminating a mask with a source to project a desired image pattern through a lithographic system onto a photoactive material including: defining a representation of the mask; obtaining a fractional resist shot noise (FRSN) parameter; determining a first relationship between a first set of optical intensity values and an edge roughness metric based on the FRSN parameter; determining a second relationship between a second set of optical intensity values and a lithographic performance metric; imposing a set of metric constraints based on one of the first and second relationships; setting up an objective function of optimization based on the remaining of the two relationships; determining optimum constrained values of the representation of the mask based on the set of metric constraints and the objective function; and outputting these values.
摘要翻译： 一种用源照射掩模的方法，用于通过光刻系统将期望的图像图案投影到光活性材料上，包括：限定掩模的表示; 获得分数抗蚀散射噪声（FRSN）参数; 基于所述FRSN参数确定第一组光强度值与边缘粗糙度度量之间的第一关系; 确定第二组光强度值和光刻性能度量之间的第二关系; 基于所述第一和第二关系之一施加一组度量约束; 基于剩余的两个关系建立优化的目标函数; 基于所述度量约束和所述目标函数的集合来确定所述掩码的表示的最佳约束值; 并输出这些值。
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5.发明申请METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNESS AND IMAGE LOG SLOPE 有权用于优化源和掩码以控制线宽度粗糙度和图像日志斜率的方法公开(公告)号：US20120052418A1
公开(公告)日：2012-03-01
申请号：US12872312
申请日：2010-08-31
申请人： Kehan Tian , Alan E. Rosenbluth , David O. Melville , Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai
发明人： Kehan Tian , Alan E. Rosenbluth , David O. Melville , Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai
CPC分类号： G03F1/70 , G03F7/70433
摘要： A method for illuminating a mask with a source to project a desired image pattern through a lithographic system onto a photoactive material including: defining a representation of the mask; obtaining a fractional resist shot noise (FRSN) parameter; determining a first relationship between a first set of optical intensity values and an edge roughness metric based on the FRSN parameter; determining a second relationship between a second set of optical intensity values and a lithographic performance metric; imposing a set of metric constraints based on one of the first and second relationships; setting up an objective function of optimization based on the remaining of the two relationships; determining optimum constrained values of the representation of the mask based on the set of metric constraints and the objective function; and outputting these values.
摘要翻译： 一种用源照射掩模的方法，用于通过光刻系统将期望的图像图案投影到光活性材料上，包括：限定掩模的表示; 获得分数抗蚀散射噪声（FRSN）参数; 基于所述FRSN参数确定第一组光强度值与边缘粗糙度度量之间的第一关系; 确定第二组光强度值和光刻性能度量之间的第二关系; 基于所述第一和第二关系之一施加一组度量约束; 基于剩余的两个关系建立优化的目标函数; 基于所述度量约束和所述目标函数的集合来确定所述掩码的表示的最佳约束值; 并输出这些值。
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公开(公告)号：US20120008134A1
公开(公告)日：2012-01-12
申请号：US12834379
申请日：2010-07-12
申请人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
发明人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
IPC分类号： G01N21/00
CPC分类号： G03F1/36 , G03F7/70116 , G03F7/70125 , G03F7/70525
摘要： Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.
摘要翻译： 使用曝光工具中的可编程照明器来增加刀具匹配的自由度。 提供了一种工具匹配方法，其利用基于用户特定约束的线性规划（LP）问题对各个源像素强度的精细调整，以最小化两种工具之间的平版印刷晶片数据的差异。 光刻数据可以是来自多个目标和多个工艺条件的关键尺寸差异。 该LP问题可以修改为包括使用多次扫描曝光来匹配源的二进制变量。 该方法可以应用于参考工具是物理工具或虚拟理想工具的场景。 此外，该方法可以匹配不同的光刻系统，每个包括工具和掩模。
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7.发明授权System and method for projection lithography with immersed image-aligned diffractive element 失效具有浸入图像对准衍射元件的投影光刻系统和方法公开(公告)号：US08537444B2
公开(公告)日：2013-09-17
申请号：US13618821
申请日：2012-09-14
IPC分类号： G03H1/08
CPC分类号： G03H1/02 , G03F7/70466 , G03H1/0244 , G03H1/0402 , G03H1/08 , G03H2001/0094 , G03H2001/2615 , G03H2222/47 , G03H2240/56
摘要： A system and method and computer program product for exposing a photoresist film with patterns of finer resolution than can physically be projected onto the film in an ordinary image formed at the same wavelength. A hologram structure containing a set of resolvable spatial frequencies is first formed above the photoresist film. An illuminating wavefront containing a second set of resolvable spatial frequencies is projected through the hologram, forming a new set of transmitted spatial frequencies that expose the photoresist. The transmitted spatial frequencies include sum frequencies of higher frequency than is present in the hologram or illuminating wavefront, increasing the resolution of the exposing pattern. Designing lithographic masks further includes fabricating the hologram and projecting the illuminating wavefront. A simple personalization based on Talbot fringes and plasmonic interference is further performed.
摘要翻译： 一种系统和方法以及计算机程序产品，用于以比在相同波长下形成的普通图像物理地投射到薄膜上更精细的分辨率的图案来曝光光致抗蚀剂膜。 首先在光致抗蚀剂膜上方形成包含一组可分辨空间频率的全息图结构。 包含第二组可分辨空间频率的照明波前通过全息图投射，形成一组新的曝光光致抗蚀剂的透射空间频率。 所发送的空间频率包括比存在于全息图或照明波前的频率更高的和频，增加曝光图案的分辨率。 设计光刻掩模还包括制造全息图并投射照明波前。 进一步执行基于Talbot条纹和等离子体激元干扰的简单个性化。
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8.发明申请SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-ALIGNED DIFFRACTIVE ELEMENT 审中-公开投影图像的系统和方法与映射图像对齐的差分元素公开(公告)号：US20100003605A1
公开(公告)日：2010-01-07
申请号：US12168310
申请日：2008-07-07
CPC分类号： G03H1/02 , G03F7/70466 , G03H1/0244 , G03H1/0402 , G03H1/08 , G03H2001/0094 , G03H2001/2615 , G03H2222/47 , G03H2240/56
摘要： A novel system and method and computer program product for exposing a photoresist film with patterns of finer resolution than can physically be projected onto the film in an ordinary image formed at the same wavelength. A hologram structure containing a set of resolvable spatial frequencies is first formed above the photoresist film. If necessary the photoresist is then sensitized. An illuminating wavefront containing a second set of resolvable spatial frequencies is projected through the hologram, forming a new set of transmitted spatial frequencies that expose the photoresist. The transmitted spatial frequencies include sum frequencies of higher frequency than is present in the hologram or illuminating wavefront, increasing the resolution of the exposing pattern. These high spatial frequency transmitted waves can be evanescent, or they can propagate at a steeper obliquity in a higher index medium than is possible in a projected image. A further method is described for designing lithographic masks to fabricate the hologram and to project the illuminating wavefront. In other embodiments, a simple personalization based on Talbot fringes and plasmonic interference is performed.
摘要翻译： 一种新颖的系统和方法以及计算机程序产品，用于将光致抗蚀剂膜以比分辨率更高的图案曝光在物理上可投影到以相同波长形成的普通图像中的胶片上。 首先在光致抗蚀剂膜上方形成包含一组可分辨空间频率的全息图结构。 如果需要，光致抗蚀剂然后被致敏。 包含第二组可分辨空间频率的照明波前通过全息图投射，形成一组新的曝光光致抗蚀剂的透射空间频率。 所发送的空间频率包括比存在于全息图或照明波前的频率更高的和频，增加曝光图案的分辨率。 这些高空间频率的透射波可以是消逝的，或者它们可以在比投影图像中可能的更高的索引介质中更陡的倾斜度下传播。 描述了用于设计光刻掩模以制造全息图并投影照明波前的另一种方法。 在其他实施例中，执行基于Talbot条纹和等离子体激元干扰的简单个性化。
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9.发明授权Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge 有权通过基于平行边缘分解曼哈顿多边形来计算掩模的图像强度公开(公告)号：US08059885B2
公开(公告)日：2011-11-15
申请号：US12015768
申请日：2008-01-17
IPC分类号： G06K9/00
摘要： A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise: decomposing a Manhattan polygon of the mask into decomposed areas based on parallel edges of the Manhattan polygon along only one dimension; determining a convolution of each decomposed area based on a table lookup; determining a sum of coherent systems contribution of the Manhattan polygon based on the convolutions of the decomposed areas; and outputting the determined sum of coherent system contribution for analyzing the mask.
摘要翻译： 公开了一种用于计算集成电路处理中使用的掩模的图像强度的方法，系统，计算机程序产品和表查找系统。 方法可以包括：基于曼哈顿多边形沿着一个维度的平行边缘，将掩模的曼哈顿多边形分解为分解区域; 基于表查找确定每个分解区域的卷积; 基于分解区域的卷积确定曼哈顿多边形的相干系统贡献的总和; 并输出确定的用于分析掩模的相干系统贡献的总和。
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10.发明申请SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-ALIGNED DIFFRACTIVE ELEMENT 失效投影图像的系统和方法与映射图像对齐的差分元素公开(公告)号：US20130071774A1
公开(公告)日：2013-03-21
申请号：US13618821
申请日：2012-09-14
IPC分类号： G03H1/02
CPC分类号： G03H1/02 , G03F7/70466 , G03H1/0244 , G03H1/0402 , G03H1/08 , G03H2001/0094 , G03H2001/2615 , G03H2222/47 , G03H2240/56
摘要： A novel system and method and computer program product for exposing a photoresist film with patterns of finer resolution than can physically be projected onto the film in an ordinary image formed at the same wavelength. A hologram structure containing a set of resolvable spatial frequencies is first formed above the photoresist film. An illuminating wavefront containing a second set of resolvable spatial frequencies is projected through the hologram, forming a new set of transmitted spatial frequencies that expose the photoresist. The transmitted spatial frequencies include sum frequencies of higher frequency than is present in the hologram or illuminating wavefront, increasing the resolution of the exposing pattern. A further method is described for designing lithographic masks to fabricate the hologram and to project the illuminating wavefront. In other embodiments, a simple personalization based on Talbot fringes and plasmonic interference is performed.
摘要翻译： 一种新颖的系统和方法以及计算机程序产品，用于将光致抗蚀剂膜以比分辨率更高的图案曝光在物理上可投影到以相同波长形成的普通图像中的胶片上。 首先在光致抗蚀剂膜上方形成包含一组可分辨空间频率的全息图结构。 包含第二组可分辨空间频率的照明波前通过全息图投射，形成一组新的曝光光致抗蚀剂的透射空间频率。 所发送的空间频率包括比存在于全息图或照明波前的频率更高的和频，增加曝光图案的分辨率。 描述了用于设计光刻掩模以制造全息图并投影照明波前的另一种方法。 在其他实施例中，执行基于Talbot条纹和等离子体激元干扰的简单个性化。
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