Abstract:
MQW devices, IC chips and methods may be used in semiconductor lithography patterning systems. An MQW device includes an array of pixels that have transmission elements and associated support circuits. The support circuits have preliminary memory cells and final memory cells. The final memory cells store transmittance values that control transmittances of the associated transmission elements. This way, exposure of a target with a lithography system for purposes of patterning the target may be performed through the transmission elements according to the controlled transmittances, while subsequent transmittance values are being received by the preliminary memory cells from memory banks. The exposure of the target therefore needs to pause for less time, in order to wait for the MQW device to be refreshed with the subsequent transmittance values. Accordingly the whole semiconductor lithography patterning system may operate faster and thus have more throughput.
Abstract:
An X-ray detector may comprise: a substrate; a plurality of pixel electrodes on the substrate; a photoconductor covering the plurality of pixel electrodes; and/or a common electrode on the photoconductor. The photoconductor may comprise: at least two photoconductor layers; and/or a current resistance layer, between the at least two photoconductor layers, configured to reduce current flow between the at least two photoconductor layers. An X-ray detector may comprise: a plurality of photoconductor layers; and/or a current resistance layer, between the plurality of photoconductor layers, configured to reduce current flow between the plurality of photoconductor layers.