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51.发明申请公开(公告)号：US20060198029A1
公开(公告)日：2006-09-07
申请号：US11364015
申请日：2006-02-27
申请人： Karl-Heinz Schuster
发明人： Karl-Heinz Schuster
IPC分类号： G02B3/00
CPC分类号： G02B13/143 , G02B1/02 , G02B1/08 , G02B5/3083 , G02B17/0816 , G03F7/70341 , G03F7/70958
摘要： The invention concerns a microlithography projection objective and a microlithographic projection exposure apparatus with a microlithography projection objective, having at least one lens of birefringent material. In accordance with an aspect of the invention, a microlithography projection objective has an optical axis and at least one lens of uniaxial birefringent crystal whose principal axis is oriented parallel to the optical axis, wherein all lenses of uniaxial birefringent crystal comprise the same crystal material, wherein light is tangentially polarised in the lens of uniaxial birefringent crystal and wherein the lens of uniaxial birefringent crystal has a diffractive power different from zero and has a plane exit face or a non-plane but refractive power-less exit face.
摘要翻译： 本发明涉及微光刻投影物镜和具有微光刻投影物镜的微光刻投影曝光装置，该物镜具有至少一个双折射材料透镜。 根据本发明的一个方面，微光刻投影物镜具有光轴和主轴定向为平行于光轴的单轴双折射晶体的至少一个透镜，其中单轴双折射晶体的所有透镜都包含相同的晶体材料， 其中光在单轴双折射晶体的透镜中被切向极化，并且其中单轴双折射晶体的透镜具有不同于零的衍射光束，并且具有平面出射面或非平面但不具有折射光焦度的出射面。
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52.发明申请Lithographic objective having a first lens group including only lenses having a positive refractive power 有权具有仅具有正屈光力的透镜的第一透镜组的平版印刷物镜公开(公告)号：US20060176573A1
公开(公告)日：2006-08-10
申请号：US11350941
申请日：2006-02-10
IPC分类号： G02B3/00
CPC分类号： G03F7/70241 , G02B9/14 , G02B13/0095 , G02B13/143 , G02B13/24 , G02B27/0043
摘要： A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).
摘要翻译： 投影物镜包括正折射光焦度的第一透镜组（G 1），负折射光焦度的第二透镜组（G 2）和安装有光阑的至少一个正屈光力透镜组。 第一透镜组（G 1）仅包括具有正屈光力的透镜。 第一透镜组（G 1）的正屈光力量的透镜数（L 101〜L 103; L 201，L 202）的数量小于正折射力透镜的数量（L 116〜L 119; L 215 至L 217），其安装在另一透镜组（G 5）的隔膜的前方。
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53.发明申请公开(公告)号：US20060169198A1
公开(公告)日：2006-08-03
申请号：US11367825
申请日：2006-03-03
IPC分类号： H01L21/322 , C30B15/14
CPC分类号： G02B5/3083
摘要： In a method for producing a zeroth- or low-order phase delay element, in particular a phase delay element for wavelengths λ
摘要翻译： 在用于产生零级或低阶相位延迟元件的方法中，特别是用于波长λ<200nm的相位延迟元件，相位延迟元件由双折射晶体材料形成。 制造临时承载板（1），其设置有平面加工侧（3）。 之后，制造各向异性的水晶板（2），然后借助于连接装置/连接层（6）将临时载板（1）连接到各向异性晶体板（2）。 然后除了残留层之外，大部分各向异性晶体板（2）被分离，之后通过进一步的生产和抛光方法的方法达到各向异性晶体板（2）的端部厚度。 通过生产和抛光方法生产的第二个最终承载板（8）直接连接到各向异性晶体板（2），之后最终将临时载体板（1）从各向异性晶体分离或分离 板（2）。
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公开(公告)号：US20060146411A1
公开(公告)日：2006-07-06
申请号：US11298019
申请日：2005-12-09
申请人： Karl-Heinz Schuster
发明人： Karl-Heinz Schuster
IPC分类号： G02B27/10
CPC分类号： G03F7/70966 , G02B27/283 , G03F7/70566
摘要： In certain aspects, the disclosure relates to an imaging system, particularly an objective or an illumination device of a microlithography projection-exposure apparatus having an optical axis (OA), with at least one optical element of an optically uniaxial crystal material whose optical crystallographic axis is substantially parallel to the optical axis (OA) of the imaging system and which at a working wavelength has an ordinary refractive index no and an extraordinary refractive index ne, with the extraordinary refractive index ne being smaller than the ordinary refractive index no; wherein the optical element is arranged in the ray path pattern in such a way that, at least for rays of the working wavelength which meet the optical element at an angle that falls within an angular range from the optical axis, the p-polarized component is reflected more strongly than the s-polarized component.
摘要翻译： 在某些方面，本发明涉及一种成像系统，特别是具有光轴（OA）的微光刻投影曝光设备的物镜或照明装置，其具有光学单轴晶体材料的至少一个光学元件，光学单轴晶体材料的光学晶轴 基本上平行于成像系统的光轴（OA），并且其在工作波长具有普通的折射率n
和非常折射率n ，与 非常折射率小于正常折射率n 0; 其中所述光学元件布置在所述光线路径图案中，使得至少对于以与所述光轴成角度范围内的角度相遇所述光学元件的所述工作波长的射线，所述p偏振分量为 反射比s偏振分量更强。 -
55.发明授权Lithographic objective having a first lens group including only lenses having a positive refractive power 失效具有仅具有正屈光力的透镜的第一透镜组的平版印刷物镜公开(公告)号：US07023627B2
公开(公告)日：2006-04-04
申请号：US10873292
申请日：2004-06-23
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B9/14 , G02B13/0095 , G02B13/143 , G02B13/24 , G02B27/0043
摘要： A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).
摘要翻译： 投影物镜包括正折射光焦度的第一透镜组（G 1），负折射光焦度的第二透镜组（G 2）和安装有光阑的至少一个正屈光力透镜组。 第一透镜组（G 1）仅包括具有正屈光力的透镜。 第一透镜组（G 1）的正屈光力量的透镜数（L 101〜L 103; L 201，L 202）的数量小于正折射力透镜的数量（L 116〜L 119; L 215 至L 217），其安装在另一透镜组（G 5）的隔膜的前方。
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公开(公告)号：US20060012885A1
公开(公告)日：2006-01-19
申请号：US11151465
申请日：2005-06-14
IPC分类号： G02B3/00
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。
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57.发明授权Projection exposure system for microlithography and method for generating microlithographic images 失效用于微光刻的投影曝光系统和用于产生微光刻图像的方法公开(公告)号：US06972831B2
公开(公告)日：2005-12-06
申请号：US10984256
申请日：2004-11-09
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54 , G03B27/42 , G03B27/72
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： An arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译： 用于在高孔径处的微光刻投影曝光的布置通过垂直于抗蚀剂入射平面的光的偏振实现对比度增加。 提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。
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公开(公告)号：US20050111108A1
公开(公告)日：2005-05-26
申请号：US10931062
申请日：2004-09-01
申请人： Karl-Heinz Schuster
发明人： Karl-Heinz Schuster
CPC分类号： G03F7/70975 , G02B13/00 , G02B13/143 , G03F7/70241 , G03F7/70958
摘要： A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.
摘要翻译： 非常高的光圈，纯折射投影物镜被设计为具有物体侧腹部，图像侧腹部和腰部（7）的两腹系统。 系统隔膜（5）以图像平面前方的间隔位于图像侧腹部。 在发散辐射区域之间在腰部和系统隔膜之间布置有负组（LG 5），其具有指向图像平面的凹面的有效曲率。 该系统具有高数值孔径，低色差和紧凑的节省材料的特点。
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公开(公告)号：US06891683B2
公开(公告)日：2005-05-10
申请号：US10645302
申请日：2003-08-21
申请人： Karl-Heinz Schuster
发明人： Karl-Heinz Schuster
CPC分类号： G03F7/70975 , G02B13/143 , G03F7/70241 , G03F7/70958
摘要： A refractive projection objective for use in microlithography with lenses made exclusively of one and the same material has an image-side numerical aperture larger than 0.7. A light bundle defined by the image-side numerical aperture and by the image field has within the objective a variable light-bundle diameter smaller than or equal to a maximum light-bundle diameter. In a length interval measured on the optical axis from the system diaphragm towards the object field and at least equaling the maximum light-bundle diameter, the variable light-bundle diameter exceeds 85% of the maximum light-bundle diameter.
摘要翻译： 用于具有仅由同一材料制成的透镜的微光刻的折射投影物镜具有大于0.7的图像侧数值孔径。 由图像侧数值孔径和图像场界定的光束在目标内具有小于或等于最大光束直径的可变光束直径。 在从系统隔膜朝向物场的光轴上测量的长度间隔中，至少等于最大光束直径，可变光束直径超过最大光束直径的85％。
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60.发明申请公开(公告)号：US20050083507A1
公开(公告)日：2005-04-21
申请号：US10984256
申请日：2004-11-09
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
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