Method and apparatus for configuring information for multiple network access providers
    51.
    发明申请
    Method and apparatus for configuring information for multiple network access providers 有权
    用于为多个网络接入提供商配置信息的方法和装置

    公开(公告)号:US20060288089A1

    公开(公告)日:2006-12-21

    申请号:US10349737

    申请日:2003-01-21

    申请人: David Goldstein

    发明人: David Goldstein

    IPC分类号: G06F15/16

    摘要: A computer program product that provides a graphical user interface for configuring communication information for multiple network service providers on a computer system. The program product is operable to display a network communication scene that includes edit windows and selectable options for a user to view, enter, remove, and modify configuration information for at least one network service provider, and allows the user to enter information for establishing communication with the same network service provider using at least two different communcation mediums, and from several different geographical locations.

    摘要翻译: 一种计算机程序产品,其提供用于在计算机系统上为多个网络服务提供商配置通信信息的图形用户界面。 程序产品可操作以显示包括编辑窗口和可选择选项的网络通信场景,用于用户查看,输入,删除和修改至少一个网络服务提供商的配置信息,并且允许用户输入用于建立通信的信息 使用相同的网络服务提供商使用至少两种不同的通信介质,以及来自几个不同的地理位置。

    6-Alkoxy-pyrido-pyrimidines
    52.
    发明申请
    6-Alkoxy-pyrido-pyrimidines 失效
    6-烷氧基 - 吡啶并 - 嘧啶

    公开(公告)号:US20050203300A1

    公开(公告)日:2005-09-15

    申请号:US11121862

    申请日:2005-05-04

    CPC分类号: C07D471/04

    摘要: The present invention provides compounds of the Formula I: wherein R1 is alkyl, cycloalkyl, cycloalkylalkyl, or —CH2-alkenyl, X1 is O, NH, N(alkyl), S or —C(═O), Z is N or CH; and R2 and R3are as defined herein, pharmaceutical compositions comprising same, and methods for their use.

    摘要翻译: 本发明提供了式I的化合物:其中R 1是烷基,环烷基,环烷基烷基或-CH 2 - 烯基,X 1, 是O,NH,N(烷基),S或-C(-O),Z是N或CH; R 2和R 3如本文所定义,包含其的药物组合物及其使用方法。

    Superelastic sealing closures
    56.
    发明授权
    Superelastic sealing closures 失效
    超弹性密封圈

    公开(公告)号:US06393765B1

    公开(公告)日:2002-05-28

    申请号:US09644658

    申请日:2000-08-24

    IPC分类号: E06B716

    CPC分类号: B63B19/26 E06B7/16

    摘要: A closure system including a rigid structural part has an edge surface along which sealage is established in response to deformation of a superelastic sheet metal element positioned thereon, such sheet metal element being endowed with a shape memory characteristic by formation as a Nitinol alloy to meet high sealage standards and other environmental requirements.

    摘要翻译: 包括刚性结构部件的封闭系统具有边缘表面,响应于位于其上的超弹性金属片的变形,沿着该边缘表面建立密封,这种金属元件具有形状记忆特征,通过形成为镍钛诺合金以满足高度 密封标准等环保要求。

    Manufacture of Nitinol rings for thermally responsive control of casing latch
    57.
    发明授权
    Manufacture of Nitinol rings for thermally responsive control of casing latch 失效
    制造用于套管闩锁的热响应控制的镍钛诺环

    公开(公告)号:US06240727B1

    公开(公告)日:2001-06-05

    申请号:US09559053

    申请日:2000-04-27

    IPC分类号: F01B2910

    CPC分类号: B21F37/00

    摘要: Axial sections of a casing assembly such as that of a rocket are maintained interconnected by latching prongs on which thermally responsive Nitinol rings are positioned. Operational control over the latching prongs is achieved by selection of material properties and dimensions of the Nitinol rings during manufacture thereof.

    摘要翻译: 诸如火箭的壳体组件的轴向部分通过其上定位有热响应的镍钛诺环的锁定叉保持互连。 通过在其制造过程中选择镍钛诺环的材料性质和尺寸来实现锁定插脚的操作控制。

    Method for etching of silicon carbide semiconductor using selective
etching of different conductivity types
    58.
    发明授权
    Method for etching of silicon carbide semiconductor using selective etching of different conductivity types 失效
    使用不同导电类型的选择性蚀刻蚀刻碳化硅半导体的方法

    公开(公告)号:US6034001A

    公开(公告)日:2000-03-07

    申请号:US198511

    申请日:1994-02-17

    摘要: A method for selective conductivity etching of a silicon carbide (SiC) semiconductor includes forming a p-type SiC layer on a substrate layer, forming an n-type SiC layer on the p-type SiC layer, and photoelectrochemically etching selected portions of the n-type SiC layer by applying a bias voltage to the n-type SiC layer in a hydrofluoric acid (HF) solution while exposing the layer to a pattern of UV light. The bias potential is selected so that the n-type SiC layer will photo-corrode and the p-type SiC layer will be inert and act as an etch stop. The light pattern exposure of the n-type SiC layer may be done by applying a photolithographic mask to the layer, by projecting a collimated light beam through a patterned mask, or by scanning with a focused micrometer-sized laser beam on the semiconductor surface.

    摘要翻译: 碳化硅(SiC)半导体的选择性电导率蚀刻的方法包括在衬底层上形成p型SiC层,在p型SiC层上形成n型SiC层,并对n型SiC层进行光电化学蚀刻 通过在氢氟酸(HF)溶液中向n型SiC层施加偏置电压,同时将层暴露于UV光图案,从而形成SiC层。 选择偏置电位使得n型SiC层将被光腐蚀,并且p型SiC层将是惰性的并且用作蚀刻停止。 n型SiC层的光图案曝光可以通过将光刻掩模施加到层上,通过将准直光束投影通过图案化掩模,或者通过在半导体表面上用聚焦微米尺寸的激光束进行扫描来完成。